GaN-based Chemical Sensors and Their On-chip Integration Using Nanowire Networks
GaN-based Chemical Sensors and Their On-chip Integration Using Nanowire Networks
批准号:
18360002
负责人:
HASEGAWA Hideki
金额:
$10.99万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2006
资助国家:
日本
项目状态:
已结题
起止时间:
2006 至 2007
中文摘要
该项目研究实现基于 GaN 的高灵敏度化学传感器及其使用纳米线的片上集成的关键技术。主要结论如下:(1)研究了肖特基势垒形成的界面模型,讨论了AlGaN/GaN肖特基势垒的费米能级钉扎、肖特基势垒高度(SBH)和反向漏电流等关键问题。电流传输由薄表面势垒(TSB)模型解释。通过吸氧工艺可以减少漏电流。 (2) 在 AlGaN/GaN HEMT 晶圆上制造的 Pd 肖特基势垒氢传感器通过应用吸氧工艺表现出前所未有的高灵敏度。 (3)其传感机制是Pd表面产生的原子氢扩散到肖特基界面形成的界面偶极子还原SBH。瞬态响应的速率限制过程是表面反应。给出了描述稳态和瞬态响应的数学公式。 (4) AlGaN/GaN氢传感器的灵敏度在较高温度下提高,并且其性能优于其他主要III-V族半导体。 (5) 在氢传感器二极管中观察到缓慢的瞬变,这可以通过电子通过表面态的时间连续跳跃引起的色散传输来解释。这导致了 AlGaN/GaN HEMT 中电流崩塌的新模型。 (6) 使用电解质/AlGaN 栅极结构制造的 pH 传感 HEMT 显示出近乎理想的能斯特响应。讨论了与使用这种结构实现生物传感器相关的问题。 (7)对于传感器的片上集成,提出了在六边形纳米线网络上实现BDD(二元决策图)信息处理架构。该提案包括基本集成单元、传感器桥、传感器阵列结构、用于纳米线网络形成的选择性MBE方法以及集成片上天线的无线通信电路等关键元件。它们的可行性已被证明。较少的
英文摘要
This project investigates key technologies for realization of GaN-based high-sensitivity chemical sensors and their on-chip integration using nanowires. The main conclusions are as follows: (1) Interface models on Schottky barrier formation are surveyed, and key issues related to AlGaN/GaN Schottky barriers including Fermi level pinning, Schottky barrier height (SBH) and reverse leakage currents are discussed. The current transport is explained by the thin surface barrier (TSB) model. Leakage currents can be reduced by the oxygen gettering process. (2) Pd Schottky barrier hydrogen sensors fabricated on AlGaN/GaN HEMT wafers exhibit unprecedented high sensitivities by applying the oxygen gettering process. (3) Its sensing mechanism is SBH reduction by interface dipole formed by atomic hydrogen which is produced at the Pd surface and diffuses to the Schottky interface. The rate limiting process for transient responses is surface reaction. Mathematical formulas for description of steady-s … More tate and transient response are given. (4) Sensitivity of AlGaN/GaN hydrogen sensors increases at higher temperatures, and they perform better than those by other major III-V semiconductors. (5) Slow transients are observed in hydrogen sensor diodes, and they can be explained by the dispersive transport due to time-continual hopping of electrons through surface states. This has led to a new model of current collapse in AlGaN/GaN HEMTs. (6)pH sensing HEMTs fabricated using an electrolyte/AlGaN gate structure, show nearly ideal Nernstian responses. Issues related to realization of bio-sensors using this structure are discussed. (7) For on-chip integration of sensors, implementation of a BDD (binary decision diagram) information processing architecture on hexagonal nanowire networks has been proposed. The proposal includes key elements such as basic integration unit, a sensor bridge, a sensor array structure, a selective MBE method for nanowire network formation and a wireless communication circuit integrated with an on-chip antenna. Their feasibilities have been proved. Less
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Interface Models and Processing Technologies for Surface Passivation and Interface Control in III-V Semiconductor Nanoelectronics
III-V族半导体纳米电子学中表面钝化和界面控制的界面模型和处理技术
DOI:
--
发表时间:
2008
期刊:
Applied Surface Science (in press ; available online) 254
影响因子:
--
作者:
[H. Hasegawa, M. Akazawa]
通讯作者:
M. Akazawa
A fast method for calculating local histograms in image processing-Application to histogram equalization and image analysis-
图像处理中计算局部直方图的快速方法-应用于直方图均衡和图像分析-
DOI:
--
发表时间:
2009
期刊:
Journal of Signal Processing (印刷中)
影响因子:
--
作者:
[S. Shimoyama, M. Igarashi, M. Ikebe]
通讯作者:
M. Ikebe
Distributed Pinning Spot Model for High-k Insulator-III-V Semiconductor Interfaces
高 k 绝缘体-III-V 半导体接口的分布式钉扎点模型
DOI:
--
发表时间:
2009
期刊:
e-Journal of Surface Science and Nanotechnology 7
影响因子:
--
作者:
[M. Akazawa, H. Hasegawa]
通讯作者:
H. Hasegawa
Histrical Evolution and Future Prospects of Research on Compound Semiconductor Electron Devices and Related Materials (invited)
化合物半导体电子器件及相关材料研究的历史沿革与未来展望(特邀)
DOI:
--
发表时间:
2009
期刊:
IEICE Trans. Electron. Vol. J92-C (in press)
影响因子:
--
作者:
[Takuya, Sudo, D. Ehrentraut, H. Hasegawa]
通讯作者:
H. Hasegawa
On the Band Alignment and Fermi Level Pinning at Compound Semiconductor Interfaces (invited)
化合物半导体界面的能带对准和费米能级钉扎(特邀)
DOI:
--
发表时间:
2008
期刊:
Hyomen Kagaku Vol. 29, No. 2
影响因子:
--
作者:
[Yuichiro, Tanabe, 吉永 耕二, 鏡谷勇二, H. Hasegawa]
通讯作者:
H. Hasegawa
共 130 条
Research for Immunotherapy of Adult T cell Leukemia(ATL)
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批准号:21590521
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.91万
-
财政年份:2009
-
负责人:HASEGAWA Hideki
-
依托单位:
International Organization of Francophonie and multicultural and cultural society
-
批准号:20530456
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.0万
-
财政年份:2008
-
负责人:HASEGAWA Hideki
-
依托单位:
Single Electron Integrated Circuits Based on A BDD Architecture Utilizing Quantum Dots Controlled by Nano-Schottky Gates
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批准号:13305020
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$35.44万
-
财政年份:2001
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负责人:HASEGAWA Hideki
-
依托单位:
Research and development of III-V quantum wire transistor-based logic and memory circuits operating near the quantum limit
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批准号:12555083
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.58万
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财政年份:2000
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负责人:HASEGAWA Hideki
-
依托单位:
Control of Metal-Compound Semiconductor Interfaces by Formation of Nano-Scale Schottky Contacts and Its Application
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批准号:11450115
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项目类别:Grant-in-Aid for Scientific Research (B).
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资助金额:$9.66万
-
财政年份:1999
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负责人:HASEGAWA Hideki
-
依托单位:
Novel Insulated Gate Structure having Ultrathin Si Quantum Well for Realization of InP-Based Ultra High-Frequency and High-Power Devices
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批准号:10555098
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.26万
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财政年份:1998
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负责人:HASEGAWA Hideki
-
依托单位:
"Realization of Schottky-limit at metal-semiconductor interfaces and its application to electron devices"
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批准号:09450118
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.09万
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财政年份:1997
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负责人:HASEGAWA Hideki
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依托单位:
"Control of surface and interfaces of nano-structures for single electron devices"
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批准号:08247101
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项目类别:Grant-in-Aid for Scientific Research on Priority Areas
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资助金额:$143.3万
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财政年份:1996
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负责人:HASEGAWA Hideki
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依托单位:
Developement of Contactless and Non-Destructive Capacitance-Voltage Measurement System in Ultra-High Vacuum
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批准号:08555072
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$3.84万
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财政年份:1996
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负责人:HASEGAWA Hideki
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依托单位:
Control of surface states for III-V semiconductor quantum structures and its application to novel optical devices
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批准号:07455017
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$4.74万
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财政年份:1995
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负责人:HASEGAWA Hideki
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依托单位:
Characterization and Control of Interaction between Quantized Energy Levels and Surface/Interface States in Compound Semiconductor Quantum Structures.
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批准号:05452181
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.54万
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财政年份:1993
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负责人:HASEGAWA Hideki
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依托单位:
A Novel Contactless and Nondestructive Measurement Method of Surface State Density on Semiconductor Free Surface, and Control of Their Surfaces
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批准号:03452147
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.48万
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财政年份:1991
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负责人:HASEGAWA Hideki
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依托单位:
A new MIS Interface Control Technology for Fabrication of High Spatial Resolution InGaAs Change Coupled Devices for Imaging
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批准号:03555056
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项目类别:Grant-in-Aid for Developmental Scientific Research (B)
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资助金额:$8.7万
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财政年份:1991
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负责人:HASEGAWA Hideki
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依托单位:
New Waveguides for Microwave Monolithic Integrated Circuits Using Distributed Parameter Effects of Semiconductor Carriers
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批准号:63460115
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.22万
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财政年份:1988
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负责人:HASEGAWA Hideki
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依托单位:
海外基金