Plasma-enhanced atomic-layer deposition system with in situ spectroscopic ellipsometer

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Funding is requested for a plasma-enhanced atomic layer deposition system equipped with in situ spectroscopic ellipsometry for process monitoring, as well as for comprehensive evaluation of deposited films. The integrated instrument will be installed in the Center for Nanomaterials and Nanotechnology (ZNN) of the Walter Schottky Institute, TUM. The system will be a key tool in the Pl's research dedicated to the development of nitride and oxynitride-based materials with application for conversion of sunlight into renewable fuels. Being a unique capability housed in the ZNN, the instrument will also support research into nanoscale systems, especially for energy conversion, within the broader Munich area. The PI is a new faculty member at TUM and envisions the submission of multiple new research proposals enabled by this capability. Initial research projects, will include the following: i) Development of nitride and oxynitride semiconductors, such as TaON and perovskite oxynitrides, for photoelectrochemical solar energy conversion, ii) Deposition and characterization of multi­functional thin films for photochemical stabilization of semiconductors and for high efficiency (photo)electrocatalysis, and iii) Operando characterization of charge extraction and efficiency loss mechanisms in advanced photochemical energy conversion systems. The proposed instrumentation will complement existing infrastructure and provides unique control over composition, phase, and reactivity that is necessary to pursue these research aims.