Engineering Research Equipment Grant: Rapid Thermal Annealing Facility

用非相干光对注入半导体进行短期退火 目前已被广泛使用。 这项研究关注 随着卤素灯快速热退火的建立 系统 该系统将用于正在进行的实验， 了解基本工艺及其优化和设备 捏造 后者既包括微波又包括光电 装置. 在实验室中使用这种系统将 在各个领域进行更广泛的研究。

Short-term annealing of implanted semiconductors using incoherent light sources is currently being widely used. This research is concerned with the establishment of a halogen lamp rapid thermal annealing system. The system will be used in ongoing experiments aimed at the understanding of the basic process and its optimization and in device fabrication. The latter includes both microwave and optoelectronic devices. The availability of such a system in the laboratory will enable more extensive studies in the various areas.