REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
批准号:
1461231
负责人:
Jorge Rocca
金额:
$33.56万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2015
资助国家:
美国
项目状态:
已结题
起止时间:
2015-03-01 至 2018-09-30
中文摘要
该项目的更广泛意义:极紫外线工程研究中心(EUV ERC)是科罗拉多州立大学(CSU)、科罗拉多大学博尔德分校(CU Boulder)、加州大学伯克利分校(UC Berkeley)和20家公司附属机构之间的合作伙伴关系,将通过美国国家科学基金会(NSF)[工程教育部EEC-1461231]提供的3年本科生研究经验(REU)资助,为来自美国各地学院和大学的30名本科生提供暑期研究实习机会。被该计划录取的学生将参加为期10周的计划,其中包括在尖端工程项目中进行研究,参加科学研讨会和行业图尔斯参观,并展示他们的成果。该中心认识到学生在学术研究中能够互动和欣赏工业文化的重要性。因此,这笔赠款的目标是利用这些伙伴关系,使校友REU实习生被安置到行业实习。该中心还与少数民族服务机构建立了积极的伙伴关系,并致力于为代表性不足的少数民族学生提供机会。中心将通过与Morehouse学院的Willie罗克伍德教授的合作来扩大参与,Morehouse学院是一所历史悠久的黑人学院/大学(HBCU),他与中心合作已有10年的历史,是这项资助的共同PI。项目描述:光谱的EUV区域(波长约为5 - 50 nm)的光是对半导体工业和国民经济至关重要的关键技术。EUV ERC将提供夏季研究实习,涉及EUV科学和技术主题,如激光系统,纳米科学(量子点),电子(印刷电路板)电路设计,光子技术(椭圆偏振法、相移干涉法以及环境条件和低温真空光谱法)、光学设计(布鲁斯特的角板分束器)、光刻(对下一代计算机处理器制造至关重要)、化学和材料科学(光致抗蚀剂)以及高压系统。可能的项目名称包括:EUV激光烧蚀质谱法的纳米级分辨率质量显微镜;使用高谐波EUV光的光电子动力学;以及,设计和建造一个新的真空室测试床,用于表征纳米级磁性材料的超快时间分辨率。该中心与工业界建立了积极的合作伙伴关系,以开发来自该中心研究的EUV技术。该中心认识到学生在学术研究中能够互动和欣赏工业文化的重要性。因此,这笔赠款的目标是利用这些伙伴关系,使校友REU实习生被安置到行业实习。
英文摘要
BROADER SIGNIFICANCE OF THE PROJECT:The Extreme Ultraviolet Engineering Research Center (EUV ERC), a partnership between Colorado State University (CSU), the University of Colorado, Boulder (CU Boulder), the University of California, Berkeley (UC Berkeley) and 20 corporate affiliates, will provide summer research internships to 30 undergraduate students from colleges and universities across the United States through a 3-year Research Experience for Undergraduates (REU) grant from the National Science Foundation (NSF) [Division of Engineering Education EEC-1461231]. Students who are accepted into the program will participate at one of the 3 campuses in a 10-week program that involves conducting research in a cutting-edge engineering project, attending scientific seminars and industry tours, and presenting their results. The Center recognizes the importance of students in academic research to be able to interact and appreciate the industrial culture. As a result, a goal of this grant is to leverage these partnerships to enable alumni REU interns to be placed into industry internships. The Center also has active partnerships with minority serving institutions and is committed to providing opportunities for students from underrepresented minority groups. The Center will broaden participation by joining efforts with, Professor Willie Rockwood of Morehouse College, a Historically Black College/Univ. (HBCU), who has a 10 year history of working with the Center and is co-PI of this grant.PROJECT DESCRIPTION:Light in the EUV region of the spectrum (wavelengths approximately 5 - 50 nm) is the key enabling technology of critical importance to the semiconductor industry and national economy. The EUV ERC will provide summer research internships that involve EUV science and technology topics such as laser systems, nanoscience (quantum dots), electronic (printed board) circuit design, photonic techniques (ellipsometry, phase shifting interferometry and both ambient condition and low-temperature vacuum spectroscopy), optics design (Brewster's Angle plate beam splitter), lithography (essential to next generation computer processor manufacturing), chemistry and material science (photo resists), and high voltage systems. Titles of possible projects include: Nanoscale resolution mass-microscope by EUV laser ablation mass spectrometry; Photoelectron dynamics using high harmonic EUV light; and, the Design and construction of a new vacuum chamber test bed for characterizing magnetic materials at the nano-scale with ultrafast time resolution. The Center has an active partnership with Industries in the development of EUV-technologies that derive from research conducted at the Center. The Center recognizes the importance of students in academic research to be able to interact and appreciate the industrial culture. As a result, a goal of this grant is to leverage these partnerships to enable alumni REU interns to be placed into industry internships.
期刊论文(1)
专著(0)
科研奖励(0)
会议论文
Nonresonant coherent amplitude transfer in attosecond four-wave-mixing spectroscopy
阿秒四波混频光谱中的非共振相干振幅传递
DOI:
10.1103/physreva.107.023526
发表时间:
2023
期刊:
Physical Review A
影响因子:
2.9
作者:
[Gaynor, James D., Fidler, Ashley P., Kobayashi, Yuki, Lin, Yen-Cheng, Keenan, Clare L., Neumark, Daniel M., Leone, Stephen R.]
通讯作者:
Leone, Stephen R.
PFI-TT: Enhancing the Mass Production of Advanced Integrated Circuits
-
批准号:2141227
-
项目类别:Standard Grant
-
资助金额:$25.0万
-
财政年份:2022
-
负责人:Jorge Rocca
-
依托单位:
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
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批准号:1852537
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项目类别:Standard Grant
-
资助金额:$37.13万
-
财政年份:2019
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负责人:Jorge Rocca
-
依托单位:
PFI:AIR - TT: Pulse Shaping for Increased Conversion Efficiency in Extreme Ultraviolet Lithography Sources for the Fabrication of Next Generation Integrated Circuits
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批准号:1701238
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项目类别:Standard Grant
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资助金额:$19.99万
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财政年份:2017
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负责人:Jorge Rocca
-
依托单位:
OP: Transforming Table-top Soft X-Ray Lasers into High Average Power Devices
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批准号:1509925
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项目类别:Standard Grant
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资助金额:$40.0万
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财政年份:2015
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负责人:Jorge Rocca
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依托单位:
NSF EUV ERC RET in Engineering & Computer Science Site Program
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批准号:1301436
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项目类别:Standard Grant
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资助金额:$31.87万
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财政年份:2014
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负责人:Jorge Rocca
-
依托单位:
AIR Option 2: Research Alliance - Development of key technology for next generation projection lithography of integrated circuits at 6.X nm wavelength
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批准号:1343456
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项目类别:Standard Grant
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资助金额:$40.0万
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财政年份:2013
-
负责人:Jorge Rocca
-
依托单位:
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
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批准号:1157036
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项目类别:Continuing Grant
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资助金额:$28.7万
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财政年份:2012
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负责人:Jorge Rocca
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依托单位:
High Energy Density Plasmas in Ultrafast Micro-Capillary Discharges
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批准号:1004295
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项目类别:Continuing Grant
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资助金额:$59.1万
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财政年份:2010
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负责人:Jorge Rocca
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依托单位:
MRI-R2: Development of a high average power table-top extreme ultraviolet/soft x-ray laser beam line for science at the nanoscale
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批准号:0960274
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项目类别:Standard Grant
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资助金额:$150.0万
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财政年份:2010
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负责人:Jorge Rocca
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依托单位:
RET-Site Program in Light & Optics for the NSF EUV ERC
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批准号:0808763
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项目类别:Standard Grant
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资助金额:$33.33万
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财政年份:2008
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负责人:Jorge Rocca
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依托单位:
MRI: Development of the Next Generation of Compact Coherent Extreme Ultraviolet Sources
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批准号:0521649
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项目类别:Standard Grant
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资助金额:$90.0万
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财政年份:2005
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负责人:Jorge Rocca
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依托单位:
Engineering Research Center for Extreme Ultraviolet Science and Technology
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批准号:0310717
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项目类别:Cooperative Agreement
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资助金额:$2895.81万
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财政年份:2003
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负责人:Jorge Rocca
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依托单位:
Student and Young Scientist Participation in the 8th International Conference on X-Ray Lasers to be held in Aspen, Colorado
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批准号:0201947
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项目类别:Standard Grant
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资助金额:$0.6万
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财政年份:2002
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负责人:Jorge Rocca
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依托单位:
MRI: Development of an Intense Table-Top Soft X-Ray Laser Source of Picosecond Pulses
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批准号:9977677
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项目类别:Standard Grant
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资助金额:$53.07万
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财政年份:1999
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负责人:Jorge Rocca
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依托单位:
Basic Issues of the Dynamcis and Radiation of Capillary Discharge Plasmas
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批准号:9713297
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项目类别:Standard Grant
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资助金额:$46.1万
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财政年份:1997
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负责人:Jorge Rocca
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依托单位:
International Collaboration for the Study of Fast Capillary Discharge Plasmas as Efficient Sources for X-Ray Radiation
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批准号:9412916
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项目类别:Continuing Grant
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资助金额:$2.99万
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财政年份:1995
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负责人:Jorge Rocca
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依托单位:
Development of a Soft X-Ray Laser for the Study of Metal and Semi-metal Oxide Nanoclusters
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批准号:9512282
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项目类别:Standard Grant
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资助金额:$38.78万
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财政年份:1995
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负责人:Jorge Rocca
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依托单位:
Research Equipment Grant: Diagnostics of Hot Capillary Discharge Plasmas for Efficient Soft X-Ray Sources
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批准号:9412106
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项目类别:Standard Grant
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资助金额:$6.4万
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财政年份:1994
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负责人:Jorge Rocca
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依托单位:
Efficient Sources of Soft X-Ray Radiation Based on Fast Capillary Discharges
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批准号:9401952
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项目类别:Continuing Grant
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资助金额:$30.31万
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财政年份:1994
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负责人:Jorge Rocca
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依托单位:
STUDY OF THE DYNAMICS OF HIGHLY IONIZED CAPILLARY DISCHARGE PLASMAS FOR XUV LASERS
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批准号:9013372
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项目类别:Continuing Grant
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资助金额:$22.2万
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财政年份:1991
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负责人:Jorge Rocca
-
依托单位:
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具有共形结构的高性能Ta4SiTe4基有机/无机复合柔性热电薄膜
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批准年份:2021
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新型WDR5蛋白Win site抑制剂的合理设计、合成及其抗肿瘤活性研究
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批准年份:2013
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