Development of integrated high-energy radiation imaging detector
Development of integrated high-energy radiation imaging detector
批准号:
12555101
负责人:
HATANAKA Yoshinori
金额:
$9.02万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2000
资助国家:
日本
项目状态:
已结题
起止时间:
2000 至 2001
中文摘要
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英文摘要
High energy radiation detectors have been developed with high energy resolution, FWHM, of below 20/0 of radiation energy. For device fabrications, Low temperature processing techniques were developed ; one is a remote plasma enhanced (RPE) MOCVD and the other is a laser processing techniques. Using RPE-MOCVD, heavy doped n-type CdTe epitaxial layers (1018/cm3) with iodine doping were resulted on the intrinsic CdTe single crystal and M-i-n structure detectors were fabricated with high resolution as above. As the laser processing techniques, excimer laser doping techniques were developed using In for n-type heavy doping and Sb for p-type heavy doping. As the other laser processing technology, multi-pixcel detector fabrication technologies were developed using laser ablation phenomena by excimer laser radiation. The multi-pixcel detector showed a good performance for arrayed pin CdTe diodes. These techniques are promising for the fabrication technology of the multi-pixcel detector with the high special resolution and high energy resolution.
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M.Niraula et al.: "Low-temperature growth and n-type doping of CdTe by the remote plasma assi sted metal organioc chemical vapor deposition"MRS Symp. Proc.. 487. 45-49 (2001)
M.Niraula 等人:“通过远程等离子体辅助金属有机化学气相沉积实现 CdTe 的低温生长和 n 型掺杂”MRS Symp。
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A.M.Wrobel et al.: "Remote microwave plasma chemical vapor deposition of thin Si:N:C films from a single-source precursor"J. Wide Bandgap Materials. 8. 3-15 (2001)
A.M.Wrobel 等人:“来自单源前驱体的 Si:N:C 薄膜的远程微波等离子体化学气相沉积”J.
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D.Noda et al.: "Epitaxial growth of CdSeTe films by Remote Plasma Enhanced Metal Organic C hemical Vapor Deposition method"Vacuum. 59. 45-49 (2001)
D.Noda 等人:“通过远程等离子体增强金属有机化学气相沉积法外延生长 CdSeTe 薄膜”真空。
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M. Niraula, et al.: "Low-temperature growth and n-type doping of CdTe by the remote plasma assisted metal organic chemical vapor deposition"MRS Symp. Proc.. 487. 45-49 (2001)
M. Niraula 等人:“通过远程等离子体辅助金属有机化学气相沉积实现 CdTe 的低温生长和 n 型掺杂”MRS Symp。
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M. Niraula, et al.: "High Resolution CdTe nuclear radiation detectors in a new m-pai-n design"Nuclear Instruments and Method in Physics Research A. 458. 478-483 (2001)
M. Niraula 等人:“采用新型 m-pai-n 设计的高分辨率 CdTe 核辐射探测器”核物理研究仪器和方法 A. 458. 478-483 (2001)
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共 32 条
Study of Electron States in Photosensitive Amorphous Titanium Oxide Films deposited by Plasma Process
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批准号:17560323
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项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.34万
-
财政年份:2005
-
负责人:HATANAKA Yoshinori
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依托单位:
DEVELOPMENT OF UV ACTIVE AMORPHOUS TIO2 THIN FILMS AND APPLICATION TO ENVIRONMENTAL SENSOR
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批准号:15560312
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.3万
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财政年份:2003
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负责人:HATANAKA Yoshinori
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依托单位:
REVELATION OF LIGHT ACTIVE FUNCTION IN AMORPHOUS TiO3 THIN FILM
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批准号:13650010
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$0.64万
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财政年份:2001
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负责人:HATANAKA Yoshinori
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依托单位:
DEVELOPMENT OF INTEGRADED IMAGING DETECTOR FOR HIGH ENERGY FLUX
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批准号:10355016
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$21.7万
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财政年份:1998
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负责人:HATANAKA Yoshinori
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依托单位:
EXCIMER LASER DOPING FOR WIDE-GAP SEMICONDUCTORS
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批准号:10450134
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$6.72万
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财政年份:1998
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负责人:HATANAKA Yoshinori
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依托单位:
DEVELOPMENT OF SOLID STATE IMAGING DETECTOR FOR HIGH ENERGY FLUX
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批准号:08555084
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$6.46万
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财政年份:1996
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负责人:HATANAKA Yoshinori
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依托单位:
SPECIFIC FORMATION OF SILICON BASAD WIDEGAP SEMICONDUCTOR FILM FROM ORGANO-SILICON MATERIALS
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批准号:08455140
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$2.62万
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财政年份:1996
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负责人:HATANAKA Yoshinori
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依托单位:
PREPARATION OF SILICON BASED WIDEGAP SEMICONDUCTOR FILM FROM ORGANO-SILICON MATERIAL
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批准号:06650363
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.28万
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财政年份:1994
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负责人:HATANAKA Yoshinori
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依托单位:
海外基金