Reaction Dynamics of Atomic Hydrogen with H-terminated Si Surfaces

氢原子与 H 封端硅表面的反应动力学

基本信息

  • 批准号:
    14350022
  • 负责人:
  • 金额:
    $ 6.98万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 财政年份:
    2002
  • 资助国家:
    日本
  • 起止时间:
    2002 至 2004
  • 项目状态:
    已结题

项目摘要

Our Aim of the research is to investigate the dynamics of H-induced abstraction of surface D adatoms on the Si(100) surfaces. There are two kinds of abtraction paths : one is direct abstraction (ABS) and the other is adsorption-induced-desorption(AID) of surfaced adatams. From experiments w e clarified following things :(1)Angular distribution of molecules desorbed along ABS and AID reaction pathways.The angular distributions of desorption yields show a maximum at the normal direction for both paths. Results were well explained by the simulation employing LEPS potential. This has been prepared to be submitted to a journal as a paper.(2)D_2 desorptions along the AID channel were studied by means of a chopped H-beam technique. The width of the chopped-H beam was 1.5 s and duration was 3 s. The HD desorption along the ABS channel showed a quick response to the incident H pulse, suggesting the abstraction reaction is direct. On the other hand, D_2 desorption along the AID pathway showed no … More t only a similar quick path but also a delayed path. The fast desorption channel was understood as due to molecular emissions that occur when locally formed 1x1 dihydride phases collap into the original 3x1 dihydride phases. A paper was published (J.Chem.Phys.121,3221(2004))(3)D_2 desorptions along the AID channel were studied by employing further shortned H-beam. The width of the chopped-H beam was 0.5 s and duration was 10 s. The HD desorption along the ABS channel showed a quick response to the incident H pulse, suggesting abstraction reaction is direct. On the other hand, D_2 desorption along the AID pathway showed multi components chracterized with 0.05,0.8 and 30 s lifetimes. The fastest desorption channel was understood as due to molecular emissions that occur when locally formed 1x1 dihydride phases collap into the original 3x1 dihydride phases. The second fastest path was understood as due to molecular emission when 3x1 dihydride phases are formed during H irradiation. The third component was attributed to the molecular emission channel when the excess 3x1 dihydride phases are destroyed. Apaper has been submitted to Surf face Science. Less
我们研究的目的是研究氢诱导的表面D原子在Si(100)表面上的吸附动力学。提取途径有两种:一种是直接提取(ABS),另一种是表面吸附诱导解吸(AID)。实验结果表明:(1)沿ABS和AID反应路径脱附分子的角分布,两条反应路径的脱附产额角分布均在法线方向出现极大值。用LEPS电势进行的模拟很好地解释了结果。这已经准备好作为论文提交到期刊上。(2)用斩波H型束技术研究了沿AID通道的D_2脱附。被斩波的H束的宽度为1.5 S,持续时间为3 S。HD沿ABS通道的脱附对入射的H脉冲有较快的响应,表明抽提反应是直接的。另一方面,D_2沿艾滋病途径的解吸没有显示…更多的不仅是类似的快速路径,而且还有延迟路径。快速脱附通道被认为是由于当局部形成的1x1二氢物相塌陷成原始的3x1二氢物相时发生的分子发射。发表了一篇论文(J.Chem.Phys.121,3221(2004))(3)利用更短的H-BEAM研究了沿AID通道的D2解吸。被斩波的H束的宽度为0.5 S,持续时间为10 S。HD沿ABS通道的脱附对入射的H脉冲有快速的响应,表明抽提反应是直接的。另一方面,D2沿AID途径的解吸表现出多组分的特征,其S寿命分别为0.05、0.8和30。最快的脱附通道被认为是由于当局部形成的1x1二氢物相塌陷成原始的3x1二氢物相时发生的分子发射。第二个最快的路径被理解为在H辐照过程中形成3x1二氢化物相时的分子发射。当过剩的3x1二氢化合物相被破坏时,第三组分被归因于分子发射通道。一篇论文已经提交给Surf Face Science。较少

项目成果

期刊论文数量(28)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
T.Sagara, T.Kuga, et al.: "Translational Heating of D2 Molecules Thermally Desorbed from Si(100) and Ge(100) Surfaces"Phys. Rev. Letter. 89・8. 86101-1-86101-4 (2002)
T.Sagara、T.Kuga 等:“从 Si(100) 和 Ge(100) 表面热脱附的 D2 分子的平移加热”Phys Rev. Letter 86101-1-86101-4。 2002)
  • DOI:
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  • 影响因子:
    0
  • 作者:
  • 通讯作者:
Coverage dependent desorption dynamics of deuterium on Si(100) surfaces : Interpretation with a diffusion-promoted desorption model
Si(100) 表面上氘的覆盖依赖解吸动力学:用扩散促进解吸模型解释
  • DOI:
  • 发表时间:
    2005
  • 期刊:
  • 影响因子:
    0
  • 作者:
    T.Matsuno;T.Niida;H.Tsurumaki;A.Namiki
  • 通讯作者:
    A.Namiki
T.Shibataka, et al.: "D_2 reactions on Si(100) surfaces : Adsorption and desorption dynamics"Physical Raview. B68. 113307-1-113307-2 (2003)
T.Shibataka 等人:“Si(100) 表面上的 D_2 反应:吸附和解吸动力学”Physical Raview。
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    0
  • 作者:
  • 通讯作者:
F.Rahman, et al.: "Oxygen atom-induced D_2 and D_2O desorption on D/Si(111) surfaces"Applied Surface Science. 220. 1-6 (2003)
F.Rahman 等人:“D/Si(111) 表面上氧原子诱导的 D_2 和 D_2O 解吸”应用表面科学。
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    0
  • 作者:
  • 通讯作者:
Coverage dependent desorption dynamics of deuterium on Si(100) surfaces : Interpretation with a diffusion-promoted desorption mode 1
Si(100) 表面上氘的覆盖依赖解吸动力学:用扩散促进解吸模式 1 进行解释
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NAMIKI Akira其他文献

NAMIKI Akira的其他文献

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{{ truncateString('NAMIKI Akira', 18)}}的其他基金

Production of polarized atomic hydrogen beam and its application to spin-selected Si surface reaction
偏振原子氢束的产生及其在自旋选择硅表面反应中的应用
  • 批准号:
    09450020
  • 财政年份:
    1997
  • 资助金额:
    $ 6.98万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
A new approach to the device processing by means of supersonic molecular and radical beams
利用超音速分子束和自由基束进行器件加工的新方法
  • 批准号:
    08555008
  • 财政年份:
    1996
  • 资助金额:
    $ 6.98万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Lazer spectroscopic study on vibrutional excitation of NO on alkalated Si surfaces.
碱化硅表面 NO 振动激发的激光光谱研究。
  • 批准号:
    02640339
  • 财政年份:
    1990
  • 资助金额:
    $ 6.98万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)

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Growth processes and low-dimensional physical properties on ultrathin high-k materials film fabricated on concave-convex Si surface by spectroscopic observation
光谱观察凹凸硅表面超薄高k材料薄膜的生长过程及低维物理性质
  • 批准号:
    17K06030
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    2017
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Elucidation of equilibrium reaction mechanism of Si surface carbonization using CO gas
阐明使用 CO 气体进行硅表面碳化的平衡反应机理
  • 批准号:
    16K20915
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    2016
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应变可变样品架的研制及其在应变硅表面电子结构研究中的应用
  • 批准号:
    19740178
  • 财政年份:
    2007
  • 资助金额:
    $ 6.98万
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    Grant-in-Aid for Young Scientists (B)
In-situ observation of thermal oxidation on the Si surface by RHEED-AES CL
RHEED-AES CL 原位观察 Si 表面热氧化
  • 批准号:
    12650026
  • 财政年份:
    2000
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    $ 6.98万
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Production of polarized atomic hydrogen beam and its application to spin-selected Si surface reaction
偏振原子氢束的产生及其在自旋选择硅表面反应中的应用
  • 批准号:
    09450020
  • 财政年份:
    1997
  • 资助金额:
    $ 6.98万
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    Grant-in-Aid for Scientific Research (B)
Study of stress effects on growth of metal and semiconductor on si surface
硅表面金属和半导体生长的应力效应研究
  • 批准号:
    09650026
  • 财政年份:
    1997
  • 资助金额:
    $ 6.98万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Development of Ultra-smooth Si Surface by the Control of SiO_2/Si Interface Formation on an Atomic-Scale
原子尺度控制SiO_2/Si界面形成开发超光滑Si表面
  • 批准号:
    08455023
  • 财政年份:
    1996
  • 资助金额:
    $ 6.98万
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Self-orgnization of Al nano-structure using selective reactivity of step/terrace structure on Si surface
利用硅表面阶梯/阶梯结构的选择性反应性自组织铝纳米结构
  • 批准号:
    08650034
  • 财政年份:
    1996
  • 资助金额:
    $ 6.98万
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Physics of Hetero-Epitaxial Growth onto the hydrogen terminated Si surface under the low temperature condition
低温条件下氢封端硅表面异质外延生长物理
  • 批准号:
    06402025
  • 财政年份:
    1994
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    $ 6.98万
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A high sensitive evalution method for Si surface crystallografic properties by employing surface photovoltage effects.
一种利用表面光电压效应评价硅表面晶形特性的高灵敏度方法。
  • 批准号:
    06650143
  • 财政年份:
    1994
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    $ 6.98万
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