Mask Aligner

掩模对准器

• 批准号: 423282-2012
• 负责人: Parameswaran, Ash
• 金额: $ 10.93万
• 依托单位: Simon Fraser University
• 依托单位国家: 加拿大
• 项目类别: Research Tools and Instruments - Category 1 (<$150,000)
• 财政年份: 2011
• 资助国家: 加拿大
• 起止时间: 2011-01-01 至 2012-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=495912
• 关键词: Mask; Aligner

We ask funding to purchase an infrared/visible mask alignment and exposure system. This basic mask aligner will serve the needs of all lithographic exposure processes for all the applicants in this proposal. This tool is urgently needed to sustain and enhance the research capacity and productivity of the applicants and more than 100 researchers who are using our facilities. The mask aligner will be used in applied research in a wide area ranging from microfluidic compact diagnostic systems to smart automotive sensors and actuator systems, Micro-Electromechanical System (MEMS) technology and also development of novel polymer MEMS, and nano-material embedded soft-lithography.

我们申请资金购买红外/可见光掩膜对准和曝光系统。这种基本的掩膜对准器将满足本提案中所有申请人的所有光刻曝光过程的需要。我们迫切需要这个工具来维持和提高申请人和使用我们设施的100多名研究人员的研究能力和生产力。该掩模对准器将用于广泛的应用研究，从微流体紧凑型诊断系统到智能汽车传感器和执行器系统，微机电系统（MEMS）技术，以及新型聚合物微机电系统的开发，以及纳米材料嵌入式软光刻。