Plasma-Enhanced Atomic Layer Deposition of Copper Metal
Plasma-Enhanced Atomic Layer Deposition of Copper Metal
批准号:
489590-2016
负责人:
Koponen, Sara
金额:
$2.55万
依托单位:
依托单位国家:
加拿大
项目类别:
Alexander Graham Bell Canada Graduate Scholarships - Doctoral
财政年份:
2017
资助国家:
加拿大
项目状态:
已结题
起止时间:
2017-01-01 至 2018-12-31
中文摘要
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英文摘要
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会议论文
Plasma-Enhanced Atomic Layer Deposition of Copper Metal
-
批准号:489590-2016
-
项目类别:Alexander Graham Bell Canada Graduate Scholarships - Doctoral
-
资助金额:$2.55万
-
财政年份:2018
-
负责人:Koponen, Sara
-
依托单位:
Plasma-Enhanced Atomic Layer Deposition of Copper Metal
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批准号:489590-2016
-
项目类别:Alexander Graham Bell Canada Graduate Scholarships - Doctoral
-
资助金额:$2.55万
-
财政年份:2016
-
负责人:Koponen, Sara
-
依托单位:
In Situ Optical Monitoring of Chemical Vapour Deposited Ultrathin Plasmonic Gold Films
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批准号:465448-2014
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项目类别:Alexander Graham Bell Canada Graduate Scholarships - Master's
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资助金额:$1.27万
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财政年份:2014
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负责人:Koponen, Sara
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依托单位:
Aptamer-based mycotoxin detection
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批准号:450932-2013
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项目类别:University Undergraduate Student Research Awards
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资助金额:$0.33万
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财政年份:2013
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负责人:Koponen, Sara
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依托单位:
Synthesis and Thermolysis of Group 11 Precursor Compounds
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批准号:432972-2012
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项目类别:University Undergraduate Student Research Awards
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资助金额:$0.33万
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财政年份:2012
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负责人:Koponen, Sara
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依托单位:
海外基金