DEVELOPMENT OF MULTI-ANODE ARC DISCHARGE PLASMA JET CVD APPARATUS FOR DIAMOND SYNTHESIS

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This research aimed to develop a synthesis apparatus of high purity diamond and diamond like carbon film at higher growth rate on large area. The apparatus developed consists of a plasma source, power supply, gas feed system, vacuum system, cooling system and a reaction chamber. Connection flanges for the plasma source to activate carbon atoms and an ion beam source to sputter graphite target, a window for laser beam are mounted on the reaction chamber wall. Diamond and diamond like carbon films are synthesized from carbon atoms vaporized by ion beam sputtering or laser ablation, which activated with plasma jet includes electron up to 80A.Synthesis of carbon films were performed by sputtering of graphite target with argon ion beam under various plasma source power, substrate arrangement and bias voltage. Carbon films deposited were characterized by Raman spectroscopy, FT-IR and friction test. Raman spectra shows the carbon films that have different structure from conventional diamond like carbon films were synthesized by increasing plasma source power at shorter distance between a substrate and the source. Moreover, the carbon film shows no absorption band in infrared region and low friction coefficient of 0.05 between steel ball in air.