Highly Oriented Ceramic Coatings by Chemical Vapor Deposition under Intense Laser Field
Highly Oriented Ceramic Coatings by Chemical Vapor Deposition under Intense Laser Field
批准号:
25709069
负责人:
ITO Akihiko
金额:
$5.41万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (A)
财政年份:
2013
资助国家:
日本
项目状态:
已结题
起止时间:
2013-04-01 至 2016-03-31
中文摘要
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DOI:
10.1016/j.tsf.2013.11.089
发表时间:
2014-01
期刊:
Thin Solid Films
影响因子:
2.1
作者:
[A. Ito;Takahiro Sato;T. Goto]
通讯作者:
A. Ito;Takahiro Sato;T. Goto
A feather-like structure of β-Al2TiO5 film prepared by laser chemical vapor deposition.
采用激光化学气相沉积法制备的羽毛状结构的β-Al2TiO5薄膜。
DOI:
10.1016/j.jeurceramsoc.2015.01.027
发表时间:
2015
期刊:
Journal of the European Ceramic Society
影响因子:
5.7
作者:
[A. Ito, S. Nishigaki, T. Goto]
通讯作者:
T. Goto
Effects of laser power on the growth of polycrystalline AlN films by laser chemical vapor deposition method
激光功率对激光化学气相沉积法生长多晶AlN薄膜的影响
DOI:
10.1016/j.surfcoat.2013.04.043
发表时间:
2013
期刊:
Surface Coatings and Technology
影响因子:
--
作者:
[Y. You, A. Ito, R. Tu, T. Goto]
通讯作者:
T. Goto
レーザーCVD によるSiC の高速成膜と成膜温度が微細組織に与える影響
激光CVD高速SiC沉积及沉积温度对显微组织的影响
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[橋本龍真, 伊藤暁彦, 後藤孝]
通讯作者:
後藤孝
Preparation of (100) CeO2 and (110) YBa2Cu3O7-δ films by laser chemical vapor deposition
激光化学气相沉积法制备(100)CeO2和(110)YBa2Cu3O7-δ薄膜
DOI:
10.1016/j.ceramint.2013.06.041
发表时间:
2014
期刊:
Ceramics International
影响因子:
5.2
作者:
[P. Zhao, A. Ito, T. Goto]
通讯作者:
T. Goto
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