REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
REU 网站:极紫外 (EUV) 激光的工程应用
基本信息
- 批准号:1852537
- 负责人:
- 金额:$ 37.13万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2019
- 资助国家:美国
- 起止时间:2019-09-01 至 2023-08-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
This renewal REU Site program, hosted by the Extreme Ultraviolet Engineering Research Center (EUV ERC), at Colorado State University is a collaboration between a diverse group of research engineers and scientists from Center member institutions and industry leaders. The goals of this REU Site are to offer research opportunities to a group of diverse undergraduate students in a technically and scientifically challenging field that is becoming critical to industry, with a strategy that will strengthen industry involvement and will continue expanding the program to enable broader participation. The Center conducts research and trains engineers and scientists in the area of lasers and photonics, focusing in particular on the generation and application of EUV light. This laser-generated shorter wavelength light is opening new revolutionary opportunities in science in areas including nanotechnology, materials, chemistry and biology. Moreover, it will have an enormous economic impact by enabling the mass production of the next generations of computer processors and memory. The EUV ERC REU program will provide students with a unique opportunity designed to understand EUV science and technology and to become involved in EUV-related research projects that are technically and scientifically challenging, and highly interdisciplinary. The Center faculty and research labs are producing cutting-edge research and have partnerships with industries that are leaders in the development and commercialization of products that will be at the forefront of the next generation of technology, including critical tools for the fabrication of all future cell phones and computers.During a 10 week summer program the intent is to increase the student interactions with corporate members of the Center who are world leaders in EUV technologies and applications, and to involve the participation of Center graduates now in industry. REU students who will complete a first summer of research in a EUV ERC lab will have the option to continue their research the following summer in an industry lab, with internships funded by industry. The REU Site will further broaden participation by joining efforts with Prof. Wesley Sims (Morehouse College) and Prof. Willie Rockward (Morgan State Univ.), which are both Historically Black College/University (HBCU) and Prof. Professor Edwin Fohtung (New Mexico State Univ.), a minority serving institution. A successful REU instills confidence in students to make educated choices about their future careers as engineers and scientists. It enhances their competitiveness for strong graduate programs, and prepares students for career opportunities in coveted industry positions. The program will contribute to educating a workforce is a field of critical national economic importance for global competitiveness in which industry is experiencing a very significant shortage. Very few educational programs exist in the world to train a new generation of engineers and scientists proficient in EUV science and technology. The proposed program will be conducted in close partnership with industry and will contribute to fill this void.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
这个更新REU站点计划由科罗拉多州立大学的极紫外线工程研究中心(EUV ERC)主办,是来自中心成员机构和行业领导者的各种研究工程师和科学家之间的合作。这个REU网站的目标是提供研究机会,一组不同的本科生在技术和科学上具有挑战性的领域,这是成为行业的关键,战略,将加强行业参与,并将继续扩大该计划,使更广泛的参与。该中心在激光和光子学领域进行研究和培训工程师和科学家,特别关注EUV光的产生和应用。这种激光产生的较短波长的光正在为纳米技术、材料、化学和生物学等领域的科学开辟新的革命性机遇。此外,它将通过大规模生产下一代计算机处理器和存储器而产生巨大的经济影响。EUV ERC REU计划将为学生提供一个独特的机会,旨在了解EUV科学和技术,并参与与EUV相关的研究项目,这些项目在技术和科学上具有挑战性,并且具有高度的跨学科性。该中心的教师和研究实验室正在进行尖端的研究,并与那些在开发和商业化产品方面处于领先地位的行业建立了合作伙伴关系,这些产品将处于下一代技术的最前沿,包括制造未来所有手机和电脑的关键工具。在为期10周的暑期项目中,目的是增加学生与中心企业成员的互动谁是EUV技术和应用的世界领导者,并涉及中心的毕业生现在在行业的参与。将在EUV ERC实验室完成第一个夏天研究的REU学生将可以选择在接下来的夏天在行业实验室继续他们的研究,并由行业资助实习。REU网站将进一步扩大参与,与韦斯利西姆斯教授(莫尔豪斯学院)和威利洛克沃德教授(摩根州立大学),这两个历史上的黑人学院/大学(HBCU)和教授教授埃德温Fohtung(新墨西哥州州立大学),少数民族服务机构一个成功的REU灌输学生的信心,使他们对未来的职业生涯作为工程师和科学家的教育选择。它提高了他们的竞争力,强大的研究生课程,并准备学生在令人垂涎的行业职位的就业机会。该计划将有助于教育劳动力是一个对全球竞争力至关重要的国家经济重要性领域,该行业正在经历非常严重的短缺。世界上很少有教育计划能够培养新一代精通EUV科学和技术的工程师和科学家。该奖项反映了NSF的法定使命,并通过使用基金会的知识价值和更广泛的影响审查标准进行评估,被认为值得支持。
项目成果
期刊论文数量(5)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Nonresonant coherent amplitude transfer in attosecond four-wave-mixing spectroscopy
阿秒四波混频光谱中的非共振相干振幅传递
- DOI:10.1103/physreva.107.023526
- 发表时间:2023
- 期刊:
- 影响因子:2.9
- 作者:Gaynor, James D.;Fidler, Ashley P.;Kobayashi, Yuki;Lin, Yen-Cheng;Keenan, Clare L.;Neumark, Daniel M.;Leone, Stephen R.
- 通讯作者:Leone, Stephen R.
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Jorge Rocca其他文献
Ponderomotive acceleration with high energy tilted ultrafast laser pulses
高能倾斜超快激光脉冲有质动力加速
- DOI:
- 发表时间:
2023 - 期刊:
- 影响因子:0
- 作者:
Patrick Hunt;Alex M. Wilhelm;Shoujun Wang;R. Hollinger;Ze’ev Shpilman;S. Z. Anaraki;Aaron Davenport;Daniel E. Adams;C. Menoni;Jorge Rocca;Charles Durfee - 通讯作者:
Charles Durfee
Jorge Rocca的其他文献
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{{ truncateString('Jorge Rocca', 18)}}的其他基金
PFI-TT: Enhancing the Mass Production of Advanced Integrated Circuits
PFI-TT:增强先进集成电路的量产
- 批准号:
2141227 - 财政年份:2022
- 资助金额:
$ 37.13万 - 项目类别:
Standard Grant
PFI:AIR - TT: Pulse Shaping for Increased Conversion Efficiency in Extreme Ultraviolet Lithography Sources for the Fabrication of Next Generation Integrated Circuits
PFI:AIR - TT:脉冲整形可提高极紫外光刻源的转换效率,用于制造下一代集成电路
- 批准号:
1701238 - 财政年份:2017
- 资助金额:
$ 37.13万 - 项目类别:
Standard Grant
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
REU 网站:极紫外 (EUV) 激光的工程应用
- 批准号:
1461231 - 财政年份:2015
- 资助金额:
$ 37.13万 - 项目类别:
Standard Grant
OP: Transforming Table-top Soft X-Ray Lasers into High Average Power Devices
OP:将台式软 X 射线激光器转变为高平均功率设备
- 批准号:
1509925 - 财政年份:2015
- 资助金额:
$ 37.13万 - 项目类别:
Standard Grant
NSF EUV ERC RET in Engineering & Computer Science Site Program
NSF EUV ERC RET 工程
- 批准号:
1301436 - 财政年份:2014
- 资助金额:
$ 37.13万 - 项目类别:
Standard Grant
AIR Option 2: Research Alliance - Development of key technology for next generation projection lithography of integrated circuits at 6.X nm wavelength
AIR选项2:研究联盟——开发下一代6.X nm波长集成电路投影光刻关键技术
- 批准号:
1343456 - 财政年份:2013
- 资助金额:
$ 37.13万 - 项目类别:
Standard Grant
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
REU 网站:极紫外 (EUV) 激光的工程应用
- 批准号:
1157036 - 财政年份:2012
- 资助金额:
$ 37.13万 - 项目类别:
Continuing Grant
High Energy Density Plasmas in Ultrafast Micro-Capillary Discharges
超快微毛细管放电中的高能量密度等离子体
- 批准号:
1004295 - 财政年份:2010
- 资助金额:
$ 37.13万 - 项目类别:
Continuing Grant
MRI-R2: Development of a high average power table-top extreme ultraviolet/soft x-ray laser beam line for science at the nanoscale
MRI-R2:开发用于纳米级科学的高平均功率台式极紫外/软 X 射线激光束线
- 批准号:
0960274 - 财政年份:2010
- 资助金额:
$ 37.13万 - 项目类别:
Standard Grant
RET-Site Program in Light & Optics for the NSF EUV ERC
Light 中的 RET 站点程序
- 批准号:
0808763 - 财政年份:2008
- 资助金额:
$ 37.13万 - 项目类别:
Standard Grant
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新型WDR5蛋白Win site抑制剂的合理设计、合成及其抗肿瘤活性研究
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