Ultra Sensing Using Highly Precise Micromachining
Ultra Sensing Using Highly Precise Micromachining
批准号:
10305033
负责人:
ESASHI Masayoshi
金额:
$24.13万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A).
财政年份:
1998
资助国家:
日本
项目状态:
已结题
起止时间:
1998 至 2000
中文摘要
点击翻译按钮获取中文摘要
英文摘要
Micro structures, which are fabricated using micromachining based on a semiconductor micro fabrication, can move quickly. The micromachining technology makes highly sensitive and quick response sensors feasible. We can fabricate sensor array or capacitive sensors by integrating multiplexer circuits or capacitance detecting circuits respectively. Moreover highly sensitive resonating sensors, servo sensors and self-diagnostic sensors can be made by integrating actuators. Ultra sensing which has higher performancess than conventional sensing technologies has been developed by precise micromachining, integration of different components and nanomachining.Vacuum packaged sensors as capacitive diaphragm vacuum sensors and rotating gyroscopes using electrostatically levitating micro motor have been developed. The latter gyroscope could rotate at 10000 rpm and be used as two axis angular rate sensor and three axis accelerometer.Near field optical microscope which have a small (20 nm diameter) a … More perture at the end of a thin silicon cantilever achieved a high throughput and hence can be applied for optical data storage. Multi microprobe data storage devise which has arrayed thermal prove with small (30 nm) heater at the tip has been developed. The arrayed (32×32) prove needs interconnection to the integrated circuit and for this purpose electrical feedthrough in a Pyrex glass was developed. Thermal recording to a phase change recording media (GeSbTe) which is used for DVD RAM and electrical reading using conductance change were successfully performed.Carbon nanotube was deposited selectively at the end of silicon probe and applied for the SPM (Scanning Probe Microscope). Resonating characteristics of extremely thin (60 nm) silicon cantilevers has been studied High quality factor (Q) up to 250000 was achieved by heating in ultra high vacuum and removing surface natural oxide. This thin high Q resonator is effective for highly sensitive resonating sensors. Micromachined polarization modulators have been developed for the purpose of highly sensitive infrared reflection spectroscopy Less
期刊论文(200)
专著(0)
科研奖励(0)
会议论文
登录
查看更多内容
T.Abe and M.Esashi: "One-Chip Multi-Channel Quartz Crystal Microbalance (QCM) Fabricated by Deep RIE"Technical Digest of the Transducers'99. 10. 1246-1249 (1999)
T.Abe 和 M.Esashi:“Deep RIE 制造的单芯片多通道石英晶体微天平 (QCM)”传感器技术文摘99。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
S.Ko,D.Sim and M.Esashi: "An Electrostatic Servo-Accelerometer with mG Resolution"電気学会論文誌E. 119-E・7. 368-373 (1999)
S.Ko、D.Sim 和 M.Esashi:“具有 mG 分辨率的静电伺服加速度计”日本电气工程师学会会刊 E. 119-E・7 (1999)。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
P.N.Minh,T.Ono and M.Esashi: "Microfabrication of Miniature Aperture at the Apex of SiO_2 Tip on Silicon Cantilever for Near-field Scanning Microscopy"Sensors and Actuators. A80. 163-169 (2000)
P.N.Minh、T.Ono 和 M.Esashi:“用于近场扫描显微镜的硅悬臂上 SiO_2 尖端尖端微型孔径的微加工”传感器和执行器。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
P.H.Minh,T.Ono and M.Esashi: "Application of Silicon Micromachining Technology for High Throughput Near-field Optical Probe"The Internl.Conf.on Electrical Eng.2000(ICEE2K). 271-274 (2000)
P.H.Minh、T.Ono 和 M.Esashi:“硅微加工技术在高通量近场光学探针中的应用”The Internl.Conf.on Electrical Eng.2000(ICEE2K)。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
X.Li,T.Abe and M.Esashi: "Deep Reactive Ion Etching of PZT Using SF_6 Plasma"The Internl.Conf.on Electrical Eng.2000(ICEE2K). 275-278 (2000)
X.Li、T.Abe 和 M.Esashi:“使用 SF_6 等离子体对 PZT 进行深度反应离子蚀刻”The Internl.Conf.on Electrical Eng.2000(ICEE2K)。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
共 157 条
Massive Parallel Electron Beam Lithography System
-
批准号:19101005
-
项目类别:Grant-in-Aid for Scientific Research (S)
-
资助金额:$70.55万
-
财政年份:2007
-
负责人:ESASHI Masayoshi
-
依托单位:
RF MEMS device based on micromachining
-
批准号:16201027
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$31.2万
-
财政年份:2004
-
负责人:ESASHI Masayoshi
-
依托单位:
Multi-functional Active Catheter
-
批准号:10359001
-
项目类别:Grant-in-Aid for Scientific Research (A).
-
资助金额:$18.43万
-
财政年份:1998
-
负责人:ESASHI Masayoshi
-
依托单位:
Joint Research on Micro Fluid Control System
-
批准号:10044112
-
项目类别:Grant-in-Aid for Scientific Research (B).
-
资助金额:$4.29万
-
财政年份:1998
-
负责人:ESASHI Masayoshi
-
依托单位:
Joint study on high performance resonant sensors
-
批准号:07044114
-
项目类别:Grant-in-Aid for international Scientific Research
-
资助金额:$2.56万
-
财政年份:1995
-
负责人:ESASHI Masayoshi
-
依托单位:
Integrated Inertia Measurement Systems
-
批准号:07555125
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$15.42万
-
财政年份:1995
-
负责人:ESASHI Masayoshi
-
依托单位:
Flexible micro motion-systems having distributed actuators
-
批准号:07405006
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$23.42万
-
财政年份:1995
-
负责人:ESASHI Masayoshi
-
依托单位:
Microactuator by Photofabrication
-
批准号:03102001
-
项目类别:Grant-in-Aid for Specially Promoted Research
-
资助金额:$148.48万
-
财政年份:1991
-
负责人:ESASHI Masayoshi
-
依托单位:
Joint Study on Integrated Clinical Analysis System
-
批准号:03044019
-
项目类别:Grant-in-Aid for international Scientific Research
-
资助金额:$4.48万
-
财政年份:1991
-
负责人:ESASHI Masayoshi
-
依托单位:
Implantable Pressure Measurement System
-
批准号:63850084
-
项目类别:Grant-in-Aid for Developmental Scientific Research
-
资助金额:$5.38万
-
财政年份:1988
-
负责人:ESASHI Masayoshi
-
依托单位:
Study on layout design station with custom LSI
-
批准号:59850058
-
项目类别:Grant-in-Aid for Developmental Scientific Research
-
资助金额:$3.52万
-
财政年份:1984
-
负责人:ESASHI Masayoshi
-
依托单位:
海外基金