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"Control of surface and interfaces of nano-structures for single electron devices"

"Control of surface and interfaces of nano-structures for single electron devices"
“单电子器件纳米结构表面和界面的控制”
批准号:
08247101
负责人:
HASEGAWA Hideki
金额:
$143.3万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research on Priority Areas
财政年份:
1996
资助国家:
日本
项目状态:
已结题
起止时间:
1996 至 1999

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中文摘要
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英文摘要
The pupose of this research was to control surfaces and interfaces of nanostructures in an atomic scale and its application to the device processing techniques for fabricating and integrating novel single electron devices. The main results are listed below.(l) Novel GaAs- and InGaAs-based single electron transistors having Schottky in-plane and wrap gates were proposed and fabricated. They operated at high temperatures and achieved the voltage gain greater than unity. Furthermore, small-scale integrated circuits such as logic inverter circuits and binary decision diagram (BDD) circuits were stuccessfully fabricated.(2) Variotus types of Si-based quantum structures and devices were fabricated and characterized. Coulomb staircase and single electron transport through nano-crystal Si dots were observed at room temprature. In addition, quantized conductance was seen for the first time in vertical-type Si transistor with a 20-nm channel. Coulomb blockade phenomena were found in a narrow Si channel where a hopping transport is dominant. A novel structure for single electron devices was proposed on the basis of asymmetric tunneling barriers.(3) Surface properties of SiC and GaSe were investigated in an atomic scale. Formation processes of metal particles with nanometer sizes on the reconstructed SiC surfaces were clarified. Furthermore, a novel process for formtion of GaAs quantum dots on the GaSe-terminated (111) Si surface was realized.(4) Tunneling time and propagation process of wave packet in quantun dots were theoretically investigated.
期刊论文(686)
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会议论文
S.Shiobara: "Deep Level and Conduction Mechanism in Low-Temperature GaAs Grown by Molecular Beam Epitaxy" Japanese Journal of Applied Physics. 35. 1159-1164 (1996)
S.Shiobara:“分子束外延生长的低温砷化镓的深层能级和传导机制”日本应用物理学杂志。
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通讯作者:
T.Muranaka: "Realization of InP-Based InGaAs Single Electron Transistors on Wires and Dots Grown by Selective MBE"Microelectronic Engineering. 47. 201-203 (1999)
T.Muranaka:“通过选择性 MBE 生长在线和点上实现基于 InP 的 InGaAs 单电子晶体管”微电子工程。
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通讯作者:
M.Kihara: " Effect of Mis-Orientation of Mesa-Stripes on the Growth of InGaAs Quantum Wires by Selective Molecular Beam Epitaxy" Applied Surface Science. 117/118. 385-389 (1997)
M.Kihara:“台面条纹的错误取向对选择性分子束外延生长 InGaAs 量子线的影响”应用表面科学。
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通讯作者:
T.Hashizume: " Dominant Electron Trap with Metastable state in Molecular Beam Epitaxial GaAs Grownat Low Temperatures" Japanese Journal of Applied Physics. 36. 1775-1780 (1997)
T.Hashizume:“在低温下生长的分子束外延 GaAs 中具有亚稳态的主电子陷阱”日本应用物理学杂志。
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通讯作者:
389
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