GaN-based Chemical Sensors and Their On-chip Integration Using Nanowire Networks

基于 GaN 的化学传感器及其使用纳米线网络的片上集成

基本信息

  • 批准号:
    18360002
  • 负责人:
  • 金额:
    $ 10.99万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 财政年份:
    2006
  • 资助国家:
    日本
  • 起止时间:
    2006 至 2007
  • 项目状态:
    已结题

项目摘要

This project investigates key technologies for realization of GaN-based high-sensitivity chemical sensors and their on-chip integration using nanowires. The main conclusions are as follows: (1) Interface models on Schottky barrier formation are surveyed, and key issues related to AlGaN/GaN Schottky barriers including Fermi level pinning, Schottky barrier height (SBH) and reverse leakage currents are discussed. The current transport is explained by the thin surface barrier (TSB) model. Leakage currents can be reduced by the oxygen gettering process. (2) Pd Schottky barrier hydrogen sensors fabricated on AlGaN/GaN HEMT wafers exhibit unprecedented high sensitivities by applying the oxygen gettering process. (3) Its sensing mechanism is SBH reduction by interface dipole formed by atomic hydrogen which is produced at the Pd surface and diffuses to the Schottky interface. The rate limiting process for transient responses is surface reaction. Mathematical formulas for description of steady-s … More tate and transient response are given. (4) Sensitivity of AlGaN/GaN hydrogen sensors increases at higher temperatures, and they perform better than those by other major III-V semiconductors. (5) Slow transients are observed in hydrogen sensor diodes, and they can be explained by the dispersive transport due to time-continual hopping of electrons through surface states. This has led to a new model of current collapse in AlGaN/GaN HEMTs. (6)pH sensing HEMTs fabricated using an electrolyte/AlGaN gate structure, show nearly ideal Nernstian responses. Issues related to realization of bio-sensors using this structure are discussed. (7) For on-chip integration of sensors, implementation of a BDD (binary decision diagram) information processing architecture on hexagonal nanowire networks has been proposed. The proposal includes key elements such as basic integration unit, a sensor bridge, a sensor array structure, a selective MBE method for nanowire network formation and a wireless communication circuit integrated with an on-chip antenna. Their feasibilities have been proved. Less
本项目研究了实现GaN基高灵敏度化学传感器及其纳米线在片集成的关键技术。主要结论如下:(1)综述了肖特基势垒形成的界面模型,讨论了与AlGaN/GaN肖特基势垒相关的费米能级钉扎、肖特基势垒高度和反向漏电流等关键问题。电流输运用薄表面势垒模型解释。氧吸除工艺可以减少漏电流。(2)在AlGaN/GaN HEMT衬底上制作的Pd肖特基势垒氢敏传感器采用氧吸除工艺,具有前所未有的高灵敏度。(3)其传感机制是由Pd表面产生的扩散到肖特基界面的原子氢形成的界面偶极子对SBH的还原。瞬时响应的限速过程是表面反应。描述定常的数学公式--S…给出了更多的稳态和暂态响应。(4)AlGaN/GaN氢敏元件的灵敏度随温度的升高而提高,其性能优于其他主要的III-V半导体。(5)在氢敏二极管中观察到了慢瞬变现象,这可以用电子通过表面态的时间连续跃迁引起的色散输运来解释。这导致了一种新的AlGaN/GaN HEMT电流崩塌模型。(6)采用电解液/AlGaN栅极结构制备的pH敏感HEMT具有接近理想的能斯特响应。讨论了利用该结构实现生物传感器的相关问题。(7)针对传感器的片上集成,提出了一种基于六角形纳米线网络的BDD信息处理体系结构。该方案包括基本集成单元、传感器桥、传感器阵列结构、用于纳米线网络形成的选择性MBE方法以及与片上天线集成的无线通信电路等关键要素。他们的可行性已经得到了证明。较少

项目成果

期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Interface Models and Processing Technologies for Surface Passivation and Interface Control in III-V Semiconductor Nanoelectronics
III-V族半导体纳米电子学中表面钝化和界面控制的界面模型和处理技术
A fast method for calculating local histograms in image processing-Application to histogram equalization and image analysis-
图像处理中计算局部直方图的快速方法-应用于直方图均衡和图像分析-
Distributed Pinning Spot Model for High-k Insulator-III-V Semiconductor Interfaces
高 k 绝缘体-III-V 半导体接口的分布式钉扎点模型
Histrical Evolution and Future Prospects of Research on Compound Semiconductor Electron Devices and Related Materials (invited)
化合物半导体电子器件及相关材料研究的历史沿革与未来展望(特邀)
On the Band Alignment and Fermi Level Pinning at Compound Semiconductor Interfaces (invited)
化合物半导体界面的能带对准和费米能级钉扎(特邀)
  • DOI:
  • 发表时间:
    2008
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Yuichiro;Tanabe;吉永 耕二;鏡谷勇二;H. Hasegawa
  • 通讯作者:
    H. Hasegawa
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HASEGAWA Hideki其他文献

Influenza A virus (IAV) vaccination effectively induces germinal center
甲型流感病毒(IAV)疫苗接种可有效诱导生发中心
  • DOI:
  • 发表时间:
    2014
  • 期刊:
  • 影响因子:
    0
  • 作者:
    MIYAUCHI Kosuke;SUGIMOTO-ISHIGE Akiko;TAKAHASHI Yoshimasa;HASEGAWA Hideki;TAKEMORI Toshitada;KUBO Masato
  • 通讯作者:
    KUBO Masato

HASEGAWA Hideki的其他文献

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{{ truncateString('HASEGAWA Hideki', 18)}}的其他基金

Research for Immunotherapy of Adult T cell Leukemia(ATL)
成人T细胞白血病(ATL)免疫治疗研究
  • 批准号:
    21590521
  • 财政年份:
    2009
  • 资助金额:
    $ 10.99万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
International Organization of Francophonie and multicultural and cultural society
法语国家国际组织和多元文化和文化社会
  • 批准号:
    20530456
  • 财政年份:
    2008
  • 资助金额:
    $ 10.99万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Single Electron Integrated Circuits Based on A BDD Architecture Utilizing Quantum Dots Controlled by Nano-Schottky Gates
基于采用纳米肖特基门控制的量子点的 BDD 架构的单电子集成电路
  • 批准号:
    13305020
  • 财政年份:
    2001
  • 资助金额:
    $ 10.99万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Research and development of III-V quantum wire transistor-based logic and memory circuits operating near the quantum limit
研究和开发在量子极限附近运行的基于 III-V 量子线晶体管的逻辑和存储电路
  • 批准号:
    12555083
  • 财政年份:
    2000
  • 资助金额:
    $ 10.99万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Control of Metal-Compound Semiconductor Interfaces by Formation of Nano-Scale Schottky Contacts and Its Application
纳米级肖特基接触对金属-化合物半导体界面的控制及其应用
  • 批准号:
    11450115
  • 财政年份:
    1999
  • 资助金额:
    $ 10.99万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B).
Novel Insulated Gate Structure having Ultrathin Si Quantum Well for Realization of InP-Based Ultra High-Frequency and High-Power Devices
新型超薄硅量子阱绝缘栅结构实现InP基超高频大功率器件
  • 批准号:
    10555098
  • 财政年份:
    1998
  • 资助金额:
    $ 10.99万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
"Realization of Schottky-limit at metal-semiconductor interfaces and its application to electron devices"
“金属-半导体界面肖特基极限的实现及其在电子器件中的应用”
  • 批准号:
    09450118
  • 财政年份:
    1997
  • 资助金额:
    $ 10.99万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
"Control of surface and interfaces of nano-structures for single electron devices"
“单电子器件纳米结构表面和界面的控制”
  • 批准号:
    08247101
  • 财政年份:
    1996
  • 资助金额:
    $ 10.99万
  • 项目类别:
    Grant-in-Aid for Scientific Research on Priority Areas
Developement of Contactless and Non-Destructive Capacitance-Voltage Measurement System in Ultra-High Vacuum
超高真空非接触式无损电容电压测量系统的研制
  • 批准号:
    08555072
  • 财政年份:
    1996
  • 资助金额:
    $ 10.99万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Control of surface states for III-V semiconductor quantum structures and its application to novel optical devices
III-V族半导体量子结构表面态控制及其在新型光学器件中的应用
  • 批准号:
    07455017
  • 财政年份:
    1995
  • 资助金额:
    $ 10.99万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)

相似海外基金

Fabrication of a liquid sensor consisting of a pipe structure by using multiple shear wave roundtrips
利用多次剪切波往返制造由管道结构组成的液体传感器
  • 批准号:
    15K17485
  • 财政年份:
    2015
  • 资助金额:
    $ 10.99万
  • 项目类别:
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