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Formation of Functional Thin Films by a Double Plasma Device

双等离子体装置形成功能薄膜

基本信息

批准号：
62880003
负责人：
SUGAI Hideo
金额：
$ 2.24万
依托单位：
Nagoya University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Developmental Scientific Research
财政年份：
1987
资助国家：
日本
起止时间：
1987 至 1988
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-62880003/
关键词：
Thin Film Plasma Process Ion Beam Electron Beam Microwave Discharge Glow Discharge Double Plasma 反応性プラズマダブルプラズマ

项目摘要

We have proposed a new plasma processing technique called "double plasma method", where two independent plasmas are joined to form ion beams or electron beams. Energy distribution functions of charged particles in a reactive plasma can be controlled in the double plasma device by abjusting the external bias voltage between the two plasmas.In this project, we constructed a double plasma device using an ECR microwave discharge and a cold cathode glow discharge. The experimental results are summarized as follows:1. Production of high-energy ion beams an ion beam was extracted into a low-pressure microwave plasma from a cold-cathode glow discharge having a high plasma potential. The energy of the ion beam could be increased up to a value (600 eV) 2-3 times higher than the previous one.2. Production of electron beams with low energy and large area A low-energy (4-40 eV), large-area (16 cm diam.) electron beam was extracted from the microwave plasma into an externally biased chamber. The beam energy could be varied easily by abjusting the bias voltage, while the beam flux turned out to be limited by the ion loss rate in the microwave plasma.3. Investigation of behaviors of hydrogen radical the behaviors of hydrogen radical governing the film growth and properties were fundamentally investigated. New informations on a hydrogen molecule formation and a hydrogen absorption mechanism were obtained.

我们提出了一种新的等离子体处理技术，称为“双等离子体法”，即两个独立的等离子体连接在一起形成离子束或电子束。在双等离子体装置中，通过调节两个等离子体之间的外加偏置电压，可以控制反应等离子体中带电粒子的能量分布函数。实验结果总结如下：1.高能离子束的产生从具有高等离子体势的冷阴极辉光放电中将离子束引出到低压微波等离子体中。离子束的能量可以增加到比以前高2-3倍的值(600 EV)。低能大面积电子束的生产低能(4-40 eV)、大面积(16厘米直径)电子束从微波等离子体中被提取到一个外偏置的腔室中。通过调节偏置电压可以很容易地改变束流能量，而束流却受到微波等离子体中离子损失率的限制。氢自由基行为的研究从根本上研究了氢自由基对薄膜生长和性能的影响。获得了有关氢分子形成和吸氢机理的新信息。