Development of Low-Energy Particle-Beam Sources for Super-fine Plasma Processing
用于超精细等离子体加工的低能粒子束源的开发
基本信息
- 批准号:01880002
- 负责人:
- 金额:$ 2.62万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Developmental Scientific Research (B).
- 财政年份:1989
- 资助国家:日本
- 起止时间:1989 至 1990
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
In order to realize super-fine plasma processings, several requirements should be satisfied : Ions incident on a substrate should have a monochromatic parallel velocity and a low energy not to give rise to damage, and also a high-flux, uniform, and large beam is necessary. These requirements will be met by developing a low-pressure, large-area, high-density plasma with the low plasma potential. To do this, we have developed a novel plasma production by an inductively coupled rf discharge under a surface magnetic field.Multi-dipole surface magnetic fields produce following effects ; good confinement of high energy electrons, enhancement of plasma production, reduction of bulk-electron diffusion loss, and the resultant increase in plasma density as well as the uniformity. The decrease in the plasma potential is also expected.Promising results were obtained in our prototype device with surface magnetic confinement as follows :1. The discharge plasma was sustained at low pressures such as Torr.2. A uniform, large-diameter (-40cm), high-density plasma with low plasma potential (-20 V) was obtained.3. The plasma potential was controllable with an externally biased small electrode.On the other hand, we have studied ion-induced radical production on surfaces ; fragmentation of high-energy poly-atomic ions at their impact on surfaces. This type of plasma-surface interactions is of interest since it can be applied to a new source of radical beams.
为了实现超精细等离子体加工,应满足以下几个要求:入射到衬底上的离子应具有单色平行速度和低能量,以不引起损伤,并且还需要高通量、均匀和大的束。这些要求将通过开发低压、大面积、高密度、低等离子体电势的等离子体来满足。为此,我们开发了一种新颖的等离子体产生电感耦合射频放电下的表面磁场,多偶极子表面磁场产生以下效果:良好的约束高能电子,增强等离子体的生产,减少体电子扩散损失,并在等离子体密度以及均匀性的增加。在我们的表面磁约束原型装置中,得到了如下令人满意的结果:1。放电等离子体维持在低压,如Torr.2。获得了均匀、大直径(~ 40 cm)、高密度、低等离子体电位(~ 20 V)的等离子体.等离子体电位是可控的外部偏置的小电极。另一方面,我们已经研究了离子诱导的自由基产生的表面上,高能量的多原子离子的碎片在其影响的表面。这种类型的等离子体表面相互作用是感兴趣的,因为它可以应用到一个新的自由基束源。
项目成果
期刊论文数量(12)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Hideyuki Kojima,Hirotaka Toyoda,Hideo Sugai: "Observation of CH_2 Radical and Comparison with CH_3 Radical in a RF Methane Discharge" Applied Physics Letters. 55. 1292-1294 (1989)
Hideyuki Kojima、Hirotaka Toyoda、Hideo Sugai:“RF 甲烷放电中 CH_2 自由基的观察及其与 CH_3 自由基的比较”应用物理快报。
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- 影响因子:0
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Hideo Sugai,Noriyuki Yabuoshi,Hirotaka Toyoda: "Generation of a Large Electron Beam for Plasma Processing" Japanese Journal of Applied Physics. 28. L868-L870 (1989)
Hideo Sugai、Noriyuki Yabuoshi、Hirotaka Toyoda:“用于等离子体处理的大型电子束的生成”日本应用物理学杂志。
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- 影响因子:0
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T.Shirakawa 他: "RF Plasma Production at Ultralow Pressures with Surface Magnetic Confinement" Japanese Journal of Applied Physics. 29. 1015-1018 (1990)
T. Shirakawa 等人:“利用表面磁约束在超低压下产生射频等离子体”,《日本应用物理学杂志》29. 1015-1018 (1990)。
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- 影响因子:0
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T. Shirakawa, et al.: "RF Plasma Production at Ultra-low Pressures with Surface Magnetic Confinement" Japan. J. Appl. Phys. Vol. 29, No. 6. 1015-1018 (1990)
T. Shirakawa 等人:“采用表面磁约束的超低压射频等离子体生产”,日本。
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- 影响因子:0
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Y.Yamashita他: "IonーInduced Radical Production on Surfaces during Deposition of Hydrogenated Amorphous Carbon" Journal of Applied Physics. 68. 3735-3737 (1990)
Y. Yamashita 等人:“氢化无定形碳沉积过程中表面上离子诱导的自由基产生”应用物理学杂志 68. 3735-3737 (1990)。
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SUGAI Hideo其他文献
SUGAI Hideo的其他文献
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{{ truncateString('SUGAI Hideo', 18)}}的其他基金
Development of Giant Plasma Processing Based on Large-Area Microwave Discharge
基于大面积微波放电的巨型等离子体处理研究进展
- 批准号:
15204053 - 财政年份:2003
- 资助金额:
$ 2.62万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Development of Large-area High-quality LCD Processing by Surface Wave Plasma
表面波等离子体大面积高品质LCD加工的开发
- 批准号:
12358004 - 财政年份:2000
- 资助金额:
$ 2.62万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Study on Surface Reaction Processes Using High Performance Beam Device
利用高性能束流装置进行表面反应过程的研究
- 批准号:
10308016 - 财政年份:1998
- 资助金额:
$ 2.62万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Development of Selective Hydrogen Pumping Method Using Lithium Films
锂膜选择性抽氢方法的发展
- 批准号:
07558177 - 财政年份:1995
- 资助金额:
$ 2.62万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Novel First-Wall Conditioning in Stationary Reactor Studies
固定反应堆研究中的新型第一壁调节
- 批准号:
06452419 - 财政年份:1994
- 资助金额:
$ 2.62万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
Optimization of Particle Control by Boronization
通过渗硼优化颗粒控制
- 批准号:
04452310 - 财政年份:1992
- 资助金额:
$ 2.62万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
Development of large-diameter RF plasmas under surface magnetic field
表面磁场下大直径射频等离子体的研制
- 批准号:
04558002 - 财政年份:1992
- 资助金额:
$ 2.62万 - 项目类别:
Grant-in-Aid for Developmental Scientific Research (B)
Formation of Functional Thin Films by a Double Plasma Device
双等离子体装置形成功能薄膜
- 批准号:
62880003 - 财政年份:1987
- 资助金额:
$ 2.62万 - 项目类别:
Grant-in-Aid for Developmental Scientific Research
Mode Conversion Phenomena of Electromagnetic Waves in a Magnetized Plasma
磁化等离子体中电磁波的模式转换现象
- 批准号:
61460227 - 财政年份:1986
- 资助金额:
$ 2.62万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
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