GaN-based Chemical Sensors and Their On-chip Integration Using Nanowire Networks
GaN-based Chemical Sensors and Their On-chip Integration Using Nanowire Networks
批准号:
18360002
负责人:
HASEGAWA Hideki
金额:
$10.99万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2006
资助国家:
日本
项目状态:
已结题
起止时间:
2006 至 2007
中文摘要
本项目主要研究基于氮化镓的高灵敏度化学传感器及其片上集成的关键技术。主要结论如下:(1)综述了Schottky势垒形成的界面模型,讨论了与AlGaN/GaN Schottky势垒相关的关键问题,包括费米能级钉钉、Schottky势垒高度(SBH)和反漏电流。电流输运用薄表面势垒(TSB)模型来解释。通过吸氧过程可以减少泄漏电流。(2)在AlGaN/GaN HEMT晶片上制备的Pd肖特基势垒氢传感器采用吸氧工艺,具有前所未有的高灵敏度。(3)其传感机制是由Pd表面产生的原子氢形成的界面偶极子还原SBH,并扩散到肖特基界面。瞬态反应的限速过程是表面反应。给出了描述稳态和瞬态响应的数学公式。(4)温度越高,AlGaN/GaN氢传感器的灵敏度越高,性能优于其他主要III-V型半导体。(5)在氢传感器二极管中观察到慢瞬变现象,这可以用电子在表面态上随时间连续跳变引起的色散输运来解释。这导致了AlGaN/GaN hemt电流崩溃的新模型。(6)采用电解液/AlGaN栅极结构制备的pH传感hemt具有接近理想的能斯汀响应。讨论了利用该结构实现生物传感器的相关问题。(7)针对传感器的片上集成,提出了一种基于六边形纳米线网络的BDD(二进制决策图)信息处理体系结构。该方案包括基本集成单元、传感器桥、传感器阵列结构、纳米线网络形成的选择性MBE方法以及与片上天线集成的无线通信电路等关键要素。它们的可行性已经得到了证明。少
英文摘要
This project investigates key technologies for realization of GaN-based high-sensitivity chemical sensors and their on-chip integration using nanowires. The main conclusions are as follows: (1) Interface models on Schottky barrier formation are surveyed, and key issues related to AlGaN/GaN Schottky barriers including Fermi level pinning, Schottky barrier height (SBH) and reverse leakage currents are discussed. The current transport is explained by the thin surface barrier (TSB) model. Leakage currents can be reduced by the oxygen gettering process. (2) Pd Schottky barrier hydrogen sensors fabricated on AlGaN/GaN HEMT wafers exhibit unprecedented high sensitivities by applying the oxygen gettering process. (3) Its sensing mechanism is SBH reduction by interface dipole formed by atomic hydrogen which is produced at the Pd surface and diffuses to the Schottky interface. The rate limiting process for transient responses is surface reaction. Mathematical formulas for description of steady-s … More tate and transient response are given. (4) Sensitivity of AlGaN/GaN hydrogen sensors increases at higher temperatures, and they perform better than those by other major III-V semiconductors. (5) Slow transients are observed in hydrogen sensor diodes, and they can be explained by the dispersive transport due to time-continual hopping of electrons through surface states. This has led to a new model of current collapse in AlGaN/GaN HEMTs. (6)pH sensing HEMTs fabricated using an electrolyte/AlGaN gate structure, show nearly ideal Nernstian responses. Issues related to realization of bio-sensors using this structure are discussed. (7) For on-chip integration of sensors, implementation of a BDD (binary decision diagram) information processing architecture on hexagonal nanowire networks has been proposed. The proposal includes key elements such as basic integration unit, a sensor bridge, a sensor array structure, a selective MBE method for nanowire network formation and a wireless communication circuit integrated with an on-chip antenna. Their feasibilities have been proved. Less
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Interface Models and Processing Technologies for Surface Passivation and Interface Control in III-V Semiconductor Nanoelectronics
III-V族半导体纳米电子学中表面钝化和界面控制的界面模型和处理技术
DOI:
--
发表时间:
2008
期刊:
Applied Surface Science (in press ; available online) 254
影响因子:
--
作者:
[H. Hasegawa, M. Akazawa]
通讯作者:
M. Akazawa
A fast method for calculating local histograms in image processing-Application to histogram equalization and image analysis-
图像处理中计算局部直方图的快速方法-应用于直方图均衡和图像分析-
DOI:
--
发表时间:
2009
期刊:
Journal of Signal Processing (印刷中)
影响因子:
--
作者:
[S. Shimoyama, M. Igarashi, M. Ikebe]
通讯作者:
M. Ikebe
Distributed Pinning Spot Model for High-k Insulator-III-V Semiconductor Interfaces
高 k 绝缘体-III-V 半导体接口的分布式钉扎点模型
DOI:
--
发表时间:
2009
期刊:
e-Journal of Surface Science and Nanotechnology 7
影响因子:
--
作者:
[M. Akazawa, H. Hasegawa]
通讯作者:
H. Hasegawa
Histrical Evolution and Future Prospects of Research on Compound Semiconductor Electron Devices and Related Materials (invited)
化合物半导体电子器件及相关材料研究的历史沿革与未来展望(特邀)
DOI:
--
发表时间:
2009
期刊:
IEICE Trans. Electron. Vol. J92-C (in press)
影响因子:
--
作者:
[Takuya, Sudo, D. Ehrentraut, H. Hasegawa]
通讯作者:
H. Hasegawa
On the Band Alignment and Fermi Level Pinning at Compound Semiconductor Interfaces (invited)
化合物半导体界面的能带对准和费米能级钉扎(特邀)
DOI:
--
发表时间:
2008
期刊:
Hyomen Kagaku Vol. 29, No. 2
影响因子:
--
作者:
[Yuichiro, Tanabe, 吉永 耕二, 鏡谷勇二, H. Hasegawa]
通讯作者:
H. Hasegawa
共 130 条
Research for Immunotherapy of Adult T cell Leukemia(ATL)
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批准号:21590521
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.91万
-
财政年份:2009
-
负责人:HASEGAWA Hideki
-
依托单位:
International Organization of Francophonie and multicultural and cultural society
-
批准号:20530456
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.0万
-
财政年份:2008
-
负责人:HASEGAWA Hideki
-
依托单位:
Single Electron Integrated Circuits Based on A BDD Architecture Utilizing Quantum Dots Controlled by Nano-Schottky Gates
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批准号:13305020
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$35.44万
-
财政年份:2001
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负责人:HASEGAWA Hideki
-
依托单位:
Research and development of III-V quantum wire transistor-based logic and memory circuits operating near the quantum limit
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批准号:12555083
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.58万
-
财政年份:2000
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负责人:HASEGAWA Hideki
-
依托单位:
Control of Metal-Compound Semiconductor Interfaces by Formation of Nano-Scale Schottky Contacts and Its Application
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批准号:11450115
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项目类别:Grant-in-Aid for Scientific Research (B).
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资助金额:$9.66万
-
财政年份:1999
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负责人:HASEGAWA Hideki
-
依托单位:
Novel Insulated Gate Structure having Ultrathin Si Quantum Well for Realization of InP-Based Ultra High-Frequency and High-Power Devices
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批准号:10555098
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.26万
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财政年份:1998
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负责人:HASEGAWA Hideki
-
依托单位:
"Realization of Schottky-limit at metal-semiconductor interfaces and its application to electron devices"
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批准号:09450118
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.09万
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财政年份:1997
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负责人:HASEGAWA Hideki
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依托单位:
"Control of surface and interfaces of nano-structures for single electron devices"
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批准号:08247101
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项目类别:Grant-in-Aid for Scientific Research on Priority Areas
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资助金额:$143.3万
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财政年份:1996
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负责人:HASEGAWA Hideki
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依托单位:
Developement of Contactless and Non-Destructive Capacitance-Voltage Measurement System in Ultra-High Vacuum
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批准号:08555072
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$3.84万
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财政年份:1996
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负责人:HASEGAWA Hideki
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依托单位:
Control of surface states for III-V semiconductor quantum structures and its application to novel optical devices
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批准号:07455017
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$4.74万
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财政年份:1995
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负责人:HASEGAWA Hideki
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依托单位:
Characterization and Control of Interaction between Quantized Energy Levels and Surface/Interface States in Compound Semiconductor Quantum Structures.
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批准号:05452181
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.54万
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财政年份:1993
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负责人:HASEGAWA Hideki
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依托单位:
A Novel Contactless and Nondestructive Measurement Method of Surface State Density on Semiconductor Free Surface, and Control of Their Surfaces
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批准号:03452147
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.48万
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财政年份:1991
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负责人:HASEGAWA Hideki
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依托单位:
A new MIS Interface Control Technology for Fabrication of High Spatial Resolution InGaAs Change Coupled Devices for Imaging
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批准号:03555056
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项目类别:Grant-in-Aid for Developmental Scientific Research (B)
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资助金额:$8.7万
-
财政年份:1991
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负责人:HASEGAWA Hideki
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依托单位:
New Waveguides for Microwave Monolithic Integrated Circuits Using Distributed Parameter Effects of Semiconductor Carriers
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批准号:63460115
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.22万
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财政年份:1988
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负责人:HASEGAWA Hideki
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依托单位:
海外基金