High-Quality Formation of Strained-Ge-on-Insulator for Ultrahigh-Speed Transistor Application
High-Quality Formation of Strained-Ge-on-Insulator for Ultrahigh-Speed Transistor Application
批准号:
23360138
负责人:
SADOH Taizoh
金额:
$12.48万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011-04-01 至 2014-03-31
中文摘要
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英文摘要
To achieve ultrahigh-speed transistors, which can be merged with large-scale integrated circuits (LSIs), techniques for formation of high-quality strained Ge on insulator has been developed. Here, SiGe-mixing-triggered rapid-melting growth, insulating-film-induced local-strain introduction, and impurity-doping processes are investigated. These techniques facilitate formation of ultrahigh-sped Ge-on-insulator transistors for advanced LSIs.
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DOI:
10.1149/2.002307ssl
发表时间:
2013
期刊:
ECS Solid State Letters
影响因子:
--
作者:
[R. Matsumura;M. Anisuzzaman;H. Yokoyama;T. Sadoh;M. Miyao]
通讯作者:
R. Matsumura;M. Anisuzzaman;H. Yokoyama;T. Sadoh;M. Miyao
Coherent Lateral-Growth of Ge over Insulating Film by Rapid-Melting-Crystallization
通过快速熔化结晶在绝缘膜上相干横向生长Ge
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[T. Sadoh, M. Kurosawa, K. Toko, and, M. Miyao]
通讯作者:
M. Miyao
(Invited) Orientation-Controlled Large-Grain SiGe Crystal on Flexible Substrate by Low -Temperature Metal-Induced Crystallization
(特邀)柔性衬底上低温金属诱导晶化定向控制大晶硅锗晶体
DOI:
--
发表时间:
2014
期刊:
影响因子:
--
作者:
[T. Sadoh, J.-H. Park, and M. Miyao]
通讯作者:
and M. Miyao
DOI:
10.1063/1.3586259
发表时间:
2011-05
期刊:
Applied Physics Letters
影响因子:
4
作者:
[I. Mizushima;K. Toko;Yasuharu Ohta;Takashi Sakane;T. Sadoh;M. Miyao]
通讯作者:
I. Mizushima;K. Toko;Yasuharu Ohta;Takashi Sakane;T. Sadoh;M. Miyao
Recent Progress of Rapid-Melting-Growth for Laterally-Graded, Ge-Based Mixed-Crystals on Insurator
绝缘体上横向梯度Ge基混晶的快速熔融生长研究进展
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[E. Itoh, Y. Maruyama, and K. Fukuda, T. Sadoh]
通讯作者:
T. Sadoh
共 22 条
Development for High-Performance Tunnel Transistors with Direct-Transition-Type GeSn
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批准号:16K14234
-
项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.25万
-
财政年份:2016
-
负责人:SADOH Taizoh
-
依托单位:
Low temperature growth of GeSn crystals on insulator and application to high-speed transistors for three dimensional LSI
-
批准号:15H03976
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$10.57万
-
财政年份:2015
-
负责人:SADOH Taizoh
-
依托单位:
Development for High-Performance Tunnel Transistors with Direct-Transition Band Structure of Ge
-
批准号:26630133
-
项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.41万
-
财政年份:2014
-
负责人:SADOH Taizoh
-
依托单位:
Formation of strained quasi-single crystal SiGe on glass for transistor application
-
批准号:20560011
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$3.0万
-
财政年份:2008
-
负责人:SADOH Taizoh
-
依托单位:
Control of Strain and Orientation of SiGe on Glass for High-Performance Transistor
-
批准号:19560316
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.91万
-
财政年份:2007
-
负责人:SADOH Taizoh
-
依托单位:
Dynamic Behavior of Radiation-induced Defects in Silicon Crystal and Its Application to Semiconductor Technology
-
批准号:10650013
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.3万
-
财政年份:1998
-
负责人:SADOH Taizoh
-
依托单位:
海外基金