REVELATION OF LIGHT ACTIVE FUNCTION IN AMORPHOUS TiO3 THIN FILM

非晶态TiO3薄膜光活性功能的揭示

• 批准号: 13650010
• 负责人: HATANAKA Yoshinori
• 金额: $ 0.64万
• 依托单位: Aichi University of Technology (2002)Shizuoka University (2001)
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2001
• 资助国家: 日本
• 起止时间: 2001 至 2002
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-13650010/
• 关键词: Environmental materials; TiO2; Plasma CVD; Hollow cathode plasma; Light catalytic function; Oxygen sensor; Hydrophilic function; Organic titanium; Coating technology; ホロカソードプラズマ; 光触媒機能; 浄化作用; 酸素センサー

A hollow-cathode jet plasma source has been developed for the generation of high density plasma radicals. By using this plasma source, amorphous TiO2 thin films are deposited from organic-titanium (titanium tetra-isopropoxide: TTIP). It has been found that the films obtained have an active function for ultra-violet light, because OH bases included in the film terminate the unpaired electron and make the defects disappeared. It has been also found that these films have high photoconductivity for ultra-violet light and sensitive in dark current for the kind of environment gas, that is, very low for oxygen and high for hydrogen. These characteristics have been investigated for the application of gas sensor.

本文介绍了一种用于产生高密度等离子体自由基的空心阴极射流等离子体源。通过使用该等离子体源，从有机钛（四异丙氧基钛：TTIP）沉积非晶TiO 2薄膜。结果表明，所制得的薄膜对紫外光具有活性作用，这是因为薄膜中含有的OH基终止了未成对电子，使缺陷消失。还发现这些薄膜对紫外光具有高的光电导性，对环境气体的暗电流敏感，即对氧很低，对氢很高。这些特性已被研究的气体传感器的应用。

项目成果

L.Sirghi, T.Aoki, Y.Hatanaka: "Hydrophilicity of TiO2 thin films obtained by radio frequency magnetron sputtering deposition"Thin Solid Films. 422. 55-61 (2002)

L.Sirghi、T.Aoki、Y.Hatanaka：“通过射频磁控溅射沉积获得的 TiO2 薄膜的亲水性”固体薄膜。

L.Sirghi, Y.Hatanaka: "Control of plasma parameters and wall sheath voltage in radio frequency magnetron discharge by grid bias"J. Appl. Phys.. 91[7]. 4026-4032 (2002)

L.Sirghi，Y.Hatanaka：“通过栅极偏置控制射频磁控管放电中的等离子体参数和壁鞘电压”J。

M.Nakamura, Y.Hatanaka, et al.: "Study on hydrophilic properties of hydro-oxygenated amorphous TiOx : OH thin films"Surface Science. 507/510. 778-782 (2002)

M.Nakamura、Y.Hatanaka 等人：“氢化无定形 TiOx : OH 薄膜亲水性能的研究”表面科学。

M. Nakamura, et al: "Formation mechanism for TiOx thin film obtained by remote plasma enhanced chemical vapor deposition in H2-O2"Thin Solid Films. 401. 138-144 (2001)

M. Nakamura 等人：“在 H2-O2 中通过远程等离子体增强化学气相沉积获得 TiOx 薄膜的形成机制”固体薄膜。

P.Kazimierski, J.Tyczkowski, Y.Hatanaka, et al.: "Transition from amorphous semiconductor to amorphous insulator in Hydrogenated Carbon-Germanium films investigated by Raman spectroscopy"Chemistry Materials. 14[11]. 4694-4701 (2002)

P.Kazimierski、J.Tyczkowski、Y.Hatanaka 等人：“通过拉曼光谱研究氢化碳-锗薄膜中从非晶半导体到非晶绝缘体的转变”化学材料。