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Fabrication of Highly Functional MMICs Using Traveling Wave Interaction Mode and Static Magnetic Wave Mode

Fabrication of Highly Functional MMICs Using Traveling Wave Interaction Mode and Static Magnetic Wave Mode
使用行波相互作用模式和静态磁波模式制造高功能 MMIC
批准号:
04805028
负责人:
AKAZAWA Masamichi
金额:
$1.28万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1992
资助国家:
日本
项目状态:
已结题
起止时间:
1992 至 1993

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中文摘要
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英文摘要
The semiconductor carrier waves and their traveling wave interactions with the electromagnetic fields in InP and GaAs layrs using the metal-insulator-semiconductor (MIS)-type carrier confinement structure were studied. Traveling wave amplifier (TWA)-type devices were made and the admittance of the devices was measured. For the first time, the existence of carrier waves was observed from the drift velocity dependence of the admittance and two modes of interaction were observed from the frequency dependence of the drift velocity, which gave the reduction peaks of the conductance. To discuss their behavior, TM analysis using superposition of various space harmonics in terms of the modified effective permittivity for the drift plasma is presented. In the model, nonuniformity of the carrier distributions is considered. This model gives fairly good agreement between the experiments and theory. Moreover, the influence of the interface states on the interactions is studied theoretically. It is indicated that parasitic admittance due to a high interface state density cancels out negative conductance. But, when the interface state density is decreased to below 2x10^<11>cm^<-2>eV^<-1>, it is predicted that net negative conductance will be observed.On the other hand, In GaAs lattice matched to InP is promising material for advanced MMICs, with its high electron mobility. In the MIS structure, excellent characteristics of In GaAs is fully derived. Applying our original Si ICL technique to insulator - In GaAs interface, interface state density was reduced as low as 1x10^<11>cm^<-2>eV^<-1>. It is clear that InGaAs MIS structure is promising for the solid state TWA, which is key device in advanced MMICs.
期刊论文(34)
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S.Suzuki,Y.G.Xie,T.Sawada and H.Hasegawa: "Application of Sillicon Interface Control Layer Technique to Fabrication of InGaAs Metal-Insulator-Semiconductor FETs" Proc.of 1st Int.Symp.Control of Scmiconductor Interfaces(Karuizawa,Japan). to be published.(1
S.Suzuki、Y.G.Xie、T.Sawada 和 H.Hasekawa:“Application of Sillicon Interface Control Layer Technique to Fabrication of InGaAs Metal-Insulator-Semiconductor FETs”Proc.of 1st Int.Symp.Control of Scmiconductor Interfaces(轻井泽,日本)
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S.Kodama and H.Hasegawa: ""Control of Silicon Nitride-In_<0.53>Ga_<0.47>As Interface by Ultrathin Silicon Interface Control Layr"" Proc.of 1st Int.Symp.Control of Semiconductor Interfaces (Karuizawa, Japan, November 8-12, 1993). (to be published).
S.Kodama 和 H.Hasekawa:“通过超薄硅界面控制层控制氮化硅-In_<0.53>Ga_<0.47>As 界面”Proc.of 1st Int.Symp.Control of Semiconductor Interface(轻井泽,日本,
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M.Akazawa,H.Hasegawa,H.Tomozawa and H.Fujikura: "Investigation of valence band offset modification at GaAs-AlAs and InGaAs-InAlAs heterointerfaces by a Si interlayer" Proc.of 19th Int.Symp.GaAs and Related Compounds(Karuizawa,Japan,28 September-2 October)
M.Akazawa、H.Hasekawa、H.Tomozawa 和 H.Fujikura:“Si 中间层对 GaAs-AlAs 和 InGaAs-InAlAs 异质界面的价带偏移修改的研究”Proc.of 19th Int.Symp.GaAs 和相关化合物(
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S.Suzuki, Y.G.Xie, T.Sawada and H.Hasegawa: ""Application of Silicon Interface Control Layr Technique to Fabrication of InGaAs Metal-Insulator-Semiconductor FETs"" Proc.of 1st Int.Symp.Control of Semiconductor Interfaces (Karuizawa, Japan, November 8-12,
S.Suzuki、Y.G.Xie、T.Sawada 和 H.Hasekawa:“硅界面控制层技术在 InGaAs 金属-绝缘体-半导体 FET 制造中的应用”Proc.of 1st Int.Symp.Control of Semiconductor Interfaces (Karuizawa)
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