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Deep x-ray lithography for high aspect ratio applications

Deep x-ray lithography for high aspect ratio applications
适用于高深宽比应用的深度 X 射线光刻
批准号:
327243-2009
负责人:
Achenbach, Sven
金额:
$2.77万
依托单位:
依托单位国家:
加拿大
项目类别:
Discovery Grants Program - Individual
财政年份:
2015
资助国家:
加拿大
项目状态:
已结题
起止时间:
2015-01-01 至 2016-12-31

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中文摘要
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英文摘要
Our technologically driven world constantly demands improved performance in all classes of devices ranging from cellular phones to automotive sensors and from medical implants to hard disk read/write heads. This generally requires reduced geometric dimensions, and micro- and nanotechnology are therefore more and more often replacing conventional fabrication technologies. One fabrication approach delivering outstanding structure quality, and therefore device performance, is deep X-ray lithography (XRL) and the LIGA process. These techniques will finally be available in Canada as SyLMAND, the Synchrotron Laboratory for Micro and Nano Devices at the Canadian Light Source in Saskatoon, gets operational. XRL technologies allow for a broad range of applications, but still require significant research efforts to fully exploit the potential. Dr. Sven Achenbach therefore designed SyLMAND to become a unique research facility. His research will partly focus on XRL mask fabrication. Its quality limits the final results of the microstructures, and therefore needs to get optimized. Key issues include minimum micro feature resolution and maximum overall mask size. Better resolution allows for smaller, more advanced devices and better tolerances in larger components. Larger mask areas enable more devices to be processed at a time, or more complicated, distributed structures. At the same time, the technology must enable reliable and cost-effective mask fabrication, both of which impose major challenges. SyLMAND offers unique capabilities to develop and apply advanced masks. To effectively apply micro technology, individual micro components fabricated with an optimized mask need to get integrated into more complex micro systems. This is particularly complicated in XRL, and related research is an additional thrust. Results from the mask technology and systems integration areas will get merged to collaboratively develop next-generation wireless devices which are required, for instance, in cellular phones and wireless LANs.
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Deep X-Ray Lithography for High Aspect Ratio Polymer Micro Structures
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  • 项目类别:
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  • 批准号:
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  • 项目类别:
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  • 资助金额:
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