Major Research Instrumentation: Development of Epitaxial Growth System for Few Layer Semiconductors
主要研究仪器:少层半导体外延生长系统的开发
基本信息
- 批准号:1429143
- 负责人:
- 金额:$ 75万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2014
- 资助国家:美国
- 起止时间:2014-08-15 至 2017-07-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Non-technical: Semiconductor technology today is used for many applications including computation, communication, energy conversion, and sensing. Most semiconductor devices used today are built from near-perfect rigid 3-dimensional crystalline solids. However, recent work on a new generation of layered 2-dimensional (2D) materials has generated great scientific and technological interest. These materials consist of single atomic or molecular 2D layers that can be placed on arbitrary substrates such as flexible plastics, or transparent glass while offering performance that is comparable to more expensive electronic materials. 2D semiconductors could have significant impact on technology by enabling low cost flexible and transparent electronics and optoelectronics. They could also enable lower power computation and biological and chemical sensors. This project will enable the development of unique equipment and techniques for synthesis of these 2D semiconductor materials. The material synthesis techniques developed would help the electronics industry as well as equipment manufacturers. The project will help to educate several graduate students and researchers on the details of developing a new growth system, new tools for in situ characterization, and the broad applications and science of 2D materials. The research team will organize annual workshops on 2D layered material epitaxy where researchers from other universities will be invited to share their experiences on development of growth systems for 2D semiconductors, and also share information about the new tools developed under this MRI award.Technical: One of the main challenges in the area of 2D semiconductor research today is the synthesis of electronic grade material. This activity directly addresses the most important challenge by attempting to develop a dedicated molecular beam epitaxial growth system for the synthesis of 2D layered materials. Since the growth and characterization methods needed for 2D materials are quite different from those of 3D crystals, this system will be unique in having a suite of synthesis and characterization capabilities. The MBE system will be specifically developed to help understand and control the complex chemistry and physics of the 2D metal-dichalcogenide epitaxy process. The research team will build upon early work and focus on the synthesis of 2D (monolayer) materials and complex heterostructures by MBE. In collaboration with an instrument manufacturer, a variety of source materials and source types to develop a broad set of technology solutions for growth of 2D layered semiconductors will be developed. The project will investigate in situ real time monitoring and feedback during growth, to enable automatic growth of arbitrary single layers and heterostructures. The ultimate aim is to develop a robust, reproducible MBE-based growth methodology appropriate for further research (electronic/optical properties and device development), as well as future commercialization.
非技术性:当今的半导体技术用于许多应用,包括计算、通信、能量转换和传感。今天使用的大多数半导体器件都是由近乎完美的刚性三维晶体固体制成的。然而,最近关于新一代层状二维(2D)材料的工作产生了极大的科学和技术兴趣。这些材料由单个原子或分子的2D层组成,可以放置在柔性塑料或透明玻璃等任意基板上,同时提供与更昂贵的电子材料相当的性能。2D半导体可以通过实现低成本、灵活和透明的电子和光电子技术对技术产生重大影响。它们还可以实现低功耗计算以及生物和化学传感器。该项目将开发用于合成这些2D半导体材料的独特设备和技术。开发的材料合成技术将有助于电子工业和设备制造商。该项目将有助于教育一些研究生和研究人员开发新的生长系统的细节,新的原位表征工具,以及二维材料的广泛应用和科学。该研究团队将组织2D层状材料外延的年度研讨会,邀请其他大学的研究人员分享他们在2D半导体生长系统开发方面的经验,并分享在MRI奖下开发的新工具的信息。技术:当今2D半导体研究领域的主要挑战之一是电子级材料的合成。该活动通过尝试开发用于合成2D分层材料的专用分子束外延生长系统,直接解决了最重要的挑战。由于2D材料所需的生长和表征方法与3D晶体的生长和表征方法完全不同,因此该系统将具有一套独特的合成和表征能力。 MBE系统将专门开发,以帮助理解和控制2D金属-二硫属化物外延工艺的复杂化学和物理过程。 研究团队将在早期工作的基础上,专注于通过MBE合成2D(单层)材料和复杂的异质结构。与仪器制造商合作,将开发各种源材料和源类型,以开发用于2D分层半导体生长的广泛技术解决方案。该项目将研究生长过程中的原位真实的时间监测和反馈,以实现任意单层和异质结构的自动生长。最终目标是开发一种稳健的,可重复的基于MBE的生长方法,适用于进一步的研究(电子/光学特性和器件开发)以及未来的商业化。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
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Siddharth Rajan其他文献
Al‐Rich AlGaN Transistors with Regrown p‐AlGaN Gate Layers and Ohmic Contacts
具有再生 p-AlGaN 栅极层和欧姆接触的富铝 AlGaN 晶体管
- DOI:
10.1002/admi.202301080 - 发表时间:
2024 - 期刊:
- 影响因子:5.4
- 作者:
B.A. Klein;Andrew A. Allerman;A.M. Armstrong;M. Rosprim;Colin Tyznik;Yinxuan Zhu;C. Joishi;Chris Chae;Siddharth Rajan - 通讯作者:
Siddharth Rajan
Design and Simulation of a III-Nitride Light Emitting Transistor
III 族氮化物发光晶体管的设计与仿真
- DOI:
- 发表时间:
2024 - 期刊:
- 影响因子:0
- 作者:
Mohammad Awwad;Sheikh Ifatur Rahman;C. Joishi;B. L. Anderson;Siddharth Rajan - 通讯作者:
Siddharth Rajan
Band alignment of grafted monocrystalline Si (0 0 1)/β-Ga2O3 (0 1 0) p-n heterojunction determined by X-ray photoelectron spectroscopy
X 射线光电子能谱测定接枝单晶 Si (0 0 1)/β-Ga2O3 (0 1 0) p-n 异质结的能带排列
- DOI:
10.1016/j.apsusc.2024.159615 - 发表时间:
2023 - 期刊:
- 影响因子:6.7
- 作者:
Jiarui Gong;Jie Zhou;Ashok Dheenan;Moheb Sheikhi;F. Alema;T. Ng;S. Pasayat;Qiaoqiang Gan;A. Osinsky;Vincent Gambin;Chirag Gupta;Siddharth Rajan;Boon S. Ooi;Zhenqiang Ma - 通讯作者:
Zhenqiang Ma
All MOCVD grown Al<sub>0.7</sub>Ga<sub>0.3</sub>N/Al<sub>0.5</sub>Ga<sub>0.5</sub>N HFET: An approach to make ohmic contacts to Al-rich AlGaN channel transistors
- DOI:
10.1016/j.sse.2019.107696 - 发表时间:
2020-02-01 - 期刊:
- 影响因子:
- 作者:
Hao Xue;Seongmo Hwang;Towhidur Razzak;Choonghee Lee;Gabriel Calderon Ortiz;Zhanbo Xia;Shahadat Hasan Sohel;Jinwoo Hwang;Siddharth Rajan;Asif Khan;Wu Lu - 通讯作者:
Wu Lu
Siddharth Rajan的其他文献
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{{ truncateString('Siddharth Rajan', 18)}}的其他基金
FuSe-TG: Co-design based Wide bandgap Semiconductor Research Center
FuSe-TG:基于协同设计的宽带隙半导体研究中心
- 批准号:
2235373 - 财政年份:2023
- 资助金额:
$ 75万 - 项目类别:
Standard Grant
Collaborative Research: FuSe: Heterogeneous Integration of III-Nitride and Boron Arsenide for Enhanced Thermal and Electronic Performance
合作研究:FuSe:III族氮化物和砷化硼的异质集成以增强热和电子性能
- 批准号:
2329108 - 财政年份:2023
- 资助金额:
$ 75万 - 项目类别:
Continuing Grant
MRI: Acquisition of Electron Beam Lithography System for Next-Generation Nanomanufacturing and Education
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2018876 - 财政年份:2020
- 资助金额:
$ 75万 - 项目类别:
Standard Grant
76th Device Research Conference (DRC) to be held at the University of California, Santa Barbara, June 24 to 27, 2018
第 76 届设备研究会议 (DRC) 将于 2018 年 6 月 24 日至 27 日在加州大学圣塔芭芭拉分校举行
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1836790 - 财政年份:2018
- 资助金额:
$ 75万 - 项目类别:
Standard Grant
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适用于高频应用的 β-氧化镓晶体管
- 批准号:
1809682 - 财政年份:2018
- 资助金额:
$ 75万 - 项目类别:
Standard Grant
E2CDA: Type II: Collaborative Research: Metal-insulator transitions for low power switching devices
E2CDA:类型 II:协作研究:低功率开关器件的金属绝缘体转换
- 批准号:
1740119 - 财政年份:2017
- 资助金额:
$ 75万 - 项目类别:
Continuing Grant
Workshop on Ultra-Wide Band Gap (UWBG) Semiconductors: Research Opportunities and Directions- April 25-26, 2016, Arlington VA
超宽带隙 (UWBG) 半导体研讨会:研究机会和方向 - 2016 年 4 月 25 日至 26 日,弗吉尼亚州阿灵顿
- 批准号:
1641056 - 财政年份:2016
- 资助金额:
$ 75万 - 项目类别:
Standard Grant
PFI:AIR - TT: High Efficiency Ultraviolet Light Emitting Diodes Based on Tunneling
PFI:AIR - TT:基于隧道的高效紫外发光二极管
- 批准号:
1640700 - 财政年份:2016
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$ 75万 - 项目类别:
Standard Grant
Collaborative Research EAGER: Reliable High Current Density Vacuum Electronics
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1450508 - 财政年份:2014
- 资助金额:
$ 75万 - 项目类别:
Standard Grant
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- 批准号:
1408416 - 财政年份:2014
- 资助金额:
$ 75万 - 项目类别:
Standard Grant
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