REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
批准号:
1461231
负责人:
Jorge Rocca
金额:
$33.56万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2015
资助国家:
美国
项目状态:
已结题
起止时间:
2015-03-01 至 2018-09-30
中文摘要
该项目的广泛意义:极端紫外线工程研究中心是由科罗拉多州立大学、科罗拉多州立大学博尔德分校、加州大学伯克利分校(加州大学伯克利分校)和20家附属公司合作建立的,将通过国家科学基金会[工程教育部EEC-1461231]提供的为期3年的本科生研究经历资助,为来自美国各地高校的30名本科生提供暑期研究实习机会。被录取的学生将在3个校区中的一个参加为期10周的项目,包括开展尖端工程项目的研究,参加科学研讨会和行业参观,并展示他们的成果。该中心认识到学生在学术研究中能够互动和欣赏工业文化的重要性。因此,这笔赠款的一个目标是利用这些合作伙伴关系,使REU的校友实习生能够进入行业实习。该中心还与为少数群体服务的机构建立了积极的伙伴关系,并致力于为代表不足的少数群体的学生提供机会。该中心将通过与莫尔豪斯学院的威利·罗克伍德教授合作,扩大参与范围,莫尔豪斯学院是历史上的黑人学院/大学。(HBCU),他与该中心合作已有10年的历史,是这一授权的联合PI。项目描述:光谱的EUV区域(波长约为5-50 nm)中的光是对半导体行业和国民经济至关重要的关键使能技术。EUV ERC将提供暑期研究实习机会,涉及EUV科学和技术主题,如激光系统、纳米科学(量子点)、电子(印刷电路板)电路设计、光子技术(椭圆偏振测量、相移干涉测量以及环境条件和低温真空光谱分析)、光学设计(布鲁斯特的角板分束器)、光刻(对下一代计算机处理器制造至关重要)、化学与材料科学(光刻胶)以及高压系统。可能开展的项目包括:利用极紫外激光烧蚀质谱仪进行纳米级分辨率质量显微镜;利用高次谐波极紫外光进行光电子动力学;以及设计和建造一种新型真空室试验台,用于在纳米级以超快时间分辨率表征磁性材料。该中心与工业公司在开发EUV方面建立了积极的合作伙伴关系,这些技术源于该中心进行的研究。该中心认识到学生在学术研究中能够互动和欣赏工业文化的重要性。因此,这笔赠款的一个目标是利用这些合作伙伴关系,使REU的校友实习生能够进入行业实习。
英文摘要
BROADER SIGNIFICANCE OF THE PROJECT:The Extreme Ultraviolet Engineering Research Center (EUV ERC), a partnership between Colorado State University (CSU), the University of Colorado, Boulder (CU Boulder), the University of California, Berkeley (UC Berkeley) and 20 corporate affiliates, will provide summer research internships to 30 undergraduate students from colleges and universities across the United States through a 3-year Research Experience for Undergraduates (REU) grant from the National Science Foundation (NSF) [Division of Engineering Education EEC-1461231]. Students who are accepted into the program will participate at one of the 3 campuses in a 10-week program that involves conducting research in a cutting-edge engineering project, attending scientific seminars and industry tours, and presenting their results. The Center recognizes the importance of students in academic research to be able to interact and appreciate the industrial culture. As a result, a goal of this grant is to leverage these partnerships to enable alumni REU interns to be placed into industry internships. The Center also has active partnerships with minority serving institutions and is committed to providing opportunities for students from underrepresented minority groups. The Center will broaden participation by joining efforts with, Professor Willie Rockwood of Morehouse College, a Historically Black College/Univ. (HBCU), who has a 10 year history of working with the Center and is co-PI of this grant.PROJECT DESCRIPTION:Light in the EUV region of the spectrum (wavelengths approximately 5 - 50 nm) is the key enabling technology of critical importance to the semiconductor industry and national economy. The EUV ERC will provide summer research internships that involve EUV science and technology topics such as laser systems, nanoscience (quantum dots), electronic (printed board) circuit design, photonic techniques (ellipsometry, phase shifting interferometry and both ambient condition and low-temperature vacuum spectroscopy), optics design (Brewster's Angle plate beam splitter), lithography (essential to next generation computer processor manufacturing), chemistry and material science (photo resists), and high voltage systems. Titles of possible projects include: Nanoscale resolution mass-microscope by EUV laser ablation mass spectrometry; Photoelectron dynamics using high harmonic EUV light; and, the Design and construction of a new vacuum chamber test bed for characterizing magnetic materials at the nano-scale with ultrafast time resolution. The Center has an active partnership with Industries in the development of EUV-technologies that derive from research conducted at the Center. The Center recognizes the importance of students in academic research to be able to interact and appreciate the industrial culture. As a result, a goal of this grant is to leverage these partnerships to enable alumni REU interns to be placed into industry internships.
期刊论文(1)
专著(0)
科研奖励(0)
会议论文
Nonresonant coherent amplitude transfer in attosecond four-wave-mixing spectroscopy
阿秒四波混频光谱中的非共振相干振幅传递
DOI:
10.1103/physreva.107.023526
发表时间:
2023
期刊:
Physical Review A
影响因子:
2.9
作者:
[Gaynor, James D., Fidler, Ashley P., Kobayashi, Yuki, Lin, Yen-Cheng, Keenan, Clare L., Neumark, Daniel M., Leone, Stephen R.]
通讯作者:
Leone, Stephen R.
PFI-TT: Enhancing the Mass Production of Advanced Integrated Circuits
-
批准号:2141227
-
项目类别:Standard Grant
-
资助金额:$25.0万
-
财政年份:2022
-
负责人:Jorge Rocca
-
依托单位:
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
-
批准号:1852537
-
项目类别:Standard Grant
-
资助金额:$37.13万
-
财政年份:2019
-
负责人:Jorge Rocca
-
依托单位:
PFI:AIR - TT: Pulse Shaping for Increased Conversion Efficiency in Extreme Ultraviolet Lithography Sources for the Fabrication of Next Generation Integrated Circuits
-
批准号:1701238
-
项目类别:Standard Grant
-
资助金额:$19.99万
-
财政年份:2017
-
负责人:Jorge Rocca
-
依托单位:
OP: Transforming Table-top Soft X-Ray Lasers into High Average Power Devices
-
批准号:1509925
-
项目类别:Standard Grant
-
资助金额:$40.0万
-
财政年份:2015
-
负责人:Jorge Rocca
-
依托单位:
NSF EUV ERC RET in Engineering & Computer Science Site Program
-
批准号:1301436
-
项目类别:Standard Grant
-
资助金额:$31.87万
-
财政年份:2014
-
负责人:Jorge Rocca
-
依托单位:
AIR Option 2: Research Alliance - Development of key technology for next generation projection lithography of integrated circuits at 6.X nm wavelength
-
批准号:1343456
-
项目类别:Standard Grant
-
资助金额:$40.0万
-
财政年份:2013
-
负责人:Jorge Rocca
-
依托单位:
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
-
批准号:1157036
-
项目类别:Continuing Grant
-
资助金额:$28.7万
-
财政年份:2012
-
负责人:Jorge Rocca
-
依托单位:
High Energy Density Plasmas in Ultrafast Micro-Capillary Discharges
-
批准号:1004295
-
项目类别:Continuing Grant
-
资助金额:$59.1万
-
财政年份:2010
-
负责人:Jorge Rocca
-
依托单位:
MRI-R2: Development of a high average power table-top extreme ultraviolet/soft x-ray laser beam line for science at the nanoscale
-
批准号:0960274
-
项目类别:Standard Grant
-
资助金额:$150.0万
-
财政年份:2010
-
负责人:Jorge Rocca
-
依托单位:
RET-Site Program in Light & Optics for the NSF EUV ERC
-
批准号:0808763
-
项目类别:Standard Grant
-
资助金额:$33.33万
-
财政年份:2008
-
负责人:Jorge Rocca
-
依托单位:
MRI: Development of the Next Generation of Compact Coherent Extreme Ultraviolet Sources
-
批准号:0521649
-
项目类别:Standard Grant
-
资助金额:$90.0万
-
财政年份:2005
-
负责人:Jorge Rocca
-
依托单位:
Engineering Research Center for Extreme Ultraviolet Science and Technology
-
批准号:0310717
-
项目类别:Cooperative Agreement
-
资助金额:$2895.81万
-
财政年份:2003
-
负责人:Jorge Rocca
-
依托单位:
Student and Young Scientist Participation in the 8th International Conference on X-Ray Lasers to be held in Aspen, Colorado
-
批准号:0201947
-
项目类别:Standard Grant
-
资助金额:$0.6万
-
财政年份:2002
-
负责人:Jorge Rocca
-
依托单位:
MRI: Development of an Intense Table-Top Soft X-Ray Laser Source of Picosecond Pulses
-
批准号:9977677
-
项目类别:Standard Grant
-
资助金额:$53.07万
-
财政年份:1999
-
负责人:Jorge Rocca
-
依托单位:
Basic Issues of the Dynamcis and Radiation of Capillary Discharge Plasmas
-
批准号:9713297
-
项目类别:Standard Grant
-
资助金额:$46.1万
-
财政年份:1997
-
负责人:Jorge Rocca
-
依托单位:
Development of a Soft X-Ray Laser for the Study of Metal and Semi-metal Oxide Nanoclusters
-
批准号:9512282
-
项目类别:Standard Grant
-
资助金额:$38.78万
-
财政年份:1995
-
负责人:Jorge Rocca
-
依托单位:
International Collaboration for the Study of Fast Capillary Discharge Plasmas as Efficient Sources for X-Ray Radiation
-
批准号:9412916
-
项目类别:Continuing Grant
-
资助金额:$2.99万
-
财政年份:1995
-
负责人:Jorge Rocca
-
依托单位:
Research Equipment Grant: Diagnostics of Hot Capillary Discharge Plasmas for Efficient Soft X-Ray Sources
-
批准号:9412106
-
项目类别:Standard Grant
-
资助金额:$6.4万
-
财政年份:1994
-
负责人:Jorge Rocca
-
依托单位:
Efficient Sources of Soft X-Ray Radiation Based on Fast Capillary Discharges
-
批准号:9401952
-
项目类别:Continuing Grant
-
资助金额:$30.31万
-
财政年份:1994
-
负责人:Jorge Rocca
-
依托单位:
STUDY OF THE DYNAMICS OF HIGHLY IONIZED CAPILLARY DISCHARGE PLASMAS FOR XUV LASERS
-
批准号:9013372
-
项目类别:Continuing Grant
-
资助金额:$22.2万
-
财政年份:1991
-
负责人:Jorge Rocca
-
依托单位:
国内基金
海外基金
具有共形结构的高性能Ta4SiTe4基有机/无机复合柔性热电薄膜
-
批准号:52172255
-
项目类别:面上项目
-
资助金额:58万元
-
批准年份:2021
-
负责人:瞿三寅
-
依托单位:
新型WDR5蛋白Win site抑制剂的合理设计、合成及其抗肿瘤活性研究
-
批准号:82103981
-
项目类别:青年科学基金项目(C类)
-
资助金额:30.0万元
-
批准年份:2021
-
负责人:陈维琳
-
依托单位:
基于重要农地保护LESA(Land Evaluation and Site Assessment)体系思想的高标准基本农田建设研究
-
批准号:41340011
-
项目类别:专项基金项目
-
资助金额:20.0万元
-
批准年份:2013
-
负责人:钱凤魁
-
依托单位: