DEVELOPMENT OF MULTI-ANODE ARC DISCHARGE PLASMA JET CVD APPARATUS FOR DIAMOND SYNTHESIS

金刚石合成多阳极电弧放电等离子体喷射CVD装置的研制

• 批准号: 09355005
• 负责人: YOSHIKAWA Masanori
• 金额: $ 16.9万
• 依托单位: TOKYO INSTITUTE OF TECHNOLOGY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1998
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09355005/
• 关键词: ARC DISCHARGE; PLASMA JET; DIAMOND; DIAMOND LIKE CARBON; 気相合成

This research aimed to develop a synthesis apparatus of high purity diamond and diamond like carbon film at higher growth rate on large area. The apparatus developed consists of a plasma source, power supply, gas feed system, vacuum system, cooling system and a reaction chamber. Connection flanges for the plasma source to activate carbon atoms and an ion beam source to sputter graphite target, a window for laser beam are mounted on the reaction chamber wall. Diamond and diamond like carbon films are synthesized from carbon atoms vaporized by ion beam sputtering or laser ablation, which activated with plasma jet includes electron up to 80A.Synthesis of carbon films were performed by sputtering of graphite target with argon ion beam under various plasma source power, substrate arrangement and bias voltage. Carbon films deposited were characterized by Raman spectroscopy, FT-IR and friction test. Raman spectra shows the carbon films that have different structure from conventional diamond like carbon films were synthesized by increasing plasma source power at shorter distance between a substrate and the source. Moreover, the carbon film shows no absorption band in infrared region and low friction coefficient of 0.05 between steel ball in air.

本研究旨在研制一种大面积、高速率合成高纯度金刚石及类金刚石薄膜的装置。该装置由等离子体源、电源、供气系统、真空系统、冷却系统和反应室组成。用于活化碳原子的等离子体源和用于溅射石墨靶的离子束源的连接凸缘、用于激光束的窗口安装在反应室壁上。采用离子束溅射或激光烧蚀等离子体激发等离子体射流，使碳原子气化，得到金刚石和类金刚石碳薄膜。采用氩离子束溅射石墨靶，在不同的等离子体源功率、衬底布置方式和偏压下合成了碳薄膜。用拉曼光谱、红外光谱和摩擦试验对沉积的碳膜进行了表征。拉曼光谱表明，在衬底与等离子体源距离较近的情况下，通过增加等离子体源功率，可以合成出与传统类金刚石膜结构不同的碳膜。碳膜在红外区无吸收带，在空气中与钢球间的摩擦系数较低，仅为0.05。