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Surface Integrity of Mechanically Polished Diamonds

机械抛光钻石的表面完整性

基本信息

批准号：
08455072
负责人：
TOKURA Hitoshi
金额：
$ 4.99万
依托单位：
Tokyo Institute of Technology
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B)
财政年份：
1996
资助国家：
日本
起止时间：
1996 至 1997
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-08455072/
关键词：
single crystaline diamond diamond film daiamond wheel polishing affected layr etching by air hydrogen plasma etching wear mechanism ダイヤモンド砥石亀裂加工面性状機能性材料

项目摘要

In the early 1980s, reproducible method of diamond synthesis from gas phase was reported by NIRIM in Japan. More than 15 years have passed and diamod films have been gradually applied to cutting tools or wear-resistant parts. Diamond is the unique material of its transparency in wide range of wave length, high heat conductivity and chemical stability and etc. In the application, it is essencial to polish or shape. In this study, surface integrity of mechanically polished diamond has been investigated.First of all, wear characteristics of diamond by mechanical method have studied. Then in order to find suitable method to estimate affected layr of mechanichally polished diamond, diamond was etched with hot air or hydrogen plasma. It was found that hydrogen plasma etching is much suitable to make clear the affected layr. And the optimum etching conditions have been found.Single crystal diamond and diamond films which have processed by the diamond wheel of _<600 or >1500 were etched by hydrogen plasma. Before etching both surfaces have been observed very smooth. Once these are etched tiny cracks appeared on the polished surfaces and the shape depend on the crystalgraphic orientation. From these results, it is concluded that even on diamond affected layr exsists. And crack habit shows the relation with the orientation, therefore the appeared cracks might be an origin of wear.

20世纪80年代初，日本NIRIM报道了可重复的气相合成金刚石的方法。15年多过去了，金刚石薄膜已逐渐应用于切削工具或耐磨零件。金刚石是一种独特的材料，它具有波长范围宽、透明、高导热性和化学稳定性等特点，在应用中需要对其进行抛光或整形。本论文主要研究机械抛光金刚石的表面完整性。首先，研究了机械抛光金刚石的磨损特性。然后，为了找到合适的方法来估计机械抛光金刚石的影响层，金刚石蚀刻热空气或氢等离子体。结果表明，氢等离子体刻蚀更适合于影响层的清晰化。并找到了最佳的刻蚀条件，用氢等离子体刻蚀单晶金刚石和经_ 1500金刚石砂轮处理后的金刚石薄膜<600 or >。在蚀刻之前，观察到两个表面都非常光滑。一旦这些被蚀刻，在抛光的表面上出现微小的裂纹，并且形状取决于晶体取向。从这些结果可以得出结论，即使在金刚石上也存在受影响的层。裂纹的形成与取向有关，裂纹的出现可能是磨损的一个原因。