Development of a Nano-Fabrication Center using Fast Atom Beam

这项研究介绍了一种“纳米制造中心(NFC)”，它使用快原子束(FAB)在微细零件的表面进行刻蚀、沉积或改性。它在10微米宽的表面上制作了大约100纳米深的结构。FAB是一种中和、直线、高能光束，NFC的机械手可以在工件周围移动刀具，称为集中运动机械手。它安装在一个10度的真空室中，左右手上的工具各有7个运动自由度。我们开发了四种铅笔式工具：FAB刻蚀源、FAB辅助溅射源、FAB辅助真空蒸发源和半导体激光器。这三个光源由直径10 mm、长60 mm的玻璃管制成。它们有三个电极：两个用于电离的射频30W，两个用于加速的直流3KV。用功率为1.6W的激光进行焊接或退火，利用该工具，通过刻蚀、沉积或退火法制备了直径约为100微米的小结构。例如，真空蒸发源可以沉积一种多孔的锌薄膜，观察起来就像一团直径为100 nm的团簇。

This research introduces a "nano-fabrication center (NFC)"using a fast atom beam (FAB) to etch, deposit, or modify on the surface of micro workpieces. It fabricates an about 100-nm deep structure on the 10-mum wide surface. FAB is a neutralized, straight, high-energy beam.The manipulator of NFC can move tools around a workpieces, named a "concentrated motion manipulator". It is installed in a vacuum chamber of 10^<-7> Torr.The tools on the left and right hand have seven degree of freedom of motion each. We develop four pencil-type tools : FAB etching source, sputter source assisted by FAB,vacuum evaporation source assisted by FAB and semi-conductor laser. The three sources are made of glass tube of 10mm in diameter and 60mm in length. These have three electrodes : two of RF 30W for ionization and two of DC 3kV for acceleration. The laser of 1.6W power is used for soldering or annealing.Using the tools, we fabricated small structure of about 100mum in diameter by etching, depositing or annealing. For example, the vacuum evaporation source can deposit a porous thin film of zinc observed like a bunch of clusters of 100nm in diameter.