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Development of the smart deposition process of amorphous carbon films due to the control of plasma process

Development of the smart deposition process of amorphous carbon films due to the control of plasma process
基于等离子体过程控制的非晶碳薄膜智能沉积工艺的发展
批准号:
20684027
负责人:
SHINOHARA Masanori
金额:
$13.56万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (A)
财政年份:
2008
资助国家:
日本
项目状态:
已结题
起止时间:
2008 至 2012

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中文摘要
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英文摘要
We investigated plasma enhanced chemical vapor deposition (PECVD) mechanism of an amorphous carbon film with infrared spectroscopy in multiple internal reflection geometry (MIR-IRAS). If methane plasma is used, sp^-hydrocarbon species, such as CH_2CH_3, are main precursors, contributed to film deposition. In the deposition process the relases of hydrogen from the precursors is needed to film growth. On the other hand, sp-hydrocarbon species, such as C_2H are the main precursors if acethylene plasma used. The species can be deposited through addition reaction without the relase of hydrogen. Then, the film deposition rate is higher with acethylene plasma than with methane plasma.
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Difference of deposition process of an amorphous carbon film due to source gases
由于源气体造成的非晶碳膜沉积过程的差异
DOI: 10.1016/j.tsf.2009.11.033
发表时间: 2010
期刊: Thin Solid Films
影响因子: 2.1
作者: [M. Shinohara, H. Kawazoe, T. Inayoshi, T. Kawakami, Y. Matsuda, H. Fujiyama, Y. Nitta, and T. Nakatani]
通讯作者: and T. Nakatani
Substrate Bias Effects on Amorphous Carbon Film Deposition
基板偏压对非晶碳膜沉积的影响
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [Masanori Shinohara, 他]
通讯作者:
Dependences of growth process of amorphous carbon films on the different source gases : methane and acetylene
非晶碳薄膜的生长过程对不同源气体:甲烷和乙炔的依赖性
DOI: --
发表时间: 2009
期刊:
影响因子: --
作者: [Masanori Shinohara, 他]
通讯作者:
Substrate Bias Effect on Deposition Process of Amorphous Carbon Films
基底偏压对非晶碳膜沉积过程的影响
DOI: --
发表时间: 2009
期刊:
影响因子: --
作者: [T. Inayoshi, H. Kawazoe, M. Shinohara、他4名]
通讯作者: M. Shinohara、他4名
44
    Clinical study of multiple peptide vaccination for postoperative oral cancer patients revealed induction of immune responses and improved prognosis.
    • 批准号:
      24390458
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $11.56万
    • 财政年份:
      2012
    • 负责人:
      SHINOHARA Masanori
    • 依托单位:
    Study on the deposition of functionalized membrane with high-molecular-weight radicals and ions during hydroicarbon plasma
    • 批准号:
      24340144
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $9.24万
    • 财政年份:
      2012
    • 负责人:
      SHINOHARA Masanori
    • 依托单位:
    Clinical trial of adjuvant peptide vaccine therapy for oral cancer研究代表者
    • 批准号:
      23659953
    • 项目类别:
      Grant-in-Aid for Challenging Exploratory Research
    • 资助金额:
      $2.33万
    • 财政年份:
      2012
    • 负责人:
      SHINOHARA Masanori
    • 依托单位:
    Establishment of a real time measurement method of carbon film deposition process and its surface modification process during plasma generated in liquid, and the clalification of these processes
    • 批准号:
      23654203
    • 项目类别:
      Grant-in-Aid for Challenging Exploratory Research
    • 资助金额:
      $2.33万
    • 财政年份:
      2011
    • 负责人:
      SHINOHARA Masanori
    • 依托单位:
    海外基金