DEVELOPMENT OF FABRICATION SYSTEM FOR NEW QUANTUM FUNCTIONAL MATERIALS OF SEMICONDUCTOR/INSULATOR/METAL HYBRID STRUCTURES

半导体/绝缘体/金属混合结构新型量子功能材料制造系统开发

基本信息

  • 批准号:
    07555100
  • 负责人:
  • 金额:
    $ 14.78万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
  • 财政年份:
    1995
  • 资助国家:
    日本
  • 起止时间:
    1995 至 1997
  • 项目状态:
    已结题

项目摘要

To realize such a hybrid structure as smiconductor/insulator/metal for a new quantum functional materials, conventional growth techniques are of no use. The hetero-interface must be controlled to one monolayr accuracy. We designed and fabricated a new reactor structure in OMVPE system with very quick switching of source gases and correpondong pressure balance in the low-pressure vertical reactor.To test the basic capability of the new growth system, InP/InGaAs/InP with monolayr level InGaAs and with different switching modes of source gases were grown and the heterointerface structures were investigated mainly by the X-ray CTR scattering and interference using synchrotron radiation.delta-doped ErP structures in InP were also fabricated and the layr structure and even the crystal structure of the ErP were elucidated by fluorescence-detected EXAFS and X-ray CTR scattering. The ErP layr was found to be the rocksalt structure by both techniques and the Er distribution (as-grown and after anealing) was determined to one monolayr level. From the growth temperature dependence of the local structures around Er atoms it was very clearly concluded that the strong dependence of the photo-luminescecce intensity on the growth temperature is determined by the local structure around the Er atoms, i.e., zincblende strucrtre gives a high intensity and the rocksalt structure almost diminshes the luminescene.The versatile switching modes of the new growth system enabled the droplet hetero-epitaxy by which InAs quantum dots on InP (001)-just surface were successfully fabricated and showed emission in the 1.5mum-region which is important for the optical fiber communication.
为了实现半导体/绝缘体/金属的混合结构作为一种新的量子功能材料,传统的生长技术是没有用的。异质界面必须控制在单层精度。我们设计并制作了一种新的OMVPE系统反应器结构,该反应器具有源气体的快速切换和低压立式反应器中的相应压力平衡。生长了具有单层水平InGaAs和不同源气体开关模式的InP/InGaAs/InP异质界面结构,主要用X-射线衍射研究了异质界面结构。利用同步辐射进行X射线CTR散射和干涉。还在InP中制备了δ掺杂ErP结构,并通过荧光探测EXAFS和X射线CTR散射阐明了ErP的层结构甚至晶体结构。ErP层被发现是岩盐结构,通过这两种技术和Er分布(生长和退火后)被确定为一个单层水平。从Er原子周围的局域结构的生长温度依赖性可以非常清楚地得出结论,光致发光强度对生长温度的强烈依赖性是由Er原子周围的局域结构决定的,即,这种新的生长体系的多功能开关模式使液滴异质外延成为可能,成功地在InP(001)面上制备了InAs量子点,并在1.5 μ m范围内发射,这对光纤通信具有重要意义。

项目成果

期刊论文数量(17)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
M.Tabuchi, Y.Takeda et al.: "Monolayr scale analysis of ZnSe/GaAs hetero-interfaces structures by X-ray CTR scattering and interference" Inst.Phys.Conf.Ser.(accepted for publication).
M.Tabuchi、Y.Takeda 等人:“通过 X 射线 CTR 散射和干涉对 ZnSe/GaAs 异质界面结构进行单层尺度分析”Inst.Phys.Conf.Ser.(已接受发表)。
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    0
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  • 通讯作者:
竹田,田渕 他: "Distributio of As atoms in InP/InPAs/InP and InP/In GaAs/InP hetero-structures measured by X-ray CTR scatering." Inst.Phys.Conf.Ser.145. 227-232 (1976)
Takeda, Tabuchi 等人:“通过 X 射线 CTR 散射测量 InP/InPAs/InP 和 InP/In GaAs/InP 异质结构中 As 原子的分布。” 227-232。 (1976)
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    0
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M.Tabuchi, Y.Takeda et al.: "Observation of composition in surface monolayr by X-ray scattering spectra caused by crystal truncation rod and interference" J.Synch.Radiat.(accepted for publication).
M.Tabuchi、Y.Takeda 等人:“通过晶体截断棒和干扰引起的 X 射线散射光谱观察表面单层的组成”J.Synch.Radiat.(已接受出版)。
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  • 影响因子:
    0
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田渕, 竹田 他: "Atom configuration study of δ-doped Er in InP by fluorescence" Applied Surface Science. 117/118. 781-784 (1997)
Tabuchi, Takeda 等人:“通过荧光研究 InP 中 δ 掺杂 Er 的原子构型”应用表面科学 117/118 (1997)。
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  • 期刊:
  • 影响因子:
    0
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  • 通讯作者:
M.Tabuchi, Y.Takda et al.: "Group-V atoms exchange due to exposure of InP surface to AsH_3 (+PH_3) revealed by X-ray CTR scattering" J.Electron.Mat.Vol.25. 671-675 (1996)
M.Tabuchi、Y.Takda 等人:“X 射线 CTR 散射揭示了 InP 表面暴露于 AsH_3 (PH_3) 导致的 V 族原子交换”J.Electron.Mat.Vol.25。
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    0
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TAKEDA Yoshikazu其他文献

TAKEDA Yoshikazu的其他文献

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{{ truncateString('TAKEDA Yoshikazu', 18)}}的其他基金

Improvement of quantum efficiency of super-high brightness and high spin-polarization photocathodes
超高亮度高自旋偏振光电阴极量子效率的提高
  • 批准号:
    23246003
  • 财政年份:
    2011
  • 资助金额:
    $ 14.78万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Intrinsic Hetero-interface Structures and Their Formation
本征异质界面结构及其形成
  • 批准号:
    18106001
  • 财政年份:
    2006
  • 资助金额:
    $ 14.78万
  • 项目类别:
    Grant-in-Aid for Scientific Research (S)
Fabrication of Semiconductor Light Amplifier using Ultra-High Co-Doping of Er and O
利用 Er 和 O 超高共掺杂制造半导体光放大器
  • 批准号:
    13305022
  • 财政年份:
    2001
  • 资助金额:
    $ 14.78万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
CRYSTAL STRUCTURE ANALYSIS OF SURFACE AND INTERFACE 1 ATOMIC LAYER AND CONTROL OF HETEROSTRUCTURE GROWTH
表面和界面1原子层的晶体结构分析及异质结构生长的控制
  • 批准号:
    09305003
  • 财政年份:
    1997
  • 资助金额:
    $ 14.78万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
RESEARCH ON ATOMIC LAYER CONTROLLED GROWTH AND CHARACTERIZATION OF SEMICONDUCTOR QUANTUM STRUCTURES WITH DIFFERENT GROUP-V ATOMS
不同V族原子半导体量子结构的原子层控制生长及表征研究
  • 批准号:
    07455007
  • 财政年份:
    1995
  • 资助金额:
    $ 14.78万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
RESEARCH ON NEW QUANTUM FUNCTIONAL MATERIALS BY SEMICONDUCTOR/INSULATOR/METAL HYBRID STRUCTURES
半导体/绝缘体/金属混合结构新型量子功能材料研究
  • 批准号:
    04452174
  • 财政年份:
    1992
  • 资助金额:
    $ 14.78万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
Research on New Properties by Binary/Binary Superlattices
二元/二元超晶格新性质研究
  • 批准号:
    60550232
  • 财政年份:
    1985
  • 资助金额:
    $ 14.78万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)

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