课题基金 / 基金详情

Growth and doping of ZnTe by synchrotron-radiation-excited epitaxy

Growth and doping of ZnTe by synchrotron-radiation-excited epitaxy
同步辐射激发外延法生长和掺杂 ZnTe
批准号:
10650014
负责人:
NISHIO Mitsuhiro
金额:
$1.79万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1998
资助国家:
日本
项目状态:
已结题
起止时间:
1998 至 1999

项目摘要

项目成果

NISHIO Mitsuhiro的其他基金

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中文摘要
翻译
Until now,we have shown experimentally that syndrotron-radiation-excited growth is very promising as non-thermal epitaxial technique.By heralding the world,we have demonstrated that epitaxial growth and atomic layer epitaxy of compound semiconductor(ZnTe)can be realized at room temperature using the synchrotron radiation.It is of great importance that the possibility of the physical property control is examined in order to develop this research.The main purpose of this study is to investigate detailed growth characteristics and photoluminescence properties of ZnTe films grown by synchrotron-radiation-excited growth with and without the impurity addition。Synchrotron radiation(BL-8A White light)in UVSOR facility was utilized as a light source。Growth has been carried out at a very low pressure of l0 I D1-5 I D 1 Torr in order to suppress the gas phase reaction.Basic growth parameters such as VI/II transport rate ratio and substrate temperature and the types of carrier gases w…More ere varied to investigate systematic influence upon growth characteristics(Growth Rate Growth Condition Variously HREED Surface State Crystallinity)and crystal quality(mainly,photoluminescence property)of ZnTe films。The substrate temperature range of room temperature-l00℃,which is much lower than the temperature rang for pyrolysis of precursor sources,is chosen to demonstrate usefulness of the utilization of the synchrotron radiation。As the result,we have obtained detailed information on growth characteristics。As for the crystal quality,it is clarified that carbon coming from the precursor sources not incorporated into ZnTe grown layer independent of growth parameters。The crystal quality greatly changes with VI/II transport rate ratio。It is possible to suppress the deep-level emission band associated with defects under a Te rich condition.Also,there is the possibility of p-type doping with the nitrogen carrier gas,since acceptor-related bound exciton is observed predominantly in the photoluminescence spectrum.Less:Less
英文摘要
Until now, we have shown experimentally that syndrotron-radiation-excited growth is very promising as a non-thermal epitaxial technique. By heralding the world, we have demonstrated that epitaxial growth and atomic layer epitaxy of compound semiconductor (ZnTe) can be realized at room temperature using the synchrotron radiation. It is of great importance that the possibility of the physical property control is examined in order to develop this research. The main purpose of this study is to investigate detailed growth characteristics and photoluminescence properties of ZnTe films grown by synchrotron-radiation-excited growth with and without the impurity addition. Synchrotron radiation ( BL-8A White light ) in UVSOR facility was utilized as a light source. Growth has been carried out at a very low pressure of l0ィイD1-5ィエD1 Torr in order to suppress the gas phase reaction. Basic growth parameters such as VI/II transport rate ratio and substrate temperature and the types of carrier gases w … More ere varied to investigate systematic influence upon growth characteristics (growth rate growth condition variously HREED surface state crystallinity) and crystal quality (mainly, photoluminescence property) of ZnTe films. The substrate temperature range of room temperature-l00℃, which is much lower than the temperature rang for pyrolysis of precursor sources, is chosen to demonstrate usefulness of the utilization of the synchrotron radiation. As the result, we have obtained detailed information on growth characteristics. As for the crystal quality, it is clarified that carbon coming from the precursor sources not incorporated into ZnTe grown layer independent of growth parameters. The crystal quality greatly changes with VI/II transport rate ratio. It is possible to suppress the deep-level emission band associated with defects under a Te rich condition. Also, there is the possibility of p-type doping with the nitrogen carrier gas, since acceptor-related bound exciton is observed predominantly in the photoluminescence spectrum. Less
期刊论文(24)
专著(0)
科研奖励(0)
会议论文
Mitsuhiro NISHIO, Takeshi ENOKI, Yoshiaki MITSUISHI, Qixin GUO and Hiroshi OGAWA: "Homoepitaxial growth of ZnTe by synchrotron radiation using metalorganic sources"UVSOR ACTIVITY REPORT 1998. UVSOR-26. 195-196 (1999)
Mitsuhiro NISHIO、Takeshi ENOKI、Yoshiaki MITSUISHI、Qixin GUO 和 Hiroshi OGAWA:“使用金属有机源通过同步辐射进行 ZnTe 的同质外延生长”UVSOR 活动报告 1998。UVSOR-26。
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通讯作者:
K.Hayashida, M.Nishio, S.Furukawa, Qixin Guo and H.Ogawa: "Effects of wavelength upon photoluminescene properties of ZnTe layers grown by photoassisted MOVPE"J. Crystal Growth. (in press). (2000)
K.Hayashida、M.Nishio、S.Furukawa、QixinGuo 和 H.Okawa:“波长对光辅助 MOVPE 生长的 ZnTe 层的光致发光特性的影响”J。
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通讯作者:
M.Nishio,Q.Guo,H.Ogawa: "Ohmic contucts to p-type ZnTe using electroless Pd"Thin Solid Films. 343-344. 508-511 (1999)
M.Nishio、Q.Guo、H.Okawa:“使用化学镀 Pd 实现 p 型 ZnTe 的欧姆接触”固体薄膜。
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通讯作者:
Q.X.Gou: "Energy loss spectrum of AlN in the 6-120 eV region" Journal of Crystal Growth. 189/190. 457 (1998)
Q.X.Gou:“AlN 在 6-120 eV 区域的能量损失谱”《晶体生长杂志》。
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通讯作者:
24
    Development of ZnTe based heterostructure for improvement of efficiency of pure green LED
    • 批准号:
      22560299
    • 项目类别:
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    • 资助金额:
      $2.83万
    • 财政年份:
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    • 负责人:
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    • 依托单位:
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    • 项目类别:
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    • 资助金额:
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    • 依托单位:
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    • 批准号:
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    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $1.86万
    • 财政年份:
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    • 依托单位:
    海外基金