Development of low-damage low-temperature surface modification technique using laser detonation-induced broad atom beams

利用激光爆轰诱导宽原子束开发低损伤低温表面改性技术

• 批准号: 12555200
• 负责人: OHMAE Nobuo
• 金额: $ 8.06万
• 依托单位: Kobe University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2000
• 资助国家: 日本
• 起止时间: 2000 至 2002
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-12555200/
• 关键词: atomic oxygen; space environment; hyperthermal atom beam; silicon; surface free energy; oxidation; surface modification; low earth orbit; シリコン酸化膜; 原子ビーム

This study aims at developing the new low-damage surface modification technique using laser detonation supersonic atoms beams. It was made clear that the hydrogen-terminated Si (001) surface can be oxidized by 5 eV atomic oxygen beam even at room temperature. This is due to the fact that more than 80 % of the translational energy was transferred from the impinging atom to the surface atom. The overall oxide growth follows linear-parabolic relationship that is similar to that observed high-temperature oxidation of Si. The initial linear growth was governed by the reaction-limit of oxidant, whereas parabolic one was due to volume diffusion inside the oxide film. It was also demonstrated that the surface free energy (or wettability) of polymer could be controlled by atom beam exposures. From the experimental results obtained in this study, potential advantages of the laser detonation supersonic beam-induced surface modification were identified.

本研究旨在发展激光爆轰超声速原子束低损伤表面改性新技术。结果表明，即使在室温下，用5eV的原子氧束也能氧化氢封端的Si（001）表面。这是由于80%以上的平动能从撞击原子转移到表面原子。整体氧化物生长遵循线性抛物线关系，这是类似于观察到的高温氧化的Si。初始的线性生长是由氧化剂的反应极限，而抛物线是由于氧化膜内的体积扩散。研究还表明，聚合物的表面自由能（或润湿性）可以通过原子束曝光来控制。从实验结果中获得的这项研究中，激光爆轰超声束诱导表面改性的潜在优势被确定。

项目成果

Tagawa M., Yokota K., Ohmae N., Kinoshita H., Umeno M: "Oxidation properties of hydrogen-terminated Si(001) surfaces following use of a hyperthermal broad atomic oxygen beam at low temperatures"Japanese Journal of Applied Physics. Vol.40,No.10. 6152-6156

Takawa M.、Yokota K.、Ohmae N.、Kinoshita H.、Umeno M：“在低温下使用超高温宽原子氧束后氢封端的 Si(001) 表面的氧化特性”《日本应用物理学杂志》。

Kinoshita H., et al.: "The degradation of polyimide films due to the hyperthermal atomic oxygen exposures : in-situ mass loss measurement and effect of air exposures"Proceedings of the 8th International Symposium on Materials in a Space Environment. (in p

Kinoshita H. 等人：“由于高温原子氧暴露而导致的聚酰亚胺薄膜的降解：原位质量损失测量和空气暴露的影响”第八届空间环境材料国际研讨会论文集。

Tagawa M., Dejima K., Tsumamoto S., Yokota K., Ohmae N., Kinoshita H.: "Utilization of low Earth orbit space environment in the formation of an insulating oxide layer on semiconductor surface"Proceedings of the 23^<rd> International Symposium on Space Tec

Takawa M.、Dejima K.、Tsumamoto S.、Yokota K.、Ohmae N.、Kinoshita H.：“利用低地球轨道空间环境在半导体表面形成绝缘氧化物层”23^<

Yokota K., Kida T., Ishikawa K., Tagawa M., Ohmae N.: "Atomic oxygen-induced erosion of PMDA-ODA polyimide films: effect of incident angle, temperature and simultaneous UV exposure"Proceedings of the 23^<nd> International Symposium on Space Technology and

Yokota K.、Kida T.、Ishikawa K.、Takawa M.、Ohmae N.：“PMDA-ODA 聚酰亚胺薄膜的原子氧诱导腐蚀：入射角、温度和同时 UV 曝光的影响”23^<

田川雅人 ほか: "超熱原子線と固体表面の反応ダイナミクス"神戸大学ベンチャー・ビジネス・ラボラトリー年報. Vol.5. 105-108 (2000)

田川正人等：“超热原子束与固体表面之间的反应动力学”神户大学创业商业实验室年度报告第 5 卷 105-108 (2000)。