Mask Aligner

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We ask funding to purchase an infrared/visible mask alignment and exposure system. This basic mask aligner will serve the needs of all lithographic exposure processes for all the applicants in this proposal. This tool is urgently needed to sustain and enhance the research capacity and productivity of the applicants and more than 100 researchers who are using our facilities. The mask aligner will be used in applied research in a wide area ranging from microfluidic compact diagnostic systems to smart automotive sensors and actuator systems, Micro-Electromechanical System (MEMS) technology and also development of novel polymer MEMS, and nano-material embedded soft-lithography.