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Fundamental Study on a Synthesis Apparatus of Transparent Diamond Films by Chemical Vapor Deposition

化学气相沉积透明金刚石薄膜合成装置的基础研究

基本信息

批准号：
06452157
负责人：
YOSHIKAWA Masanori
金额：
$ 4.61万
依托单位：
Tokyo Institute of Technology
依托单位国家：
日本
项目类别：
Grant-in-Aid for General Scientific Research (B)
财政年份：
1994
资助国家：
日本
起止时间：
1994 至 1995
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-06452157/
关键词：
Chemical vapor deposition Diamond Transparency Synthesis apparatus Arc discharge Plasma jet Magnetic field

项目摘要

Diamond films were synthesized by arc discharge plasma jet CVD that is suitable for high rate synthesis. However, this method has drawbacks such as distributions of thickness and quality occurs in diamond films. Thus, the plasma state were controled by magnetic field with a newly type of an apparatus that were designed and developed in order to study the effect of magnetic field on the shape and quality of diamond films deposited. As a result of application of magnetic field to plasma jet generated with methane, hydrogen and argon gases, the diameter of a plasma jet increases and the distributios of thickness and quality are improoved.The deposition conditions were also discussed for synthesizing transparent diamond films. Diamond films that have high transmittance are obtained at lower methane concentration of 1% independen of nucleation density. Transmittance of the diamond film that polished with diamond wheel was measured with FTIR and was approximately 68% at the wavelength of 10mum. This transparent diamond film was found to have random orientation by X-ray diffraction analysis and less defects and impurities by the observation of the structure of its cross section. As it takes long time to synthesize thick transparent diamond films under the determined deposition conditions, CVD apparatuses need to generate a stable and long-life time plasma jet.

采用适合于高速合成的弧光放电等离子体喷射CVD法合成了金刚石薄膜。然而，这种方法存在一些缺点，如金刚石薄膜的厚度分布和质量分布。因此，为了研究磁场对金刚石薄膜的形状和质量的影响，设计并研制了一种新型的磁场控制等离子体状态的装置。将磁场应用于甲烷、氢气和Ar气体产生的等离子体射流，增大了等离子体射流的直径，改善了等离子体射流的厚度和质量分布，并讨论了制备透明金刚石膜的沉积条件。随着成核密度的增加，甲烷浓度降低到1%时，可获得透过率较高的金刚石薄膜。用FTIR测试了金刚石砂轮抛光后的金刚石薄膜在10微米波长下的透过率约为68%。X射线衍射分析表明，该透明金刚石膜具有无规则的取向，通过对其横截面结构的观察，发现其缺陷和杂质较少。由于在所确定的沉积条件下合成厚的透明金刚石膜需要很长的时间，因此CVD设备需要产生稳定的、长寿命的等离子体射流。