Ceramics Coating of Metal Substrate by Chemical Vapor Deposition under Intense Laser Field

强激光场下化学气相沉积金属基体陶瓷涂层

• 批准号: 22760550
• 负责人: ITO Akihiko
• 金额: $ 2.66万
• 依托单位: Tohoku University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Young Scientists (B)
• 财政年份: 2010
• 资助国家: 日本
• 起止时间: 2010 至 2011
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-22760550/
• 关键词: 化学気相析出; レーザー工学; セラミックス; コーティング; 配向制御; レーザー光学; アルミナ

A laser irradiation to chemical vapor deposition process enhanced chemical reactions and mobility of adsorbed species on a surface, leading a high-speed deposition of ceramics coating with orientation and microstructure control. In the present study, we demonstrated the preparation of α-Al_2O_3, TiON and TiN films at high deposition rate with orientation, composition and microstructural control.

激光照射化学气相沉积过程增强了表面上的化学反应和吸附物种的流动性，导致具有取向和微观结构控制的陶瓷涂层的高速沉积。本研究以高沉积速率制备α-Al_2O_3、TiON和TiN薄膜，并对薄膜的取向、成分和微观结构进行控制。

项目成果

レーザーCVD法により合成したTiON膜の微細構造に与える合成条件の影響

合成条件对激光CVD法合成TiON薄膜微观结构的影响

• 发表时间: 2010
• 作者: Akihiko Ito;H.Joo;Takashi Goto
• 通讯作者: Takashi Goto

Preparation of AlN film by laser CVD using Al(acac)_3 and NH_3 Precursors

Al(acac)_3和NH_3前驱体激光CVD制备AlN薄膜

• 发表时间: 2010
• 作者: Yu You;Akihiko Ito;Rong Tu;Takashi Goto
• 通讯作者: Takashi Goto

Ba_2TiO_4 and Ba_4Ti_<13>O_<30> Thick Films Prepared by Laser Chemical Vapor Deposition and Their Microstructure

激光化学气相沉积Ba_2TiO_4和Ba_4Ti_<13>O_<30>厚膜及其微观结构

• DOI: 10.4028/www.scientific.net/kem.508.199
• 发表时间: 2012
• 期刊: Key Engineering Materials
• 作者: D.Y. Guo;A. Ito;R. Tu;T. Goto
• 通讯作者: T. Goto

(006)-oriented α-Al_2O_3 films prepared in CO2-H2 atmosphere by laser chemical vapor deposition using a diode laser

利用二极管激光器在CO2-H2气氛中激光化学气相沉积制备(006)取向α-Al_2O_3薄膜

• DOI: 10.1016/j.mseb.2011.05.030
• 发表时间: 2011
• 期刊: Materials Science and Engineering B
• 作者: Y. You;A. Ito;R. Tu;T. Goto
• 通讯作者: T. Goto

Preparation of Beta Alumina Films by Laser Chemical Vapor Deposition

激光化学气相沉积法制备β氧化铝薄膜

• 发表时间: 2011
• 作者: You Yu;A. Ito;R. Tu;T. Goto
• 通讯作者: T. Goto