Production of specific 3D nano-particles and nano-structures for the development of an automated optical characterization using high-resolution interference microscopy

生产特定的 3D 纳米颗粒和纳米结构，用于使用高分辨率干涉显微镜开发自动光学表征

• 批准号: 390307847
• 负责人: Professor Dr. Hartmut Hillmer
• 金额: --
• 依托单位: Fachgebiet Messtechnik
• 依托单位国家: 德国
• 项目类别: Research Grants
• 财政年份: 2017
• 资助国家: 德国
• 起止时间: 2016-12-31 至 2021-12-31
• 项目状态: 已结题
• 来源: https://gepris.dfg.de/gepris/projekt/390307847?language=en
• 关键词: Production; specific; 3D; nano; particles

This project is about the production and interferometric characterization of curved structures in the micro- and nanometer range. The structures are produced using nanoimprint lithography (NIL) and measured using a novel characterization method based on a Linnik white-light interferometer. The aim is to expand the NIL process with regard to the variety of shapes and materials to complex 3D structures and to establish a fast, non-contact but high-resolution method, with which even difficult geometries can be measured. When developing the measurement setup and methodology, selected structures with defined geometries and materials are used. In this way, both working groups involved complement each other and develop beneficial synergies.In the first phase of the project, the production of semi-ellipsoidal structures using isotropic dry etching was already demonstrated. Furthermore, a NIL process to produce 3D metal structures through precise multiple imprinting was established. To characterize the structures, an “adaptive” measurement concept based on a Linnik interferometer was developed and implemented. Using a reference object with a geometry that is adapted to the geometry of the measuring object it can detect deviations in the nanometer range. These can be accessed and evaluated by use of an in-house developed software. The renewal proposal presented here connects directly to the results already achieved in the first funding period. Via substrate conformal nanoimprint lithography (SCIL), metal structures are supposed to be fabricated on top of curved semi-ellipsoidal structures made of polymer. On the one hand, this is aimed at the production of hybrid material structures, on the other hand, a sub-structuring can take place by NIL on curved surfaces and thus opens up new paths towards geometrically demanding structures. The focus will be i. a. on producing a special SCIL stamp that prevents the residual layer from curing during the imprint process.The measurement of differently scaled parts of one structure and the combination of different materials is also a huge challenge for the interferometric measurement system. The goal is to adopt the adaptive concept to a broader variety of measurement geometries and scales. One focus lies on the integration of immersion objectives. This provides the possibility to enhance the resolution of the system and at the same time gain new detailed insight in the behaviour of interferometric measurements in immersion media. Additionally, the system is supposed to be upgraded in order to benefit from polarization dependent effects even under UV-illumination.

本项目是关于微纳米范围内弯曲结构的制作和干涉表征。该结构采用纳米压印光刻技术（NIL）制造，并采用基于林尼克白光干涉仪的新型表征方法进行测量。目的是将NIL过程扩展到各种形状和材料的复杂3D结构，并建立一种快速，非接触但高分辨率的方法，即使是困难的几何形状也可以测量。在开发测量装置和方法时，使用具有定义几何形状和材料的选定结构。这样，两个工作小组就可以相互补充，形成有益的协同作用。在项目的第一阶段，已经演示了使用各向同性干蚀刻生产半椭球结构。在此基础上，建立了一种通过精密多重印迹生产三维金属结构的NIL工艺。为了表征该结构，提出并实现了一种基于林尼克干涉仪的“自适应”测量概念。使用具有与测量对象的几何形状相适应的参考物体，它可以检测纳米范围内的偏差。这些可以通过使用内部开发的软件进行访问和评估。这里提出的续期建议与第一个供资期已经取得的成果直接相关。通过衬底共形纳米压印光刻技术（SCIL），可以在由聚合物制成的弯曲半椭球体结构上制造金属结构。一方面，这是针对混合材料结构的生产，另一方面，子结构可以在曲面上进行，从而为几何要求苛刻的结构开辟了新的途径。重点将是生产一种特殊的SCIL印章，防止在压印过程中残留层固化。对于干涉测量系统来说，测量同一结构的不同尺度部件和不同材料的组合也是一个巨大的挑战。目标是将自适应概念应用于更广泛的测量几何形状和尺度。一个重点在于沉浸目标的整合。这提供了提高系统分辨率的可能性，同时获得了浸入介质中干涉测量行为的新的详细见解。此外，该系统应该进行升级，以便在紫外线照射下受益于偏振依赖效应。