课题基金 / 基金详情

Massive Parallel Electron Beam Lithography System

Massive Parallel Electron Beam Lithography System
大规模并行电子束光刻系统
批准号:
19101005
负责人:
ESASHI Masayoshi
金额:
$70.55万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (S)
财政年份:
2007
资助国家:
日本
项目状态:
已结题
起止时间:
2007 至 2011

项目摘要

项目成果

ESASHI Masayoshi的其他基金

相关文献

中文摘要
翻译
点击翻译按钮获取中文摘要
英文摘要
The fabrication method for emitter with carbon nanotube at the top of the tip, optically controllable emitter, micro stage and the novel method for fabricate electro static electron rends are studied as one of the components of the massive parallel electron beam lithography system. With these components, prototype of the EB system was fabricated.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Bonding of a Si microstrcuture using filed-assisted glass melting
使用场辅助玻璃熔化粘合硅微结构
DOI: --
发表时间: 2008
期刊: Journal of Micromechanics and Microengineering 18
影响因子: --
作者: [Hironori Seki, Takahito Ono, Yusuke Kawai and Masayoshi Esashi]
通讯作者: Yusuke Kawai and Masayoshi Esashi
DOI: --
发表时间: 2008
期刊: Nanotechnology 19
影响因子: --
作者: [Justin Ho, Takahito Ono, Ching-Hsine Tsai. Masavoshi Esashi]
通讯作者: Ching-Hsine Tsai. Masavoshi Esashi
光制御型並列電子源
光控并联电子源
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [Garcon, F., Sasaki, T.(7名中6番), Okkenhaug, K., 友納栄一]
通讯作者: 友納栄一
Fabrication of Einzel lens array with one-mask RIE process for electron micro-optics
用于电子微光学的单掩模 RIE 工艺制造 Einzel 透镜阵列
DOI: --
发表时间: 2009
期刊:
影响因子: --
作者: [Moteki, N., Y. Kondo, N. Takegawa, S. Nakamura, Eiichi Tomono]
通讯作者: Eiichi Tomono
30
    RF MEMS device based on micromachining
    • 批准号:
      16201027
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $31.2万
    • 财政年份:
      2004
    • 负责人:
      ESASHI Masayoshi
    • 依托单位:
    Multi-functional Active Catheter
    • 批准号:
      10359001
    • 项目类别:
      Grant-in-Aid for Scientific Research (A).
    • 资助金额:
      $18.43万
    • 财政年份:
      1998
    • 负责人:
      ESASHI Masayoshi
    • 依托单位:
    Joint Research on Micro Fluid Control System
    • 批准号:
      10044112
    • 项目类别:
      Grant-in-Aid for Scientific Research (B).
    • 资助金额:
      $4.29万
    • 财政年份:
      1998
    • 负责人:
      ESASHI Masayoshi
    • 依托单位:
    Ultra Sensing Using Highly Precise Micromachining
    • 批准号:
      10305033
    • 项目类别:
      Grant-in-Aid for Scientific Research (A).
    • 资助金额:
      $24.13万
    • 财政年份:
      1998
    • 负责人:
      ESASHI Masayoshi
    • 依托单位: