Major Research Instrumentation: Development of Epitaxial Growth System for Few Layer Semiconductors

主要研究仪器:少层半导体外延生长系统的开发

基本信息

  • 批准号:
    1429143
  • 负责人:
  • 金额:
    $ 75万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    2014
  • 资助国家:
    美国
  • 起止时间:
    2014-08-15 至 2017-07-31
  • 项目状态:
    已结题

项目摘要

Non-technical: Semiconductor technology today is used for many applications including computation, communication, energy conversion, and sensing. Most semiconductor devices used today are built from near-perfect rigid 3-dimensional crystalline solids. However, recent work on a new generation of layered 2-dimensional (2D) materials has generated great scientific and technological interest. These materials consist of single atomic or molecular 2D layers that can be placed on arbitrary substrates such as flexible plastics, or transparent glass while offering performance that is comparable to more expensive electronic materials. 2D semiconductors could have significant impact on technology by enabling low cost flexible and transparent electronics and optoelectronics. They could also enable lower power computation and biological and chemical sensors. This project will enable the development of unique equipment and techniques for synthesis of these 2D semiconductor materials. The material synthesis techniques developed would help the electronics industry as well as equipment manufacturers. The project will help to educate several graduate students and researchers on the details of developing a new growth system, new tools for in situ characterization, and the broad applications and science of 2D materials. The research team will organize annual workshops on 2D layered material epitaxy where researchers from other universities will be invited to share their experiences on development of growth systems for 2D semiconductors, and also share information about the new tools developed under this MRI award.Technical: One of the main challenges in the area of 2D semiconductor research today is the synthesis of electronic grade material. This activity directly addresses the most important challenge by attempting to develop a dedicated molecular beam epitaxial growth system for the synthesis of 2D layered materials. Since the growth and characterization methods needed for 2D materials are quite different from those of 3D crystals, this system will be unique in having a suite of synthesis and characterization capabilities. The MBE system will be specifically developed to help understand and control the complex chemistry and physics of the 2D metal-dichalcogenide epitaxy process. The research team will build upon early work and focus on the synthesis of 2D (monolayer) materials and complex heterostructures by MBE. In collaboration with an instrument manufacturer, a variety of source materials and source types to develop a broad set of technology solutions for growth of 2D layered semiconductors will be developed. The project will investigate in situ real time monitoring and feedback during growth, to enable automatic growth of arbitrary single layers and heterostructures. The ultimate aim is to develop a robust, reproducible MBE-based growth methodology appropriate for further research (electronic/optical properties and device development), as well as future commercialization.
非技术性:当今的半导体技术用于许多应用,包括计算、通信、能量转换和传感。当今使用的大多数半导体器件都是由近乎完美的刚性三维晶体固体制成的。然而,最近关于新一代层状二维(2D)材料的研究引起了巨大的科学和技术兴趣。这些材料由单原子或分子 2D 层组成,可以放置在任意基材上,例如柔性塑料或透明玻璃,同时提供与更昂贵的电子材料相当的性能。二维半导体可以通过实现低成本、灵活、透明的电子产品和光电子产品,对技术产生重大影响。它们还可以实现较低功耗的计算以及生物和化学传感器。该项目将开发用于合成这些二维半导体材料的独特设备和技术。开发的材料合成技术将有助于电子行业和设备制造商。该项目将帮助培养一些研究生和研究人员有关开发新生长系统、原位表征新工具以及二维材料的广泛应用和科学的细节。研究团队将组织年度二维层状材料外延研讨会,邀请其他大学的研究人员分享他们开发二维半导体生长系统的经验,并分享有关该 MRI 奖项开发的新工具的信息。 技术:当今二维半导体研究领域的主要挑战之一是电子级材料的合成。这项活动通过尝试开发用于合成二维层状材料的专用分子束外延生长系统来直接解决最重要的挑战。由于 2D 材料所需的生长和表征方法与 3D 晶体的生长和表征方法有很大不同,因此该系统的独特之处在于拥有一套合成和表征能力。 MBE 系统将专门开发用于帮助理解和控制二维金属二硫化物外延工艺的复杂化学和物理过程。 研究团队将在早期工作的基础上,重点研究通过 MBE 合成 2D(单层)材料和复杂异质结构。将与仪器制造商合作,开发各种源材料和源类型,以开发用于二维层状半导体生长的广泛技术解决方案。该项目将研究生长过程中的原位实时监控和反馈,以实现任意单层和异质结构的自动生长。最终目标是开发一种稳健、可重复的基于 MBE 的生长方法,适合进一步研究(电子/光学特性和器件开发)以及未来的商业化。

项目成果

期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)

数据更新时间:{{ journalArticles.updateTime }}

{{ item.title }}
{{ item.translation_title }}
  • DOI:
    {{ item.doi }}
  • 发表时间:
    {{ item.publish_year }}
  • 期刊:
  • 影响因子:
    {{ item.factor }}
  • 作者:
    {{ item.authors }}
  • 通讯作者:
    {{ item.author }}

数据更新时间:{{ journalArticles.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ monograph.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ sciAawards.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ conferencePapers.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ patent.updateTime }}

Siddharth Rajan其他文献

Al‐Rich AlGaN Transistors with Regrown p‐AlGaN Gate Layers and Ohmic Contacts
具有再生 p-AlGaN 栅极层和欧姆接触的富铝 AlGaN 晶体管
  • DOI:
    10.1002/admi.202301080
  • 发表时间:
    2024
  • 期刊:
  • 影响因子:
    5.4
  • 作者:
    B.A. Klein;Andrew A. Allerman;A.M. Armstrong;M. Rosprim;Colin Tyznik;Yinxuan Zhu;C. Joishi;Chris Chae;Siddharth Rajan
  • 通讯作者:
    Siddharth Rajan
Design and Simulation of a III-Nitride Light Emitting Transistor
III 族氮化物发光晶体管的设计与仿真
  • DOI:
  • 发表时间:
    2024
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Mohammad Awwad;Sheikh Ifatur Rahman;C. Joishi;B. L. Anderson;Siddharth Rajan
  • 通讯作者:
    Siddharth Rajan
Band alignment of grafted monocrystalline Si (0 0 1)/β-Ga2O3 (0 1 0) p-n heterojunction determined by X-ray photoelectron spectroscopy
X 射线光电子能谱测定接枝单晶 Si (0 0 1)/β-Ga2O3 (0 1 0) p-n 异质结的能带排列
  • DOI:
    10.1016/j.apsusc.2024.159615
  • 发表时间:
    2023
  • 期刊:
  • 影响因子:
    6.7
  • 作者:
    Jiarui Gong;Jie Zhou;Ashok Dheenan;Moheb Sheikhi;F. Alema;T. Ng;S. Pasayat;Qiaoqiang Gan;A. Osinsky;Vincent Gambin;Chirag Gupta;Siddharth Rajan;Boon S. Ooi;Zhenqiang Ma
  • 通讯作者:
    Zhenqiang Ma
All MOCVD grown Al<sub>0.7</sub>Ga<sub>0.3</sub>N/Al<sub>0.5</sub>Ga<sub>0.5</sub>N HFET: An approach to make ohmic contacts to Al-rich AlGaN channel transistors
  • DOI:
    10.1016/j.sse.2019.107696
  • 发表时间:
    2020-02-01
  • 期刊:
  • 影响因子:
  • 作者:
    Hao Xue;Seongmo Hwang;Towhidur Razzak;Choonghee Lee;Gabriel Calderon Ortiz;Zhanbo Xia;Shahadat Hasan Sohel;Jinwoo Hwang;Siddharth Rajan;Asif Khan;Wu Lu
  • 通讯作者:
    Wu Lu

Siddharth Rajan的其他文献

{{ item.title }}
{{ item.translation_title }}
  • DOI:
    {{ item.doi }}
  • 发表时间:
    {{ item.publish_year }}
  • 期刊:
  • 影响因子:
    {{ item.factor }}
  • 作者:
    {{ item.authors }}
  • 通讯作者:
    {{ item.author }}

{{ truncateString('Siddharth Rajan', 18)}}的其他基金

FuSe-TG: Co-design based Wide bandgap Semiconductor Research Center
FuSe-TG:基于协同设计的宽带隙半导体研究中心
  • 批准号:
    2235373
  • 财政年份:
    2023
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant
Collaborative Research: FuSe: Heterogeneous Integration of III-Nitride and Boron Arsenide for Enhanced Thermal and Electronic Performance
合作研究:FuSe:III族氮化物和砷化硼的异质集成以增强热和电子性能
  • 批准号:
    2329108
  • 财政年份:
    2023
  • 资助金额:
    $ 75万
  • 项目类别:
    Continuing Grant
MRI: Acquisition of Electron Beam Lithography System for Next-Generation Nanomanufacturing and Education
MRI:采购用于下一代纳米制造和教育的电子束光刻系统
  • 批准号:
    2018876
  • 财政年份:
    2020
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant
76th Device Research Conference (DRC) to be held at the University of California, Santa Barbara, June 24 to 27, 2018
第 76 届设备研究会议 (DRC) 将于 2018 年 6 月 24 日至 27 日在加州大学圣塔芭芭拉分校举行
  • 批准号:
    1836790
  • 财政年份:
    2018
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant
Beta-Gallium Oxide Transistors for High Frequency Applications
适用于高频应用的 β-氧化镓晶体管
  • 批准号:
    1809682
  • 财政年份:
    2018
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant
E2CDA: Type II: Collaborative Research: Metal-insulator transitions for low power switching devices
E2CDA:类型 II:协作研究:低功率开关器件的金属绝缘体转换
  • 批准号:
    1740119
  • 财政年份:
    2017
  • 资助金额:
    $ 75万
  • 项目类别:
    Continuing Grant
Workshop on Ultra-Wide Band Gap (UWBG) Semiconductors: Research Opportunities and Directions- April 25-26, 2016, Arlington VA
超宽带隙 (UWBG) 半导体研讨会:研究机会和方向 - 2016 年 4 月 25 日至 26 日,弗吉尼亚州阿灵顿
  • 批准号:
    1641056
  • 财政年份:
    2016
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant
PFI:AIR - TT: High Efficiency Ultraviolet Light Emitting Diodes Based on Tunneling
PFI:AIR - TT:基于隧道的高效紫外发光二极管
  • 批准号:
    1640700
  • 财政年份:
    2016
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant
Collaborative Research EAGER: Reliable High Current Density Vacuum Electronics
合作研究 EAGER:可靠的高电流密度真空电子器件
  • 批准号:
    1450508
  • 财政年份:
    2014
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant
High Conductivity Tunnel Junctions for Next-Generation UV Emitters
用于下一代紫外线发射器的高电导率隧道结
  • 批准号:
    1408416
  • 财政年份:
    2014
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant

相似国自然基金

Research on Quantum Field Theory without a Lagrangian Description
  • 批准号:
    24ZR1403900
  • 批准年份:
    2024
  • 资助金额:
    0.0 万元
  • 项目类别:
    省市级项目
Cell Research
  • 批准号:
    31224802
  • 批准年份:
    2012
  • 资助金额:
    24.0 万元
  • 项目类别:
    专项基金项目
Cell Research
  • 批准号:
    31024804
  • 批准年份:
    2010
  • 资助金额:
    24.0 万元
  • 项目类别:
    专项基金项目
Cell Research (细胞研究)
  • 批准号:
    30824808
  • 批准年份:
    2008
  • 资助金额:
    24.0 万元
  • 项目类别:
    专项基金项目
Research on the Rapid Growth Mechanism of KDP Crystal
  • 批准号:
    10774081
  • 批准年份:
    2007
  • 资助金额:
    45.0 万元
  • 项目类别:
    面上项目

相似海外基金

Major Research Instrumentation for integration of efficient effects in multi-material structural components
用于集成多材料结构部件的高效效应的主要研究仪器
  • 批准号:
    445707542
  • 财政年份:
    2020
  • 资助金额:
    $ 75万
  • 项目类别:
    Major Research Instrumentation
Innovation Major Research Instrumentation
创新专业研究仪器
  • 批准号:
    417345274
  • 财政年份:
    2019
  • 资助金额:
    $ 75万
  • 项目类别:
    Major Research Instrumentation
Technical Assistance Workshops to Broaden Participation in the National Science Foundation's Major Research Instrumentation (MRI) Program
技术援助研讨会扩大对美国国家科学基金会主要研究仪器 (MRI) 计划的参与
  • 批准号:
    1219780
  • 财政年份:
    2012
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant
MRI-Acquisition: Puerto Rico Atmospheric Major Research Laser Instrumentation Program (PR-LASER)
MRI 采集:波多黎各大气主要研究激光仪器计划 (PR-LASER)
  • 批准号:
    1126123
  • 财政年份:
    2011
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant
MRI: Acquisition of Major Research Instrumentation for Advanced Photoelectron Spectroscopy with Spin, Angle and Spatial Resolution
MRI:采购具有自旋、角度和空间分辨率的先进光电子能谱的主要研究仪器
  • 批准号:
    0923125
  • 财政年份:
    2009
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant
Providing Technical Assistance to Increase the Participation and Competitiveness of Minority Institutions in the Major Research Instrumentation Program
提供技术援助,提高少数机构在重大研究仪器计划中的参与度和竞争力
  • 批准号:
    0807841
  • 财政年份:
    2008
  • 资助金额:
    $ 75万
  • 项目类别:
    Continuing Grant
MRI: Acquisition of Major Instrumentation for Watershed Biogeochemistry Research
MRI:采购用于流域生物地球化学研究的主要仪器
  • 批准号:
    0722813
  • 财政年份:
    2007
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant
Major Instrumentation for Undergraduate Research and Teaching at Point Loma Nazarene University
洛马角拿撒勒大学本科生研究和教学的主要仪器
  • 批准号:
    0619057
  • 财政年份:
    2006
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant
Acquisition of Major Research Instrumentation for Expanding Genetic Databases in Comparative Primatology
购买主要研究仪器以扩展比较灵长类动物学的遗传数据库
  • 批准号:
    0521705
  • 财政年份:
    2005
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant
MRI: Acquisition of Major Research Instrumentation for Fabrication and Characterization of Micro and Nanostructures for Sensing
MRI:采购用于传感微纳米结构制造和表征的主要研究仪器
  • 批准号:
    0520733
  • 财政年份:
    2005
  • 资助金额:
    $ 75万
  • 项目类别:
    Standard Grant
{{ showInfoDetail.title }}

作者:{{ showInfoDetail.author }}

知道了