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Ceramics Coating of Metal Substrate by Chemical Vapor Deposition under Intense Laser Field

Ceramics Coating of Metal Substrate by Chemical Vapor Deposition under Intense Laser Field
强激光场下化学气相沉积金属基体陶瓷涂层
批准号:
22760550
负责人:
ITO Akihiko
金额:
$2.66万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (B)
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2011

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项目成果

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中文摘要
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英文摘要
A laser irradiation to chemical vapor deposition process enhanced chemical reactions and mobility of adsorbed species on a surface, leading a high-speed deposition of ceramics coating with orientation and microstructure control. In the present study, we demonstrated the preparation of α-Al_2O_3, TiON and TiN films at high deposition rate with orientation, composition and microstructural control.
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会议论文
レーザーCVD法により合成したTiON膜の微細構造に与える合成条件の影響
合成条件对激光CVD法合成TiON薄膜微观结构的影响
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [Akihiko Ito, H.Joo, Takashi Goto]
通讯作者: Takashi Goto
Preparation of AlN film by laser CVD using Al(acac)_3 and NH_3 Precursors
Al(acac)_3和NH_3前驱体激光CVD制备AlN薄膜
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [Yu You, Akihiko Ito, Rong Tu, Takashi Goto]
通讯作者: Takashi Goto
Ba_2TiO_4 and Ba_4Ti_<13>O_<30> Thick Films Prepared by Laser Chemical Vapor Deposition and Their Microstructure
激光化学气相沉积Ba_2TiO_4和Ba_4Ti_<13>O_<30>厚膜及其微观结构
DOI: 10.4028/www.scientific.net/kem.508.199
发表时间: 2012
期刊: Key Engineering Materials
影响因子: --
作者: [D.Y. Guo, A. Ito, R. Tu, T. Goto]
通讯作者: T. Goto
(006)-oriented α-Al_2O_3 films prepared in CO2-H2 atmosphere by laser chemical vapor deposition using a diode laser
利用二极管激光器在CO2-H2气氛中激光化学气相沉积制备(006)取向α-Al_2O_3薄膜
DOI: 10.1016/j.mseb.2011.05.030
发表时间: 2011
期刊: Materials Science and Engineering B
影响因子: --
作者: [Y. You, A. Ito, R. Tu, T. Goto]
通讯作者: T. Goto
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