Thin film X-ray diffractometer

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The thin film X-ray diffractometer applied for should be operated centrally in the chemistry department, and will be available to a broad user group from chemistry, physics and engineering who, among other things, deals with crystalline oxides, coordination compounds and hybrid materials in the form of thin films. The device enables measurements for high-quality phase analysis, X-ray reflectometry, and in-plane measurements of crystalline thin films and floating and liquid thin film samples, with the additional possibility of tracking temperature-dependent crystallization processes of thin films. The device is also equipped with a powerful rotating anode. As a result, both structure formation processes and synthetically-made material modifications and the associated changed crystallinity and orientation can be investigated through particularly precise and fast measurements in order to gain a deeper understanding of the influence on e.g. photoelectrochemical or electrocatalytic activity.