Research on fundamental technologies for processing of electronic materials by synchrotron light-excited process

同步加速器光激发加工电子材料基础技术研究

• 批准号: 16560012
• 负责人: NISHIO Mitsuhiro
• 金额: $ 1.86万
• 依托单位: Saga University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2004
• 资助国家: 日本
• 起止时间: 2004 至 2006
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-16560012/
• 关键词: Synchrotron light-excited process; Electronic material; etching; epitaxial growth; シンクロトロン光の工学的利用; 材料加工; 佐賀県立九州シンクロトロン光研究センター

Synchrotron light-excited etching of ZnTe as an example of electronic material has been demonstrated. In the case of SF_6 gas, the ZnTe was not etched but thin film of a fluorine containing material, e.g. ZnF2, was deposited on the surface of ZnTe. On the other hand, ZnTe was etched effectively by using Ar gas under the negative sample bias to the sample. The etched pattern obtained by placing a Ni mesh showed that only the irradiated area was etched. The etching mechanism has been investigated. A new beamline for the development of advanced materials and processing has been designed and constructed in order to utilize synchrotron light source built by Saga Prefectural Government. Furthermore, the processing of electronic materials containing epitaxial growth, doping, etching and annealing procedures has been carried out in our laboratory as prelimary experiments for the processing using synchrotron light.

以ZnTe为例，进行了同步辐射光激发刻蚀实验。在SF_6气体的情况下，ZnTe不被蚀刻，而是在ZnTe的表面上沉积含氟材料（例如ZnF 2）的薄膜。另一方面，通过使用Ar气体在负样品偏压下对样品进行有效地蚀刻ZnTe。通过放置镍网获得的蚀刻图案显示，只有照射区域被蚀刻。对腐蚀机理进行了研究。为了利用佐贺县政府建造的同步加速器光源，设计并建造了用于先进材料开发和加工的新光束线。此外，作为同步辐射光处理的初步实验，我们还进行了电子材料的处理，包括外延生长、掺杂、刻蚀和退火。

项目成果

半導体の製造方法

半导体制造方法

• 发表时间: 2006

Effects of substrate temperature upon photoluminescence and electrical properties of ZnTe in atmospheric pressure MOVPE using tris-dimethlaminophosphorus

基底温度对三二甲氨基磷常压 MOVPE 中 ZnTe 光致发光和电性能的影响

• 发表时间: 2006
• 期刊: Physica status solidi(c) Vol.3
• 作者: Kazuki Hayashida;Tooru Tanaka;Mitsuhiro Nishio;Qixin Guo;T.Tanigawa;Hiroshi Ogawa
• 通讯作者: Hiroshi Ogawa

Design of Beamline BL9 at Saga Light Source

Saga Light Source 的光束线 BL9 设计

• 发表时间: 2007
• 期刊: AIP series of conference proceedings Vol.879
• 作者: Tooru Tanaka;Hiroshi Ogawa;Masao Kamada;Mitsuhiro Nishio;Masataka Masuda;Qixin Guo;Kazuki Hayashida;Yuzi Kondo;Teruaki Motooka;Daisuke Yoshimura;Hiroyuki Setoyama;Toshihiro Okajima
• 通讯作者: Toshihiro Okajima

Effect of surface treatment on properties of ZnTe LED fabricated by Al thermal diffusion

表面处理对Al热扩散ZnTe LED性能的影响

• 发表时间: 2006
• 期刊: Physica status solidi(b) Vol.243
• 作者: Tooru Tanaka;Kazuki Hayashida;Katsuhiko Saito;Mitsuhiro Nishino;Qixin Guo;Hiroshi Ogawa
• 通讯作者: Hiroshi Ogawa

Study of Al thermal diffusion in ZnTe by secondary ion mass spectroscopy

二次离子质谱研究ZnTe中Al热扩散

• 发表时间: 2007
• 期刊: physica status solidi (b) (in press)
• 作者: Tooru Tanaka;Norihiro Murata;Katsuhiko Saito;Qixin Guo;Mitsuhiro Nishio;Hiroshi Ogawa
• 通讯作者: Hiroshi Ogawa