REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
REU 网站:极紫外 (EUV) 激光的工程应用
基本信息
- 批准号:1461231
- 负责人:
- 金额:$ 33.56万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2015
- 资助国家:美国
- 起止时间:2015-03-01 至 2018-09-30
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
BROADER SIGNIFICANCE OF THE PROJECT:The Extreme Ultraviolet Engineering Research Center (EUV ERC), a partnership between Colorado State University (CSU), the University of Colorado, Boulder (CU Boulder), the University of California, Berkeley (UC Berkeley) and 20 corporate affiliates, will provide summer research internships to 30 undergraduate students from colleges and universities across the United States through a 3-year Research Experience for Undergraduates (REU) grant from the National Science Foundation (NSF) [Division of Engineering Education EEC-1461231]. Students who are accepted into the program will participate at one of the 3 campuses in a 10-week program that involves conducting research in a cutting-edge engineering project, attending scientific seminars and industry tours, and presenting their results. The Center recognizes the importance of students in academic research to be able to interact and appreciate the industrial culture. As a result, a goal of this grant is to leverage these partnerships to enable alumni REU interns to be placed into industry internships. The Center also has active partnerships with minority serving institutions and is committed to providing opportunities for students from underrepresented minority groups. The Center will broaden participation by joining efforts with, Professor Willie Rockwood of Morehouse College, a Historically Black College/Univ. (HBCU), who has a 10 year history of working with the Center and is co-PI of this grant.PROJECT DESCRIPTION:Light in the EUV region of the spectrum (wavelengths approximately 5 - 50 nm) is the key enabling technology of critical importance to the semiconductor industry and national economy. The EUV ERC will provide summer research internships that involve EUV science and technology topics such as laser systems, nanoscience (quantum dots), electronic (printed board) circuit design, photonic techniques (ellipsometry, phase shifting interferometry and both ambient condition and low-temperature vacuum spectroscopy), optics design (Brewster's Angle plate beam splitter), lithography (essential to next generation computer processor manufacturing), chemistry and material science (photo resists), and high voltage systems. Titles of possible projects include: Nanoscale resolution mass-microscope by EUV laser ablation mass spectrometry; Photoelectron dynamics using high harmonic EUV light; and, the Design and construction of a new vacuum chamber test bed for characterizing magnetic materials at the nano-scale with ultrafast time resolution. The Center has an active partnership with Industries in the development of EUV-technologies that derive from research conducted at the Center. The Center recognizes the importance of students in academic research to be able to interact and appreciate the industrial culture. As a result, a goal of this grant is to leverage these partnerships to enable alumni REU interns to be placed into industry internships.
该项目的更广泛意义:极端紫外线工程研究中心(EUV ERC),科罗拉多州立大学(CSU)(CSU)之间的伙伴关系国家科学基金会(NSF)的本科生(REU)赠款[工程教育部EEC-1461231]。参加该计划的学生将参加为期10周的计划中的3个校园之一,该计划涉及在尖端的工程项目中进行研究,参加科学研讨会和行业巡回演出,并提出结果。该中心认识到学生在学术研究中的重要性,能够互动和欣赏工业文化。结果,这笔赠款的目标是利用这些合作伙伴关系使校友REU实习生能够进入行业实习。该中心还与少数派服务机构建立了积极的伙伴关系,并致力于为来自代表性不足的少数群体的学生提供机会。该中心将通过与历史悠久的黑人学院/大学的Morehouse College的Willie Rockwood教授一起努力来扩大参与。 (HBCU)拥有与该中心合作的10年历史,并且是该赠款的共同点。 The EUV ERC will provide summer research internships that involve EUV science and technology topics such as laser systems, nanoscience (quantum dots), electronic (printed board) circuit design, photonic techniques (ellipsometry, phase shifting interferometry and both ambient condition and low-temperature vacuum spectroscopy), optics design (Brewster's Angle plate beam splitter), lithography (essential to next generation computer processor制造),化学和材料科学(照片抵抗)和高压系统。可能的项目的标题包括:通过EUV激光消融质谱法进行纳米级分辨率质谱;光电子动力学使用高谐波euv光;并且,设计和构建新的真空室测试床,用于以超快时间分辨率在纳米尺度上表征磁性材料。该中心与行业建立了积极的伙伴关系,以发展来自该中心进行的研究的EUV技术发展。该中心认识到学生在学术研究中的重要性,能够互动和欣赏工业文化。结果,这笔赠款的目标是利用这些合作伙伴关系使校友REU实习生能够进入行业实习。
项目成果
期刊论文数量(1)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Nonresonant coherent amplitude transfer in attosecond four-wave-mixing spectroscopy
阿秒四波混频光谱中的非共振相干振幅传递
- DOI:10.1103/physreva.107.023526
- 发表时间:2023
- 期刊:
- 影响因子:2.9
- 作者:Gaynor, James D.;Fidler, Ashley P.;Kobayashi, Yuki;Lin, Yen-Cheng;Keenan, Clare L.;Neumark, Daniel M.;Leone, Stephen R.
- 通讯作者:Leone, Stephen R.
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Jorge Rocca其他文献
Ponderomotive acceleration with high energy tilted ultrafast laser pulses
高能倾斜超快激光脉冲有质动力加速
- DOI:
- 发表时间:
2023 - 期刊:
- 影响因子:0
- 作者:
Patrick Hunt;Alex M. Wilhelm;Shoujun Wang;R. Hollinger;Ze’ev Shpilman;S. Z. Anaraki;Aaron Davenport;Daniel E. Adams;C. Menoni;Jorge Rocca;Charles Durfee - 通讯作者:
Charles Durfee
Jorge Rocca的其他文献
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{{ truncateString('Jorge Rocca', 18)}}的其他基金
PFI-TT: Enhancing the Mass Production of Advanced Integrated Circuits
PFI-TT:增强先进集成电路的量产
- 批准号:
2141227 - 财政年份:2022
- 资助金额:
$ 33.56万 - 项目类别:
Standard Grant
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
REU 网站:极紫外 (EUV) 激光的工程应用
- 批准号:
1852537 - 财政年份:2019
- 资助金额:
$ 33.56万 - 项目类别:
Standard Grant
PFI:AIR - TT: Pulse Shaping for Increased Conversion Efficiency in Extreme Ultraviolet Lithography Sources for the Fabrication of Next Generation Integrated Circuits
PFI:AIR - TT:脉冲整形可提高极紫外光刻源的转换效率,用于制造下一代集成电路
- 批准号:
1701238 - 财政年份:2017
- 资助金额:
$ 33.56万 - 项目类别:
Standard Grant
OP: Transforming Table-top Soft X-Ray Lasers into High Average Power Devices
OP:将台式软 X 射线激光器转变为高平均功率设备
- 批准号:
1509925 - 财政年份:2015
- 资助金额:
$ 33.56万 - 项目类别:
Standard Grant
NSF EUV ERC RET in Engineering & Computer Science Site Program
NSF EUV ERC RET 工程
- 批准号:
1301436 - 财政年份:2014
- 资助金额:
$ 33.56万 - 项目类别:
Standard Grant
AIR Option 2: Research Alliance - Development of key technology for next generation projection lithography of integrated circuits at 6.X nm wavelength
AIR选项2:研究联盟——开发下一代6.X nm波长集成电路投影光刻关键技术
- 批准号:
1343456 - 财政年份:2013
- 资助金额:
$ 33.56万 - 项目类别:
Standard Grant
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
REU 网站:极紫外 (EUV) 激光的工程应用
- 批准号:
1157036 - 财政年份:2012
- 资助金额:
$ 33.56万 - 项目类别:
Continuing Grant
High Energy Density Plasmas in Ultrafast Micro-Capillary Discharges
超快微毛细管放电中的高能量密度等离子体
- 批准号:
1004295 - 财政年份:2010
- 资助金额:
$ 33.56万 - 项目类别:
Continuing Grant
MRI-R2: Development of a high average power table-top extreme ultraviolet/soft x-ray laser beam line for science at the nanoscale
MRI-R2:开发用于纳米级科学的高平均功率台式极紫外/软 X 射线激光束线
- 批准号:
0960274 - 财政年份:2010
- 资助金额:
$ 33.56万 - 项目类别:
Standard Grant
RET-Site Program in Light & Optics for the NSF EUV ERC
Light 中的 RET 站点程序
- 批准号:
0808763 - 财政年份:2008
- 资助金额:
$ 33.56万 - 项目类别:
Standard Grant
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