Development fo High Reflectivity Multilayr Mirrors in the Extreme Ultraviolet Region(60nm-20nm)
极紫外区(60nm-20nm)高反射率多层反射镜的研制
基本信息
- 批准号:07559002
- 负责人:
- 金额:$ 6.46万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (A)
- 财政年份:1995
- 资助国家:日本
- 起止时间:1995 至 1996
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
High reflectivity mirrors in the extreme ultraviolet (EUV) region (60nm-20nm) are strongly required from the EUV microscopy, the plasma diagnostics and astronomical observation by using the EUV light, and the EUV laser exploitation. In this study, we developed multilayr mirrors having high reflectivity especially at resonance lines of He I (58.4nm) and He II (30.4nm), and the 3p edge of Ni (20nm). We fabricated the multilayrs designed theoretically using magnetron and ion-beam sputtering-instruments. Their reflectivities were checked with reflectometers attached to a grazing incidence monochromator with a plasma induced light source and a Seya-Namioka monochromator with a He discharge lamp. The multilayrs with the highest reflectivity are a Si/W bilayr (21.6% at 58.4nm), a Sc/Mg multilayr (27% at 30.4nm) and a Mo/Si multilayr (18% at 20nm). As an important application of the multilayrs, we have tried to enhance the diffraction efficiency of a grating around 30nm under normal incidence condition. We coated the surface of the grating with a Mo/Si multilayr and obtained very high diffraction efficiency of 5%. This is very distinguishable result of this project, which enable us to get 30nm light without use of a grazing incidence monochromator. We also tried to fabricate multilayrs having crystalline structure using an MBE instrument, checking the crystallinity with an RHEED monitor, but this trial has not been succeeded yet.At present, the reflectivity of each fabricated multilayr is smaller than the value calculated theoretically. It may be due to the roughness of interface in multilayrs. We will try to reduce the roughness by controlling precisely the substrate temperature with an infrared heater. Furthermore, we will develop the EUV microscopes using the high reflectivity multilayr mirrors.
在极紫外(EUV)显微镜、利用极紫外光进行等离子体诊断和天文观测以及极紫外激光器的开发等方面,都迫切需要极紫外(60 nm-20 nm)波段的高反射率反射镜。在本研究中,我们研制了具有高反射率的多层膜反射镜,特别是在He I(58.4nm)和He II(30.4nm)的共振线和Ni(20 nm)的3 p边缘处。我们利用磁控管和离子束溅射设备制备了理论设计的多层膜。它们的反射率检查与反射计连接到掠入射单色器与等离子体诱导光源和Seya Namioka单色器与He放电灯。具有最高反射率的多层膜是Si/W双层膜(在58.4nm处为21.6%)、Sc/Mg多层膜(在30.4nm处为27%)和Mo/Si多层膜(在20 nm处为18%)。作为多层膜的一个重要应用,我们试图提高垂直入射条件下30 nm左右光栅的衍射效率。我们在光栅表面镀上了Mo/Si多层膜,获得了5%的衍射效率。这是该项目非常独特的结果,它使我们能够在不使用掠入射单色器的情况下获得30 nm的光。我们还尝试用分子束外延(MBE)装置制备具有晶体结构的多层膜,用RHEED监测器检测其结晶度,但这一尝试尚未成功,目前制备的多层膜的反射率均小于理论计算值。这可能是由于多层膜界面的粗糙度造成的。我们将尝试通过使用红外加热器精确控制衬底温度来降低粗糙度。此外,我们将发展使用高反射率多层镜的EUV显微镜。
项目成果
期刊论文数量(20)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
M. Yamamoto: "The First Film Ellipsometry at a Photon Energy of 97eV with Use of High Performance Multilayer Polarizers" SPIE Proceedings. 2873. 70-73 (1996)
M. Yamamoto:“使用高性能多层偏振器实现光子能量为 97eV 的首个薄膜椭偏仪”SPIE 论文集。
- DOI:
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山本正樹,柳原美廣,木村洋昭,渡辺 誠: "軟X線多層膜光学素子-放射光科学への応用-" 放射光. 9(掲載予定). (1996)M. Watanabe and G. Isoyama: Springer-Verlag, "Dynamics during Spectroscopic Transitions. Chap. 13 Synchrotron Radiation and Free Electron Lasers" (1995)
Masaki Yamamoto、Yoshihiro Yanagihara、Hiroaki Kimura、Makoto Watanabe:“软 X 射线多层光学元件 - 在同步辐射科学中的应用”同步辐射 9(待出版)M. Watanabe 和 G. Isoyama:Springer-。 Verlag,“光谱跃迁期间的动力学。第 13 章同步辐射和自由电子激光器”(1995)
- DOI:
- 发表时间:
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- 影响因子:0
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M.Yamamoto: "The First Film Ellipsometry at a Photon Energy of 97eV with Use of High Performance Multilayer Polarizers" SPIE Proceedings. 2873. 70-73 (1996)
M.Yamamoto:“使用高性能多层偏振器实现光子能量为 97eV 的首个薄膜椭偏仪”SPIE 论文集。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
M. Yanagihara: "Consistency of the Surface Roughness Determined from Soft-X-Ray Reflectance and Surface Profiles Measured Using a Scanning Tunnelling Microscope : Coherence Length of the Soft X-Rays" Optical Review. 3. 65-70 (1996)
M. Yanagihara:“根据软 X 射线反射率确定的表面粗糙度和使用扫描隧道显微镜测量的表面轮廓的一致性:软 X 射线的相干长度”光学评论。
- DOI:
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- 影响因子:0
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山本正樹,柳原美廣,木村洋昭,渡辺 誠: "軟X線多層膜光学素子-放射光科学への応用-" 放射光. 9(掲載予定). (1996)M. Watanabe and G. Isoyama: Springer-Verlag, "Dynamics during Spectroscopic Transitions. Chap. 13 Synchrotron Radiation and Free Electron Lasers"
Masaki Yamamoto、Yoshihiro Yanagihara、Hiroaki Kimura、Makoto Watanabe:“软 X 射线多层光学元件 - 在同步辐射科学中的应用”同步辐射 9(待出版)M. Watanabe 和 G. Isoyama:Springer-。 Verlag,“光谱跃迁期间的动力学。第 13 章同步辐射和自由电子激光器”
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- 影响因子:0
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