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Is it possible to grow InGaN ternary alloy by HVPE?

Is it possible to grow InGaN ternary alloy by HVPE?
是否可以通过HVPE生长InGaN三元合金?
批准号:
24656011
负责人:
KOUKITU Akinori
金额:
$2.58万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2012
资助国家:
日本
项目状态:
已结题
起止时间:
2012 至 --

项目摘要

项目成果

KOUKITU Akinori的其他基金

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中文摘要
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英文摘要
On the study, InGaNof the key material for Energy-saving society could be grown using a new growth system, where high quality growth of InGaN and high growth rate were realized.The wavelength emitted from InGaN can be varied from 365nm to 1900nm by controlling the solid In composition in InGaN alloy. Therefore, InGaN has attracted attention as a high-efficiency LED, LD and solar cell. However, it is difficult to grow InGaN of In >20%. There is no example of successful high quality InGaN. It was found that InGaN ofIn > 20% could be grown by a new growth system.
期刊论文(16)
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会议论文
HVPE growth of the group III nitrides for bulk growth -from thermodynamic analysis to crystalgrowth?
用于体生长的 III 族氮化物的 HVPE 生长 - 从热力学分析到晶体生长?
DOI: --
发表时间: 2013
期刊:
影响因子: --
作者: [T. Hirasaki, H. Murakami, Y. Kumagai and A. Koukitu, Hisashi Murakami, A. Koukitu, A. Koukitu]
通讯作者: A. Koukitu
様々なハロゲン化合物を用いたInGaN-HVPE成長の熱力学解析
使用各种卤素化合物生长 InGaN-HVPE 的热力学分析
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [平崎貴英, 花岡幸史, 村上尚, 熊谷義直, 纐纈明伯]
通讯作者: 纐纈明伯
Thermodynamic analysis of InGaN-HVPE growth using III-bromides and III-iodides
使用 III 族溴化物和 III 族碘化物生长 InGaN-HVPE 的热力学分析
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [T. Hirasaki, H. Murakami, Y. Kumagai and A. Koukitu]
通讯作者: Y. Kumagai and A. Koukitu
Effects of substrate nitridation and buffer layer on the crystalline improvements of semi-polar InN(10- 13) crystal on GaAs(110) by MOVPE
衬底氮化和缓冲层对MOVPE半极性InN(10-13)晶体在GaAs(110)上结晶改善的影响
DOI: 10.1016/j.jcrysgro.2012.12.020
发表时间: 2013
期刊: Journal of Crystal Growth
影响因子: 1.8
作者: [H.C. Cho, R. Togashi, H. Murakami, Y. Kumagai, A. Koukitu]
通讯作者: A. Koukitu
9
    Thick and high quarity InGaN growth by THVPE
    New Growth Method for Bulk GaN using molecule-controlling method
    Thick Epitaxy of AlN and AlGaN with controlling source molecules and nano-crystal field.
    Thermodynamic interactive database for vapor phase epitaxy using internet