Advanced Science and Technology for Semiconductor Materials and Devices
Advanced Science and Technology for Semiconductor Materials and Devices
批准号:
05044206
负责人:
KUKIMOTO Hiroshi
金额:
$0.0万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Overseas Scientific Survey.
财政年份:
1993
资助国家:
日本
项目状态:
已结题
起止时间:
1993 至 --
中文摘要
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英文摘要
Recently, there has been an increasing research effort in the field of quantum size effects in semiconductor microstructures and their application for novel electronic and optoelectronic devices. The development of this field depends largely on progress in advanced science and technology, and thus needs international research cooperation. Korea is one of the most appropriate partner countries for the international research cooperation in this field.The purpose of this project is, therefore, to promote the researches on advanced science and technology for semiconductor materials and devices in Japanese and Korean research institutes, based on an exchange of scientific information and mutual collaborations.The activities and achievements of this project are as follows.1) The materials investigated include SiGe, III-Vs (AlGaAs and GaInPAs) and II-VIs (ZnSe and CdSe). A variety of micostructures such as superlattices, quantum wires and quantum dots consisted of these materials were fabricated by using molecular beam epitaxy and metalorganic vapor phase epitaxy. Characterization of these materials and structures directed toward their device applications was also performed.2) Japan-Korea Symposium on Advanced Science and Materials for Semiconductor Materials and Devices was held in September 1993, in Sapporo with participants of 17 from Japan and 9 from Korea. Discussion was made about the results of collaborative studies of this project.3) Summary of this project was made at a meeting held in December, 1993 in Korea, where 4 Japanese members were sent. By using the opportunity, further research cooperation between Japan and Korea in the future was discussed.In summary, the purpose of this research project was successfully carried out with remarkable achievements and promise for further collaborations.
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A.Yoshikawa: "A New In-situ Optical Probing Method in Heteroepitaxy:Surface Photo-Interference(SPI)and Its Application to the Study of ZnSe MOMBE Growth Process" 3rd Japan-Korea Joint Symposium“Advanced Science and Technology of Semiconductor Materials an
A. Yoshikawa:“异质外延中的一种新的原位光学探测方法:表面光干涉(SPI)及其在ZnSe MOMBE生长过程研究中的应用”第三届日韩联合研讨会“半导体材料与先进科学技术”
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K.Y.Lim: "Photoluminescence and Raman Scattering Analysis of In_xGa_<1-x>As Epilayers Grown on GaAs by Low-Pressure Metalorganic Chemical Vapor Deposition" 3rd Japan-Korea Symposium on Advanced Science and Technology for Semiconductor Materials and Device
K.Y.Lim:“低压金属有机化学气相沉积在GaAs上生长的In_xGa_<1-x>As外延层的光致发光和拉曼散射分析”第三届日韩半导体材料与器件先进科学技术研讨会
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Y.Shiraki: "Formation of SiGe/Si Quantum Wells and Their Optical Properties" 3rd Japan-Korea Joint Symposium“Advanced Science and Technology of Semiconductor Materials and Devices". 1-6 (1993)
Y. Shiraki:“SiGe/Si量子阱的形成及其光学性质”第三届日韩联合研讨会“半导体材料与器件的先进科学技术”1-6(1993)。
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S.Park: "Origin of the Long-Wavelength-Side Peak in Al_XGa_<1-X>As:Si Light-Emitting Diodes" Jpn.J.Appl.Phys.32. 3197-3198 (1993)
S.Park:“Al_XGa_<1-X>As:Si 发光二极管中长波长侧峰的起源”Jpn.J.Appl.Phys.32。
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S.-I.Kim: "Electrical Characteristics of Carbon-Doped GaAs" J.Appl.Phys.73. 4703-4705 (1993)
S.-I.Kim:“碳掺杂 GaAs 的电特性”J.Appl.Phys.73。
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共 20 条
Advanced Science and Technology for Semiconductor Materials and Devices
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批准号:06044077
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项目类别:Grant-in-Aid for international Scientific Research
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资助金额:$1.15万
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财政年份:1994
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负责人:KUKIMOTO Hiroshi
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依托单位:
Selective area growth of compound semiconductors induced by electron-beam irradiation
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批准号:03402023
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项目类别:Grant-in-Aid for General Scientific Research (A)
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资助金额:$16.77万
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财政年份:1991
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负责人:KUKIMOTO Hiroshi
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依托单位:
Development of Blue-Emitting EL devices with High Color-Purity and Brightness
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批准号:01850006
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项目类别:Grant-in-Aid for Developmental Scientific Research
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资助金额:$12.93万
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财政年份:1989
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负责人:KUKIMOTO Hiroshi
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依托单位:
海外基金