Nanoparticulate Coatings Enhance Ion Detection

纳米颗粒涂层增强离子检测

• 批准号: 10883978
• 负责人: John Albert Schultz
• 金额: $ 4万
• 依托单位: IONWERKS, INC.
• 依托单位国家: 美国
• 财政年份: 2014
• 资助国家: 美国
• 起止时间: 2014-09-25 至 2024-08-31
• 项目状态: 已结题
• 来源: https://reporter.nih.gov/project-details/10883978
• 关键词: Acceleration; Alloys; Area; Atmosphere; Awareness; Charge; Computer software; Data; Deposition; Detection; Dose; Electronics; Electrons; Elements; Equipment; Film; Fluorescence Microscopy; Gases; Glass; Goals; Height; Helium; Image Enhancement; Individual; International; Ion Channel; Ions; Joints; Kinetics; Legal patent; Masks; Measurement; Measures; Memory; Methods; Microscope; Microscopy; Modification; Morphology; New Brunswick; Parents; Performance; Phase; Photons; Physics; Physiologic pulse; Porosity; Positron-Emission Tomography; Reaction Time; Resolution; Sales; Silicon; Source; Surface; Techniques; Technology; Testing; Thick; Thinness; Time; Transmission Electron Microscopy; United States National Institutes of Health; Universities; atomic layer deposition; catalyst; cost; data acquisition; detector; equipment acquisition; improved; innovation; interest; ion mobility; meetings; micropore; nanoparticulate; nanoscale; nanosecond; particle; particle detector; performance tests; response; solid state; success; time of flight mass spectrometry; tool

(Project Summary Changes 7/3/2023 for Equipment Supplement in bold) Ionwerks' phase II has been the catalyst by which Hamamatsu USA (Sommerville NJ) has become interested in our project and in our interaction with Rutgers University (New Brunswick NJ). In a joint meeting at Rutgers (Dec 2022) Hamamatsu made us aware of two of their new commercially released remarkable innovations: 1) A silicon based Avalanche Particle Detector (APD) which has unit sensitivity and subnanosecond pulse response to >1KeV electrons. 2) Hamamatsu's new Borosilicate MCPs coated with MgO SE emissive thin films which outperforms conventional Pb glass MCP in every way: orders of magnitude longer lifetime, higher gain --which improves with ion dose--, and a constant picosecond time response maintained at the higher gain and long lifetimes. Hamamatsu offers both for sale internationally. Addition of our Nanoparticulate thin films during our existing phase II could likely improve either of these products. However, we do not have electronics which can measure changes in picosecond pulsed timing performance and gain increase (or degradation) on the sub-nanosecond time scale. Thus the opportunity to acquire an advanced oscilloscope which would measure these parameters could not come at a more perfect time. Our previously described goals of the parent phase II application remain unaltered as follows. Ionwerks new thin film deposition technique for increasing the gain and sensitivity of existing microchannel ion detectors was proven in a previously completed NIH phase I. An increased Secondary Electron (SE) yield from these films was found to improve with ion doses of helium up to > 100 Coulombs/cm2 while the electron yield from the uncoated detector first surface decreased after 1 Coulombs/cm2. A NIH Phase II is using these films to vary elemental composition and morphology of the first surface to increase the first hit SE yield and to prolong the deposited layer lifetime. Detector testing will proceed with in-house ion and electron sources. Methods for putting these thin film coatings onto the sidewalls of the MCP (in addition to covering the front detector surface) should increase the detector gain and substantially prolong the MCP detector lifetime. We will emphasize the use of the Zeiss Orion helium ion microscope at Rutgers to perform accelerated lifetime testing of the MCP pulse height, gain and first surface secondary electron yield from individual pores. Elemental composition change in the first hit area of the microchannel pore will also be determined by Nanoscale Rutherford backscattering within the Orion and will be correlated with the lifetime and yield measurement. The combination of the Zeiss Orion helium ion microscope configured with the Ionwerks NanoRBS spectrometer should prove to be a crucial tool in detector physics. In addition the overall performance of the NanoRBS will improve when this spectrometer is retrofitted with newly enhanced MCPs combined with new APDs from this phase II effort.

（2023年7月3日设备补充的项目摘要变更以粗体显示）Ionwerks的第二阶段已经完成， 滨松美国公司（新泽西州萨默维尔）对我们的项目感兴趣， 我们与罗格斯大学（新玩法新泽西州）的互动。在罗格斯大学的联席会议上（2022年12月） 滨松让我们意识到他们的两个新的商业发布显着的创新：1）A 硅基雪崩粒子探测器（APD）具有单位灵敏度和亚纳秒脉冲 对> 1 KeV电子的响应。2)Hamamatsu的新型硼硅酸盐MCP涂有MgO SE发射涂层 在各方面都优于传统铅玻璃MCP的薄膜：数量级更长 寿命，更高的增益-随着离子剂量的增加-以及恒定的皮秒时间响应 保持较高的增益和较长的寿命。滨松提供这两种销售国际。 在我们现有的第二阶段添加我们的纳米颗粒薄膜可能会改善 这些产品中的任何一个。然而，我们没有电子设备可以测量 皮秒脉冲定时性能和增益在亚纳秒上的增加（或降低 时间尺度因此，有机会获得一个先进的示波器，将测量这些 参数不能在一个更完美的时间。我们先前描述的父阶段的目标 II应用保持不变如下。Ionwerks新的薄膜沉积技术， 现有微通道离子检测器的增益和灵敏度在先前完成的NIH第I阶段中得到了证实。 从这些薄膜中增加的二次电子（SE）产率被发现随着氦离子剂量的增加而提高 至> 100库隆布/cm 2，而来自未涂覆的检测器第一表面的电子产额在1 库隆布/cm 2。美国国立卫生研究院的第二阶段正在使用这些薄膜来改变第一种薄膜的元素组成和形态。 表面以增加首次击中SE产率并延长沉积层寿命。探测器测试将 使用内部离子源和电子源。将这些薄膜涂层置于侧壁上的方法 MCP的厚度（除了覆盖前探测器表面之外）应增加探测器增益， 大大延长了MCP探测器的寿命。我们将强调使用蔡司猎户座氦离子 显微镜在罗格斯大学进行加速寿命测试的MCP脉冲高度，增益和第一表面 二次电子产率从个别孔隙。元素组成的变化，在第一次击中的地区， 微通道孔也将通过Orion内的纳米级卢瑟福背散射来确定， 与寿命和产量测量相关。蔡司猎户座氦离子显微镜 配置了Ionwerks NanoRBS光谱仪的探测器应该被证明是探测器物理学中的重要工具。在 此外，NanoRBS的整体性能将得到改善， 加强的MCP与第二阶段工作中新的APD相结合。

项目成果

Gangliosides and ceramides change in a mouse model of blast induced traumatic brain injury.

• DOI: 10.1021/cn300216h
• 发表时间: 2013-04
• 期刊: ACS chemical neuroscience
• 影响因子: 5
• 作者: A. Woods;B. Colsch;S. Jackson;Jeremy D Post;Kathrine Baldwin;Aurélie Roux;B. Hoffer;B. Cox;M. Hoffer;V. Rubovitch;C. Pick;J. Schultz;C. Balaban

Lipid imaging within the normal rat kidney using silver nanoparticles by matrix-assisted laser desorption/ionization mass spectrometry.

• DOI: 10.1038/ki.2015.3
• 发表时间: 2015-07
• 期刊: Kidney international
• 影响因子: 19.6
• 作者: Muller L;Kailas A;Jackson SN;Roux A;Barbacci DC;Schultz JA;Balaban CD;Woods AS
• 通讯作者: Woods AS

Secondary Electron Emission Materials for Transmission Dynodes in Novel Photomultipliers: A Review.

• DOI: 10.3390/ma9121017
• 发表时间: 2016-12-16
• 期刊: Materials (Basel, Switzerland)
• 作者: Tao SX;Chan HW;van der Graaf H
• 通讯作者: van der Graaf H