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Development of Transparent Diamond Plates Synthesis Apparatus by magnetic field assisted Arc Discharge Plasma Jet

磁场辅助电弧放电等离子射流透明金刚石板合成装置的研制

基本信息

批准号：
07555037
负责人：
YOSHIKAWA Masanori
金额：
$ 6.85万
依托单位：
Tokyo Institute of Technology
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (A)
财政年份：
1995
资助国家：
日本
起止时间：
1995 至 1996
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07555037/
关键词：
magnetic field arc discharge plasma jet transparency diamond chemical vapor deposition

项目摘要

Diamond films were synthesized by are discharge plasma jet CVD that is suitable for high rate synthesis. However, this method has drawbacks such as distributions of thickness and quality occurs in diamond plates. Thus, a newly type of an apparatus were designed and developed in order to control the plasma state by magnetic field. This apparatus were prepared an electromagnet movable along the axs of the plasma torch and a plasma jet. As a result of application of magnetic field to an arc and a plasma jet generated with methane, hydrogen and argon gases, the diameter of a plasma jet increases, and the distributions of the substrate temperature and the thickness and quality are improved in the range of 7-8 mm in diameter.The deposition conditions were also discussed for synthesizing transparent diamond plates. Diamond films that have high transmittance are obtained at lower methane concentration of 1% independently of nucleation density. Transmittance of the diamond plates that were polished with diamond wheel was measured with FTIR and was approximately 68% at the wavelength of 10 mum. This transparent diamond film was found to have random orientation by X-ray diffraction analysis and less defects and impurities by the observation of the structure of its cross section. Since it takes long time to synthesize thick transparent diamond films under the determined deposition conditions, CVD apparatuses need to generate a stable and long-life time plasma jet.

采用适合于高速率合成的放电等离子体射流CVD法合成了金刚石薄膜。然而，这种方法有缺点，如金刚石板的厚度和质量分布。为此，设计并研制了一种利用磁场控制等离子体状态的新型装置。该装置制备了沿等离子体炬轴方向可移动的电磁铁和等离子体射流。电弧和由甲烷、氢气和氩气产生的等离子体射流在磁场作用下，在直径7 ~ 8 mm范围内，等离子体射流直径增大，衬底温度分布、厚度和质量得到改善。讨论了合成透明金刚石片的沉积条件。在较低的甲烷浓度为1%的条件下，可以获得与成核密度无关的高透光率金刚石膜。用FTIR测量了金刚石砂轮抛光后的金刚石片的透光率，在10 μ m波长处透光率约为68%。通过x射线衍射分析发现，该透明金刚石膜具有随机取向，通过观察其截面结构发现其缺陷和杂质较少。由于在确定的沉积条件下合成厚的透明金刚石膜需要很长时间，因此CVD设备需要产生稳定且长寿命的等离子体射流。