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Deep X-ray lithography processes for high resolution applications

Deep X-ray lithography processes for high resolution applications
适用于高分辨率应用的深度 X 射线光刻工艺
批准号:
327243-2006
负责人:
Achenbach, Sven
金额:
$1.24万
依托单位:
依托单位国家:
加拿大
项目类别:
Discovery Grants Program - Individual
财政年份:
2008
资助国家:
加拿大
项目状态:
已结题
起止时间:
2008-01-01 至 2009-12-31

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中文摘要
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英文摘要
The 1959 quote of Richard P. Feynman, Nobel Prize laureate in physics, that "there's plenty of room at the bottom" today holds more than ever. Microsystems technologies have revolutionized the way we perceive and control the physical world, and the world market of $33 billion US for smallest units commercially available is anticipating an annual growth of 11% to 16% [NEXUS III market analysis]. Microsystems technologies focus on fabricating miniaturized components with feature sizes on the order of 1/100 of the diameter of a human hair. Systems such as read/write heads for hard discs, inkjet printhead nozzles or digital projection systems strongly support the economy. Other components drive technical and scientific progress by allowing for new systems and solutions in sensing and actuating, for instance by providing specialized filters for space missions or novel focusing optics for X-rays. Among the broad fabrication portfolio, X-ray lithography using synchrotron radiation provides particularly outstanding structure quality. This technology, however, hasn't been available in Canada so far. With the Canadian Light Source, the largest research endeavor in Canada in a generation, getting operational, this technology now gets accessible as SyLMAND, the Synchrotron Laboartory for Micro and Nano Devices, is being developed. A research program will ensure that SyLMAND not only brings X-ray lithography to Canada, but that cutting-edge research can be carried out, including process technology and related applications. This includes novel approaches in radio frequency microsystems which will help to improve wireless communications, as required in cell phones, satellite communications and wireless LANs.
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Deep X-Ray Lithography for High Aspect Ratio Polymer Micro Structures
  • 批准号:
    RGPIN-2019-06009
  • 项目类别:
    Discovery Grants Program - Individual
  • 资助金额:
    $1.97万
  • 财政年份:
    2022
  • 负责人:
    Achenbach, Sven
  • 依托单位:
Deep X-Ray Lithography for High Aspect Ratio Polymer Micro Structures
  • 批准号:
    RGPIN-2019-06009
  • 项目类别:
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  • 资助金额:
    $1.97万
  • 财政年份:
    2021
  • 负责人:
    Achenbach, Sven
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Deep X-Ray Lithography for High Aspect Ratio Polymer Micro Structures
  • 批准号:
    RGPIN-2019-06009
  • 项目类别:
    Discovery Grants Program - Individual
  • 资助金额:
    $1.97万
  • 财政年份:
    2020
  • 负责人:
    Achenbach, Sven
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High resolution zone plates fabricated by soft X-ray lithography for tomographic soft X-ray analysis applied in the designing and screening of potential Covid-19 drugs
  • 批准号:
    551062-2020
  • 项目类别:
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  • 资助金额:
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  • 财政年份:
    2020
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