Band-Structure Modification by Insertion of Small Atoms at Tetrahedral Interstitial Sites in Zinc-Blende-Like Lattice

通过在类闪锌矿晶格的四面体间隙位置插入小原子来改变能带结构

基本信息

  • 批准号:
    01540282
  • 负责人:
  • 金额:
    $ 0.83万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)
  • 财政年份:
    1989
  • 资助国家:
    日本
  • 起止时间:
    1989 至 1990
  • 项目状态:
    已结题

项目摘要

LiZnP can be viewed as a zinc-blende-like (ZnP)^- lattice filled partially with He-like Li^+ interstitials. We have grown LiZnP by directional solidification of Li, Zn, and P using a tantalum crucible. The grown crystals were transparent red in color and showed the antifluorite structure with a=5.765<plus-minus>0.005A. The differential thermal analysis show an endothermic reaction around 950^゚C, indicating the melting point or the decomposition of the crystal. LiZnP was confirmed to be a semiconductor with direct band gap 2.04 to 2.12 eV at a temperature ranging from 295 to 95 K. As grown-crystals are p-type except for some crystals. The typical resistivity, Hall mobility, and carrier concentration at room temperature are of the order of 10^<-1>-10 OMEGAcm, 1-10 cm^2/Vs and 10^<16>-10^<18> cm^<-3>, respectively. The radiative recombination related to a native defect in LiZnP was studied at 77K using photoluminescence (PL) technique. One type of PL emission consists of two peaks : One is a peak 615nm (2.02 eV) associated with a phosphorus vacancy (lying at 110meV below the conduction band) -valence band transition and the other a broad peak at 848nm (1.46eV) associated with phosphorus vacancy-acceptor complex. Another type exhibits an only broad emission around 830 nm. The origin of the broad emissions observed in both types is likely to be identical essentially.
LiZnP可以看作是部分填充了类He Li^+间隙的类闪锌矿(ZnP)^-晶格。我们用钽坩埚定向凝固Li、Zn和P生长了LiZnP。晶体呈透明红色,呈反萤石结构,a=5.765&lt;正负&gt;0.005A。差热分析表明,在95 0゚C附近发生吸热反应,表明晶体的熔点或分解。在295~95K温度范围内,LiZnP为直接禁带宽度为2.04~2.12 eV的半导体,除部分晶体外,其余晶体均为p型晶体。其典型的室温电阻率、霍尔迁移率和载流子浓度分别为10^lt;-1-10欧姆、1-10 cm^2/vs和10^lt;-16;-10^lt;18 cm^-3。用光致发光(PL)技术研究了77K下LiZnP中与本征缺陷有关的辐射复合。一种类型的发光由两个峰组成:一个是与磷空位(位于导带下方110 meV)价带跃迁有关的615 nm(2.02 eV)峰,另一个是与磷空位-受主复合体有关的848 nm(1.46 eV)的宽峰。另一种类型的发光仅在830 nm附近有宽发射。在两种类型中观察到的广泛排放的来源很可能在本质上是相同的。

项目成果

期刊论文数量(18)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
K. Kuriyama: "Optical band gap of the filled tetrahedral semiconductor LiZnP" Phys. Rev. B (Rapid Commun.). Vol. 37. 7140-7142 (1998)
K. Kuriyama:“填充四面体半导体 LiZnP 的光学带隙”Phys。
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K.Kuriyama: "Crystal Growth and characteriaztion of the filled tetrahedral semiconductor LiZnP" Proceedings of the 9th international Conference on Crystal Growth.
K.Kuriyama:“填充四面体半导体 LiZnP 的晶体生长和表征”第九届国际晶体生长会议论文集。
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K.Kuriyama: "Preparation and characterization of the filled tetrahedral semiconductor LiZnP film on quartz" J.Appl.Phys.66. 3945-3947 (1989)
K.Kuriyama:“石英上填充四面体半导体 LiZnP 薄膜的制备和表征”J.Appl.Phys.66。
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K.Kuriyama: "Optical band gap of the filled tetrahedral semiconductor LiznP" Phys.Rev.B. 37. 7140-7142 (1988)
K.Kuriyama:“填充四面体半导体 LiznP 的光学带隙”Phys.Rev.B。
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    0
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K.Kuriyama: "Photoluminescence study of native defects in the filled tetrahedral semiconductor LiZnP" J.Appl.Phys.69. (1991)
K.Kuriyama:“填充四面体半导体 LiZnP 中固有缺陷的光致发光研究”J.Appl.Phys.69。
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KURIYAMA Kazuo其他文献

KURIYAMA Kazuo的其他文献

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{{ truncateString('KURIYAMA Kazuo', 18)}}的其他基金

Study on the fabrication and high-performance of ultra-micro lithium secondary batteries embedded in silicon chips
硅片嵌入超微型锂二次电池的制备及高性能研究
  • 批准号:
    22550167
  • 财政年份:
    2010
  • 资助金额:
    $ 0.83万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Nano-meter scaled evaluation for dynamic behavior of lithium ions in a micro secondary battery embedded in silicon substrate
嵌入硅基板的微型二次电池中锂离子动态行为的纳米级评估
  • 批准号:
    15360014
  • 财政年份:
    2003
  • 资助金额:
    $ 0.83万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Fabrication and characterization of a lithium conductive multiple layer embedded into a Si substrate
嵌入硅衬底的锂导电多层的制造和表征
  • 批准号:
    12450016
  • 财政年份:
    2000
  • 资助金额:
    $ 0.83万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)

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拉曼光谱高温下宽禁带半导体电极界面电子物理性质分析及晶体缺陷分布
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拉曼光谱应力测量新方法研究宽禁带半导体电极界面物理性质
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