New Scalable Nanomanufacturing Technology: Large-Area Nanoimprint Master Fabrication without Using EBL by Innovative Multi-Set Nanopatterning

纳米制造中的两个中心挑战是在不使用电子束光刻或基于串行写入方法的类似方法的情况下在大面积上生成复杂的纳米图案，并且以低成本生成它们。 大面积复杂纳米粒子具有巨大的技术重要性和许多商业应用，影响了数十亿美元的广泛行业。 然而，目前，作为半导体芯片工业中的主力的最先进的光刻是极其昂贵的，并且限于12英寸直径区域、平坦表面和大约30纳米的周期。 该奖项支持探索新的改变道路的创新方法的研究，为上述两个挑战提供解决方案。这项研究将独特地联合收割机知识和技术从多个学科创造大面积纳米图案。它将带来制造大面积复杂纳米材料的新知识和新技术，并将为许多研究和应用领域提供材料和技术，如太阳能电池、固态照明、生物技术、燃料电池、数据存储、光通信、半导体集成电路和显示器。为了克服纳米制造的挑战，这项研究将探索一种新的创新路径改变方法，称为“多组纳米图案化”（MSN）。 MSN可以在大面积上生成复杂的纳米结构，而无需使用电子束光刻或类似的串行写入方法。该方法包括三个创新的非传统技术和他们的创造性叠加或多种用途。它们是（i）傅立叶纳米压印图案化，（ii）边缘引导纳米图案化，和（iii）纳米结构自完善。每种单独的技术都可以创建以前无法生成的复杂纳米结构，但是，当它们结合在一起时，它们可以以低成本在大面积上生成更复杂的纳米粒子。该研究将探索每种方法的科学和技术及其组合使用。此外，该研究将推进纳米压印模具复制的新方法，并将使用大面积纳米等离子体和卷对卷纳米压印作为技术开发的试验台。

Two central challenges in nanomanufacturing are to generate complex nanopatterns over large areas without using electron beam lithography or similar approaches that are based on a serial writing method, and to generate them at low cost. Large-area complex nanopatterns have enormous technological importance and many commercial applications impacting a broad range of multi-billion dollar industries. However, currently, the most advanced lithography, which is the workhorse in semiconductor chip industry, is extremely expensive and is limited to a 12 inch diameter area, flat surfaces, and a period of about 30 nanometers. This award supports research that explores new path-changing innovative approaches to provide solutions to the above two challenges. The research will uniquely combine knowledge and technologies from multiple disciplines to create large-area nanopatterning. It will lead to new knowledge and technologies in the fabrication of a broad range of large-area complex nanopatterns, and will provide materials and technologies to enable many fields of study and applications, such as, solar cells, solid state lighting, biotechnology, fuel cells, data storage, optical communication, semiconductor integrated circuits, and displays.To overcome the challenges in nanomanufacturing, the research will explore a new innovative path-changing approach, termed "multi-set nanopatterning" (MSN). MSN can generate complex nanostructures over a large area without using electron beam lithography or similar serial writing methods. The approach comprises of three innovative nonconventional techniques and their creative superposition or multiple uses. They are (i) Fourier nanoimprint patterning, (ii) edge-guided nanopatterning, and (iii) nanostructure self-perfection. Each individual technique alone can create complex nanostructures that could not be generated before, but, when they are combined, they can generate far more complex nanopatterns over a large area at low cost. The research will explore the science and technology of each method and their combined use. Furthermore, the research will advance new approaches in nanoimprint mold duplication and will use large area nanoplasmonics and roll-to-roll nanoimprint as test-beds for technology development.