Thin film X-ray diffractometer

薄膜X射线衍射仪

• 批准号: 513268860
• 金额: --
• 依托单位: Technische Universität Darmstadt
• 依托单位国家: 德国
• 项目类别: Major Research Instrumentation
• 财政年份: 2022
• 资助国家: 德国
• 起止时间: 2021-12-31 至 无数据
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/513268860?language=en
• 关键词: Thin; film; ray; diffractometer

Thin film X-ray diffraction is probably the most important investigation method for thin films and thin film heterosystems. This applies in particular to epitaxial layer systems, in which the biaxial strain is an important parameter of the functional properties. In the Advanced Thin Film Technology group, two oxide/nitride molecular beam epitaxy (MBE) systems, two pulsed laser deposition (PLD) systems and two co-sputtering systems are used to produce functional layers on a daily basis. In addition, there is a recently approved UHV magnetron co-sputtering system, which will be operated in a joint cluster system in a cooperation between the Group of New Materials Electronics (Department of Electrical Engineering and Information Technology) and the Advanced Thin Film Technology Group (Department of Materials Science). The research focus is on thin films of electronic functional materials, which are integrated and investigated in model components (e.g. memristors, varactors, spintronic components, thin-film batteries, etc.). Due to the growing number of advanced thin film methods, the acquisition of a modern and state-of-the-art thin film X-ray diffractometer is indispensable.The essential requirements for the instrument are a high X-ray flux combined with a two-dimensional detector that enables rapid imaging of the reciprocal space. Equally important is a high resolution for the precise determination of lattice parameters and weak reflections in multilayer systems, and an integrated evaluation software. Due to the large number of people using the system, user-friendliness and automated measurement processes are further relevant criteria.

薄膜 X 射线衍射可能是薄膜和薄膜异质系统最重要的研究方法。这尤其适用于外延层系统，其中双轴应变是功能特性的重要参数。在先进薄膜技术小组中，每天使用两台氧化物/氮化物分子束外延 (MBE) 系统、两台脉冲激光沉积 (PLD) 系统和两台共溅射系统来生产功能层。此外，最近批准的特高压磁控共溅射系统将在新材料电子学组（电气工程与信息技术系）和先进薄膜技术组（材料科学系）合作的联合集群系统中运行。研究重点是电子功能材料薄膜，并在模型组件（例如忆阻器、变容器、自旋电子组件、薄膜电池等）中进行集成和研究。由于先进薄膜方法的不断增加，购买一台现代化、最先进的薄膜X射线衍射仪是必不可少的。对仪器的基本要求是高X射线通量与二维探测器相结合，能够对倒易空间进行快速成像。同样重要的是用于精确确定多层系统中的晶格参数和弱反射的高分辨率以及集成的评估软件。由于使用该系统的人数众多，用户友好性和自动化测量过程是进一步相关的标准。