Optimization of Particle Control by Boronization

我们提出了一种使用危害较小的固体十硼烷进行渗硼的新方法，并在涂层技术、渗硼膜的评价和渗硼效果等方面取得了以下结果。涂层技术的发展：在真空升华下，使用了一种新的固体硼化物(十硼烷)，而不是有毒的爆炸性二硼烷。此外，我们还建立了一种基于无放电分解的热CVD渗硼技术。对十硼烷和二硼烷的等离子体CVD和热CVD进行了比较。控制硼膜中的氢含量：通过共振核反应分析来评估作为回收措施的氢含量。随着壁面温度的升高和离子轰击的结果，氢含量急剧下降。通过在氢化硼气体中掺入D_2或在D_2辉光放电条件下对薄膜表面进行调质，实现了从H到D的同位素交换渗硼。渗硼效果：对渗硼后的氢气循环和氧气吸除进行了基础实验，并在JT-60U、氦加速器E等装置上进行了应用。

We proposed a new method of boronization using less hazardous solid decaborane and obtained the following results on the coating technique, evaluation of boron films and the boronization effects.1. Development of Coating Techniques : Instead of toxic explossive diborane, a new solid boride (decaborane) was used under of the sublimation in vacuum. In addition, we established a boronization technique based on thermal CVD without discharge decomposition. A comparison between plasma CVD and thermal CVD was made for decaborane and diborane.2. Control of Hydrogen Content of Boron Film : A hydrogen content to be a measure of recycling was evaluated by resonant nuclear reaction analysis. The H content drastically decreased with increasing a wall temperature and also as a result of ion bombardment. Deuterized boronization by isotope exchange from H to D was accomplished by the way where D_2 is admixed in boron hydride gas or the film surface is conditioned by a D_2 glow discharge.3. Boronization Effects : Basic experimetns were performed to test the hydrogen recycling and the oxygen gettering after boronization.Finally, the decaborane-based boronization we proposed have been used in JT-60U, Heliotron E, and so on.