Development of micro resist patterns less than 35nm size based on interaction control among polymer, aggregates.

基于聚合物、聚集体之间的相互作用控制，开发尺寸小于 35nm 的微抗蚀剂图案。

• 批准号: 16360171
• 负责人: KAWAI Akira
• 金额: $ 9.54万
• 依托单位: Nagaoka University of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2004
• 资助国家: 日本
• 起止时间: 2004 至 2006
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-16360171/
• 关键词: adhesion; integration circuit; atomic force microscope; resist; surface energy; finite element method; lithography; solid surface; ラプラスカ

In recent years, micro-and nanofabrication techniques have become important in realizing electronic microdevices and in fabricating quantum devices. In the lithography process, in particular, the resist is regarded as an important mask material for both dry and wet etching processes. As the important problems that needs to be solved, various properties such as pattern collapse, line edge roughness, pattern defect and nanoscale bubbles have been recognized. Understanding these fundamental properties is of crucial importance for development not only microelectronic devices but devices in nanometer scale. In this study, as the resist processing, resist pattern adhesion, Young's modulus estimation, surface hardened layer analysis by tip indentation, manipulation of polymer aggregate and nanobubble analysis for immersion lithography are discussed by using the AFM.(1) By the tip indentation technique, the condensation property of resist pattern surface can be analyzed quantitatively. The fun … More damental property of tip indentation depending on measurement position is investigated. The pattern edge affects strongly on indenting property of a micro tip. The indenting position should be set apart from the pattern edge at least 80nm. As the representative value of surface condensation, the indentation slope value of micro tip is employed. In the indenting curve, it is clearly indicated that a certain hardened thin layer is formed on the resist surface after pattern development. These results are enhanced by the various hardening processes such as electron beam (EB) irradiation and thermal curing. One can safely state that the surface cohesion property of resist pattern can be analyzed by the tip indentation method.(2) Condensation properties of polymer aggregate are characterized by the typical AFM techniques, collapse, separation, indentation and manipulation. The association of polymer aggregate of approximately 50nm size is clearly observed in the resist surface. By the separation technique, the cohesive property of associated polymer aggregate is analyzed. It is clearly indicated that two associated polymer aggregates are separated into 13 pieces of aggregates. The interaction force among polymer aggregates can be analyzed based on Derjaguin approximation. By the tip indentation, the condensation of polymer aggregate accompanying a certain vacancy can be analyzed. The polymer aggregate of 20tun size can be manipulated and rearranged in linear position. One can safely state that polymer aggregate is regarded as a granular solid material which has a certain cohesive strength. The condensation model of polymer aggregate accompanying with vacancy resist is introduced.(3) By using atomic force microscope (AFM), a nanoscale bubble (NB) formed on a film surface of-ArF excimer resist can be imaged clearly in deionized water. The diameter and height of NBs observed are approximately 40-100nm and 3-8nm, respectively. By approaching the AFM tip onto the NBs, the repulsive force can be detected but the attractive force on the resist surface. The interaction analysis between the AFM tip and the ArF excimer resist surface is effective in order to identify the NBs and to distinguish from solid particles. These phenomena can be discussed on the basis of Lifshitz theory. The separation procedure of the NB is accomplished with the AFM tip. The analysis of NB nature is discussed on the point of the immersion lithography.As the resist processing in nanometer scale, various serious problems are discussed by using the AFM. One can safely state that the AFM has a meaningful potential for analyzing the resist processing. This technique will prove useful in other fields, for example, for the condensation control of microparticles and the structural design of micromachines and so on. Less

近年来，微和纳米制造技术在实现电子微器件和制造量子器件方面变得重要。特别是在光刻工艺中，抗蚀剂被认为是干法和湿法蚀刻工艺的重要掩模材料。作为需要解决的重要问题，各种性质，如图案塌陷，线边缘粗糙度，图案缺陷和纳米气泡已被认识到。理解这些基本性质不仅对微电子器件的发展至关重要，而且对纳米尺度的器件也至关重要。在这项研究中，作为抗蚀剂的处理，抗蚀剂图案的粘附，杨氏模量估计，表面硬化层的尖端压痕分析，操纵聚合物聚集体和纳米气泡分析浸没光刻讨论了通过使用AFM。(1)利用针尖压痕技术可以定量分析光刻胶图形表面的凝结特性。的乐趣 ...更多信息 研究了针尖压痕的损伤特性随测量位置的变化规律。图案边缘对微针尖的压入性能有很大影响。压痕位置应与图案边缘至少相距80 nm。采用微针尖的压入斜率值作为表面凝结的代表值。在压痕曲线中，清楚地表明在图案显影之后在抗蚀剂表面上形成了某种硬化的薄层。这些结果通过诸如电子束（EB）照射和热固化的各种硬化工艺来增强。可以安全地说，抗蚀剂图案的表面结合性能可以通过尖端压痕法来分析。(2)聚合物聚集体的凝聚特性通过典型的AFM技术、塌陷、分离、压痕和操纵来表征。在抗蚀剂表面中清楚地观察到约50 nm尺寸的聚合物聚集体的缔合。利用分离技术分析了缔合聚合物聚集体的粘结性能。结果表明，两个缔合聚合物聚集体被分离成13个聚集体。聚合物聚集体之间的相互作用力可以用Derjaguin近似来分析。通过针尖压入，可以分析聚合物聚集体伴随一定空位的凝聚过程。20吨级的聚合物聚集体可以被操纵并在线性位置重排。人们可以放心地说，聚合物骨料被视为具有一定内聚强度的粒状固体材料。介绍了空穴型抗蚀剂存在时聚合物聚集体的凝聚模型。(3)利用原子力显微镜（AFM），在去离子水中，可以清晰地观察到-ArF准分子抗蚀剂膜表面形成的纳米级气泡（NB）。观察到的纳米带的直径和高度分别约为40- 100 nm和3- 8 nm。通过将AFM针尖靠近到NB上，可以检测到排斥力，但抗蚀剂表面上的吸引力。原子力显微镜针尖和ArF准分子抗蚀剂表面之间的相互作用分析是有效的，以确定NB和区分固体颗粒。这些现象都可以用Lifshitz理论加以讨论。用AFM针尖完成了NB的分离过程。从浸没式光刻的角度分析了纳米带的性质，并讨论了在纳米尺度下利用原子力显微镜进行抗蚀剂加工时存在的各种严重问题。人们可以放心地说，原子力显微镜有一个有意义的潜力，用于分析抗蚀剂处理。该技术在其他领域也将被证明是有用的，例如，用于微粒的冷凝控制和微机械的结构设计等。Less

项目成果

Adhesion Mechanism of Micro Bubbles on ArF and F2 Excimer Resists

微气泡在ArF和F2准分子光刻胶上的粘附机理

• 发表时间: 2004
• 期刊: J. Photopolymer Science and Technology 17・5
• 作者: Hotaka Endo;Akira Kawai
• 通讯作者: Akira Kawai

Determination of Young' s Modulus of Polymer Aggregate based on Hertz Theory

基于赫兹理论测定聚合物聚集体杨氏模量

• 发表时间: 2004
• 期刊: J. Photopolymer Science and Technology 17・5
• 作者: Atsushi Ishikawa;Takashi Tanji;Akira Kawai
• 通讯作者: Akira Kawai

Pinning effect of micro drops on geometrical complex substrates composed with different surface energy material

微滴在不同表面能材料组成的几何复杂基底上的钉扎效应

• 发表时间: 2004
• 期刊: J.Vac.Sci.& Technol B22
• 作者: Masaki Yamanaka;Akira Okada;Akira Kawai
• 通讯作者: Akira Kawai

Condensation Behavior of nanoscale bubbles on ArF excimer resist surface analyzed by atomic force microscope

原子力显微镜分析ArF准分子光刻胶表面纳米级气泡的凝聚行为

• 发表时间: 2005
• 期刊: J. Photopolymer Sci. Technol 18(3)
• 作者: Akira Kawai;Kenta Suzuki;Akira Kawai
• 通讯作者: Akira Kawai

Cohesion Property of Resist Pattern Surface analyzed by Tip Indentation Method

针尖压痕法分析光刻胶图案表面的内聚性能

• 发表时间: 2004
• 期刊: J. Photopolymer Science and Technology 17・3
• 作者: Akira Kawai;Masahito Hirano;Takayoshi Niiyama;Akira Kawai
• 通讯作者: Akira Kawai