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High-Quality Formation of Strained-Ge-on-Insulator for Ultrahigh-Speed Transistor Application

High-Quality Formation of Strained-Ge-on-Insulator for Ultrahigh-Speed Transistor Application
用于超高速晶体管应用的绝缘体上应变Ge的高质量形成
批准号:
23360138
负责人:
SADOH Taizoh
金额:
$12.48万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011-04-01 至 2014-03-31

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中文摘要
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英文摘要
To achieve ultrahigh-speed transistors, which can be merged with large-scale integrated circuits (LSIs), techniques for formation of high-quality strained Ge on insulator has been developed. Here, SiGe-mixing-triggered rapid-melting growth, insulating-film-induced local-strain introduction, and impurity-doping processes are investigated. These techniques facilitate formation of ultrahigh-sped Ge-on-insulator transistors for advanced LSIs.
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DOI: 10.1149/2.002307ssl
发表时间: 2013
期刊: ECS Solid State Letters
影响因子: --
作者: [R. Matsumura;M. Anisuzzaman;H. Yokoyama;T. Sadoh;M. Miyao]
通讯作者: R. Matsumura;M. Anisuzzaman;H. Yokoyama;T. Sadoh;M. Miyao
Coherent Lateral-Growth of Ge over Insulating Film by Rapid-Melting-Crystallization
通过快速熔化结晶在绝缘膜上相干横向生长Ge
DOI: --
发表时间: 2013
期刊:
影响因子: --
作者: [T. Sadoh, M. Kurosawa, K. Toko, and, M. Miyao]
通讯作者: M. Miyao
DOI: --
发表时间: 2014
期刊:
影响因子: --
作者: [T. Sadoh, J.-H. Park, and M. Miyao]
通讯作者: and M. Miyao
DOI: 10.1063/1.3586259
发表时间: 2011-05
期刊: Applied Physics Letters
影响因子: 4
作者: [I. Mizushima;K. Toko;Yasuharu Ohta;Takashi Sakane;T. Sadoh;M. Miyao]
通讯作者: I. Mizushima;K. Toko;Yasuharu Ohta;Takashi Sakane;T. Sadoh;M. Miyao
22
    Development for High-Performance Tunnel Transistors with Direct-Transition-Type GeSn
    • 批准号:
      16K14234
    • 项目类别:
      Grant-in-Aid for Challenging Exploratory Research
    • 资助金额:
      $2.25万
    • 财政年份:
      2016
    • 负责人:
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    • 依托单位:
    Low temperature growth of GeSn crystals on insulator and application to high-speed transistors for three dimensional LSI
    • 批准号:
      15H03976
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $10.57万
    • 财政年份:
      2015
    • 负责人:
      SADOH Taizoh
    • 依托单位:
    Development for High-Performance Tunnel Transistors with Direct-Transition Band Structure of Ge
    • 批准号:
      26630133
    • 项目类别:
      Grant-in-Aid for Challenging Exploratory Research
    • 资助金额:
      $2.41万
    • 财政年份:
      2014
    • 负责人:
      SADOH Taizoh
    • 依托单位:
    Formation of strained quasi-single crystal SiGe on glass for transistor application
    • 批准号:
      20560011
    • 项目类别:
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    • 资助金额:
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    • 财政年份:
      2008
    • 负责人:
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    • 依托单位:
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