Intrinsic Hetero-interface Structures and Their Formation
Intrinsic Hetero-interface Structures and Their Formation
批准号:
18106001
负责人:
TAKEDA Yoshikazu
金额:
$74.38万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (S)
财政年份:
2006
资助国家:
日本
项目状态:
已结题
起止时间:
2006 至 2010
中文摘要
1)利用实验室X射线源,制作了能够研究埋层界面的X射线CTR散射测量系统; 2)通过X射线衍射、X射线CTR散射和X射线反射率等方法,对异质结构的形成进行了原位观察; 3)对异质结构和器件结构特性进行了关联。
英文摘要
1) The X-ray CTR scattering measurement system that uses laboratory X-ray sources and that can investigate the buried interfaces was fabricated.2) The hetero-structure formation was observed in situ by X-ray diffraction, X-ray CTR scattering, and X-ray reflectivity.3) The hetero-structure and device structure properties were correlated.
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In situ X-ray measurements of MOVPE growth of In_xGa_<1-x>N single quantum well
In_xGa_<1-x>N单量子阱MOVPE生长的原位X射线测量
DOI:
--
发表时间:
2013
期刊:
Journal of Crystal Growth
影响因子:
1.8
作者:
[G.X.Ju, S.Fuchi, M.Tabuchi, and Y.Takeda]
通讯作者:
and Y.Takeda
Development of New X-ray CTR Scattering Measurement System Using Johansson Monochromator
使用 Johansson 单色仪开发新型 X 射线 CTR 散射测量系统
DOI:
--
发表时间:
2009
期刊:
Trans.Mat.Res.Soc.Jpn. 34
影响因子:
--
作者:
[M.Tabuchi, Y.Takeda, 他]
通讯作者:
他
X-ray CTR scattering measurement to investigate the formation process of InP/GaInAs interface
X射线CTR散射测量研究InP/GaInAs界面的形成过程
DOI:
10.1088/1742-6596/83/1/012031
发表时间:
2007
期刊:
Journal of Physics : Conference Series
影响因子:
--
作者:
[M. Tabuchi, A. Mori, Y. Ohtake, and Y. Takeda]
通讯作者:
and Y. Takeda
OMVPE成長の半導体ヘテロ界面その場観察に向けた実験室系X線CTR散乱測定(EMS賞受賞)
基于实验室的 X 射线 CTR 散射测量,用于 OMVPE 生长中半导体异质界面的原位观察(EMS 奖获得者)
DOI:
--
发表时间:
2008
期刊:
影响因子:
--
作者:
[水野哲也, 前田義紀, 神谷肇, 森晶子, 田渕雅夫, 竹田美和]
通讯作者:
竹田美和
実験室系X線CTR散乱測定装置におけるソーラスリットの効果
实验室X射线CTR散射测量设备中太阳狭缝的影响
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[田渕雅夫, 竹田美和, 他]
通讯作者:
他
共 62 条
Improvement of quantum efficiency of super-high brightness and high spin-polarization photocathodes
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批准号:23246003
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$23.8万
-
财政年份:2011
-
负责人:TAKEDA Yoshikazu
-
依托单位:
Fabrication of Semiconductor Light Amplifier using Ultra-High Co-Doping of Er and O
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批准号:13305022
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$27.54万
-
财政年份:2001
-
负责人:TAKEDA Yoshikazu
-
依托单位:
CRYSTAL STRUCTURE ANALYSIS OF SURFACE AND INTERFACE 1 ATOMIC LAYER AND CONTROL OF HETEROSTRUCTURE GROWTH
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批准号:09305003
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项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$24.9万
-
财政年份:1997
-
负责人:TAKEDA Yoshikazu
-
依托单位:
RESEARCH ON ATOMIC LAYER CONTROLLED GROWTH AND CHARACTERIZATION OF SEMICONDUCTOR QUANTUM STRUCTURES WITH DIFFERENT GROUP-V ATOMS
-
批准号:07455007
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$5.38万
-
财政年份:1995
-
负责人:TAKEDA Yoshikazu
-
依托单位:
DEVELOPMENT OF FABRICATION SYSTEM FOR NEW QUANTUM FUNCTIONAL MATERIALS OF SEMICONDUCTOR/INSULATOR/METAL HYBRID STRUCTURES
-
批准号:07555100
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$14.78万
-
财政年份:1995
-
负责人:TAKEDA Yoshikazu
-
依托单位:
RESEARCH ON NEW QUANTUM FUNCTIONAL MATERIALS BY SEMICONDUCTOR/INSULATOR/METAL HYBRID STRUCTURES
-
批准号:04452174
-
项目类别:Grant-in-Aid for General Scientific Research (B)
-
资助金额:$4.1万
-
财政年份:1992
-
负责人:TAKEDA Yoshikazu
-
依托单位:
Research on New Properties by Binary/Binary Superlattices
-
批准号:60550232
-
项目类别:Grant-in-Aid for General Scientific Research (C)
-
资助金额:$1.28万
-
财政年份:1985
-
负责人:TAKEDA Yoshikazu
-
依托单位:
海外基金