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RF PLASMA DEPOSITED SURFACES

RF PLASMA DEPOSITED SURFACES
射频等离子体沉积表面
批准号:
6345027
负责人:
DAVID G CASTNER
金额:
$1.47万
依托单位:
依托单位国家:
美国
项目类别:
财政年份:
2000
资助国家:
美国
项目状态:
已结题
起止时间:
2000-09-01 至 2001-08-31

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中文摘要
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英文摘要
RF plasma-deposited surfaces provide a model of complex surfaces and exhibit many of the problems encountered in the analysis of biological systems, for example, the presence of many different functional groups and differing degrees of crosslinking. A large variety of surfaces can be produced via RF plasma deposition, ranging from little structural rearrangement of the monomer unit to severe rearrangement. The films will be used to assess the capability of SIMS to probe crosslinking degree, the ability of SIMS and multivariate statistics to assess quantitatively one functional group in the presence of others, and to optimize derivatization protocols previously developed in this lab.
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MS Chemical Imager Instrument
  • 批准号:
    8730331
  • 项目类别:
  • 资助金额:
    $174.95万
  • 财政年份:
    2014
  • 负责人:
    DAVID G CASTNER
  • 依托单位:
Cluster Ion Sources for ToF-SIMS
  • 批准号:
    8246268
  • 项目类别:
  • 资助金额:
    $37.46万
  • 财政年份:
    2012
  • 负责人:
    DAVID G CASTNER
  • 依托单位:
Cluster Ion Source for ESCA Instrument
  • 批准号:
    7791458
  • 项目类别:
  • 资助金额:
    $11.5万
  • 财政年份:
    2010
  • 负责人:
    DAVID G CASTNER
  • 依托单位:
ToF-SIMS Instrument
  • 批准号:
    7040267
  • 项目类别:
  • 资助金额:
    $49.98万
  • 财政年份:
    2006
  • 负责人:
    DAVID G CASTNER
  • 依托单位:
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