Development of deep UV light emitting devices using nano-technology and the application
纳米技术深紫外发光器件的研制及应用
基本信息
- 批准号:15GS0207
- 负责人:
- 金额:$ 303.93万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Creative Scientific Research
- 财政年份:2003
- 资助国家:日本
- 起止时间:2003 至 2007
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
In this project we have proposed several new technologies on development of solid state high power deep UV (DUV) light emitting devices (LEDs), which could essentially solve a lot of environmental problems concerned by many people nowadays, and have proven the real possibility of our proposal toward the high power DUV light emitting devices. Epitaxial crystal growth procedures have fundamentally been clarified by some scientific approaches. Highly-doping technologies for p-type widegap semiconductors and highly-efficient nonlinear photonic crystals have been developed. Our results are as follows:1.Epitaxial growth mechanism of A1GaN-based materials and hetero structures has scientifically been revealed by a newly developed in-situ monitoring system instead of previous experiential approach.2.Development of vertical-type DUV LEDs emitting at 280 nm has been succeeded, which promise future high-power operation.3.InAlGaN quantum dot DUV LEDs have firstly been operated at 355nm.4.Extremely enhanced SHG has been generated by newly developed hetero nonlinear photonic crystals. The efficiency was more than 300 times compared with balk nonlinear materials. DUV laser was operated at 325 nm by this technology.5.Epitaxial growth of new nonlinear-photonic-crystal thin films (RECa4O(BO3)3RECOB) has been succeeded by flax crystal growth technique.6.P-type doping of ZnO materials has been accomplished by introducing growth temperature modulation with combinatorial technique.These results are published in about 50 original papers and presented in international conference of more than 65 including 8 invited papers. About 75 papers are presented in domestic conference. Patents obtained or required are 13. Typical examples for each are listed in following sheets
在本计画中,我们提出了几项固态高功率深紫外发光元件的新技术,可以从根本上解决目前许多人所关心的环境问题,并证明我们的方案对于高功率深紫外发光元件的真实的可能性。外延晶体生长过程已经通过一些科学方法从根本上阐明。p型宽禁带半导体和高效非线性光子晶体的高掺杂技术已经发展起来。主要研究结果如下:1.利用新开发的原位监测系统,科学地揭示了AlGaN基材料和异质结构的外延生长机理; 2.成功研制了280 nm垂直型深紫外发光二极管,有望实现未来的大功率工作; 3.首次实现了355 nm波长的InAlGaN量子点深紫外发光二极管; 4.利用新开发的异质非线性光子晶体产生了极大增强的二次谐波。与一般非线性材料相比,效率提高了300倍以上。利用该技术实现了325 nm深紫外激光输出。5.新型非线性光子晶体薄膜的外延生长(RECa_4O(BO_3)_3RECOB)的晶体生长工艺,并采用亚麻籽晶生长技术进行了改进。通过引入生长温度调制和组合技术,实现了ZnO材料的掺杂,发表了约50篇原创论文,并在65多个国际会议上发表包括8篇特邀论文。在国内会议上发表论文75篇。获得或需要的专利有13项。下表中列出了每种方法的典型示例
项目成果
期刊论文数量(139)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Remarkable Breakdown Voltage Enhancement in A1GaN Channel HEMTs operation of A1GaN channel high electron mobility transistors with sufficiently low resistive source/drain contact formed by Si ion implantation
通过 Si 离子注入形成具有足够低电阻的源极/漏极接触的 A1GaN 沟道高电子迁移率晶体管的 A1GaN 沟道 HEMT 操作中击穿电压显着增强
- DOI:
- 发表时间:2007
- 期刊:
- 影响因子:0
- 作者:T.Asano;B.-S.Song;S.Noda;中西祥人;A.Yamasaki et al.;〓;H.Sumiya;T. Nanjo,
- 通讯作者:T. Nanjo,
終端バリア層厚制御によるA1GaN系深紫外LEDの注入効率の向上
通过控制终端势垒层的厚度提高AlGaN基深紫外LED的注入效率
- DOI:
- 发表时间:2007
- 期刊:
- 影响因子:0
- 作者:Nagao;K.;Takahashi;K.;Hanada;K.;Kioka;N.;Matsuo;M.;and Ueda;K.;武内 道一
- 通讯作者:武内 道一
Characteristics of Two Dimensional Nonlinear Photonic Crystals and those applications, (invited talk)
二维非线性光子晶体的特性及其应用(特邀报告)
- DOI:
- 发表时间:2005
- 期刊:
- 影响因子:0
- 作者:Sakai;H.;Tanaka;Y.;Tanaka;M.;Ban;N.;Yamada;K.;Matsumura;Y.;Kita;T.;and Inagaki;N.;S. Inoue
- 通讯作者:S. Inoue
'「次世代エレクトロニクス薄膜技術」、第6章コンビナトリアルテクノロジー集積化薄膜技術による材料開発の革新
“下一代电子薄膜技术”,第 6 章通过组合技术集成薄膜技术进行材料开发创新
- DOI:
- 发表时间:2003
- 期刊:
- 影响因子:0
- 作者:A. Sato;et al;松本 祐司
- 通讯作者:松本 祐司
Quaternary InAlGaN quantum-dot ultraviolet light-emitting diode emitting at 335 nm fabricated by an anti-surfactant method
反表面活性剂法制备335 nm四元InAlGaN量子点紫外发光二极管
- DOI:
- 发表时间:2008
- 期刊:
- 影响因子:0
- 作者:Nakamura;T;Mima;K;H. Hirayama
- 通讯作者:H. Hirayama
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AOYAGI Yoshinobu其他文献
AOYAGI Yoshinobu的其他文献
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{{ truncateString('AOYAGI Yoshinobu', 18)}}的其他基金
Development of new high power deep UV light emitting device
新型高功率深紫外发光器件的研制
- 批准号:
22246051 - 财政年份:2010
- 资助金额:
$ 303.93万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Control of spin transport in carbon nanotubes
碳纳米管中自旋输运的控制
- 批准号:
12305003 - 财政年份:2000
- 资助金额:
$ 303.93万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Fabrication of Photonic Crystals with Spatial Phase Control Regions and their applications to Optical Devices
具有空间相位控制区域的光子晶体的制备及其在光学器件中的应用
- 批准号:
10210206 - 财政年份:1998
- 资助金额:
$ 303.93万 - 项目类别:
Grant-in-Aid for Scientific Research on Priority Areas (B)
Development and Application of Bule Light-Emitting Nanocrystalline Si Materials
蓝光纳米晶硅材料的开发与应用
- 批准号:
08455152 - 财政年份:1996
- 资助金额:
$ 303.93万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Development of reactively controlled super-sonic nozzle beam epitaxial growth technique
反应控制超音速喷嘴束外延生长技术的发展
- 批准号:
07505013 - 财政年份:1995
- 资助金额:
$ 303.93万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Short pulse Supersonic Beam Epitaxy
短脉冲超声束外延
- 批准号:
06452115 - 财政年份:1994
- 资助金额:
$ 303.93万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
Developement of pattern-defined-epitaxial growth employing laser MOCVD and its application to new optoelectric devices
激光MOCVD模式定义外延生长技术的发展及其在新型光电器件中的应用
- 批准号:
61460071 - 财政年份:1986
- 资助金额:
$ 303.93万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)