Development of micro resist patterns less than 35nm size based on interaction control among polymer, aggregates.

近年来，微纳米加工技术在实现电子微器件和制造量子器件方面变得越来越重要。特别是在光刻工艺中，抗蚀剂被认为是干式和湿式蚀刻工艺的重要掩模材料。图案塌缩、线条边缘粗糙度、图案缺陷和纳米气泡等特性是需要解决的重要问题。了解这些基本性质不仅对微电子器件的发展，而且对纳米级器件的发展都至关重要。在本研究中，利用原子力显微镜对浸没光刻的抗蚀剂加工、抗蚀剂图案粘附、杨氏模量估计、尖端压痕表面硬化层分析、聚合物聚集体操纵和纳米气泡分析进行了讨论。(1)利用尖端压痕技术，可以定量分析抗蚀图案表面的凝结特性。研究了针尖压痕随测量位置变化的基本特性。图案边缘对微针尖的缩进性能有很大影响。缩进位置应距图案边缘至少80nm。采用微尖端压痕斜率值作为表面凝结的代表值。在压痕曲线中，可以清楚地看出，图案发育后，在抗蚀剂表面形成了一定的硬化薄层。这些结果通过电子束辐照和热固化等各种硬化工艺得到增强。可以肯定地说，用尖端压痕法可以分析抗蚀剂图案的表面粘聚性。(2)通过典型的原子力显微镜（AFM）技术、崩塌、分离、压痕和操纵来表征聚合物聚集体的缩聚特性。在抗蚀剂表面可以清楚地观察到约50nm大小的聚合物聚集体的缔合。通过分离技术，分析了伴生聚合物骨料的粘结性能。清楚地表明，两个相关的聚合物聚集体被分离成13块聚集体。聚合物聚集体之间的相互作用力可以基于Derjaguin近似进行分析。通过尖端压痕，可以分析聚合物聚集体在存在一定空位时的缩聚过程。粒径为20tun的聚合物骨料可进行操纵，并在线性位置重新排列。可以肯定地说，聚合物骨料是一种颗粒状的固体材料，具有一定的内聚强度。介绍了含空位抗蚀剂的聚合物集料缩聚模型。(3)利用原子力显微镜（AFM），在去离子水中可以清晰地观察到arf准分子抗蚀剂薄膜表面形成的纳米级气泡（NB）。观察到的NBs直径约为40-100nm，高度约为3-8nm。通过将AFM尖端靠近NBs，可以检测到斥力，但可以检测到阻力表面的吸引力。AFM针尖与ArF准分子抗蚀剂表面的相互作用分析对于识别NBs和区分固体颗粒是有效的。这些现象可以在Lifshitz理论的基础上进行讨论。NB的分离过程是用AFM尖端完成的。从浸没光刻的角度对铌的性质进行了分析。在纳米尺度的抗蚀剂加工中，利用原子力显微镜讨论了各种严重的问题。可以肯定地说，原子力显微镜在分析抗蚀剂加工方面具有重要的潜力。这项技术将在其他领域被证明是有用的，例如微粒子的凝结控制和微机械的结构设计等。少

In recent years, micro-and nanofabrication techniques have become important in realizing electronic microdevices and in fabricating quantum devices. In the lithography process, in particular, the resist is regarded as an important mask material for both dry and wet etching processes. As the important problems that needs to be solved, various properties such as pattern collapse, line edge roughness, pattern defect and nanoscale bubbles have been recognized. Understanding these fundamental properties is of crucial importance for development not only microelectronic devices but devices in nanometer scale. In this study, as the resist processing, resist pattern adhesion, Young's modulus estimation, surface hardened layer analysis by tip indentation, manipulation of polymer aggregate and nanobubble analysis for immersion lithography are discussed by using the AFM.(1) By the tip indentation technique, the condensation property of resist pattern surface can be analyzed quantitatively. The fun … More damental property of tip indentation depending on measurement position is investigated. The pattern edge affects strongly on indenting property of a micro tip. The indenting position should be set apart from the pattern edge at least 80nm. As the representative value of surface condensation, the indentation slope value of micro tip is employed. In the indenting curve, it is clearly indicated that a certain hardened thin layer is formed on the resist surface after pattern development. These results are enhanced by the various hardening processes such as electron beam (EB) irradiation and thermal curing. One can safely state that the surface cohesion property of resist pattern can be analyzed by the tip indentation method.(2) Condensation properties of polymer aggregate are characterized by the typical AFM techniques, collapse, separation, indentation and manipulation. The association of polymer aggregate of approximately 50nm size is clearly observed in the resist surface. By the separation technique, the cohesive property of associated polymer aggregate is analyzed. It is clearly indicated that two associated polymer aggregates are separated into 13 pieces of aggregates. The interaction force among polymer aggregates can be analyzed based on Derjaguin approximation. By the tip indentation, the condensation of polymer aggregate accompanying a certain vacancy can be analyzed. The polymer aggregate of 20tun size can be manipulated and rearranged in linear position. One can safely state that polymer aggregate is regarded as a granular solid material which has a certain cohesive strength. The condensation model of polymer aggregate accompanying with vacancy resist is introduced.(3) By using atomic force microscope (AFM), a nanoscale bubble (NB) formed on a film surface of-ArF excimer resist can be imaged clearly in deionized water. The diameter and height of NBs observed are approximately 40-100nm and 3-8nm, respectively. By approaching the AFM tip onto the NBs, the repulsive force can be detected but the attractive force on the resist surface. The interaction analysis between the AFM tip and the ArF excimer resist surface is effective in order to identify the NBs and to distinguish from solid particles. These phenomena can be discussed on the basis of Lifshitz theory. The separation procedure of the NB is accomplished with the AFM tip. The analysis of NB nature is discussed on the point of the immersion lithography.As the resist processing in nanometer scale, various serious problems are discussed by using the AFM. One can safely state that the AFM has a meaningful potential for analyzing the resist processing. This technique will prove useful in other fields, for example, for the condensation control of microparticles and the structural design of micromachines and so on. Less