REU: Modeling of Remote Plasma Assisted Materials Processing: Electron Transport and Selective Chemistry

远程等离子体辅助材料加工 （RPAMP）是一种方法， 可以对衬底进行沉积 位于等离子区之外。 这使得 处理将在没有显著 离子轰击损伤和高 选择性化学反应途径。 选择性 RPAMP的结果是能够启动选定的 与传统等离子体相比的反应子集 处理. 在这个项目中，我们建议继续 电子动力学和化学的研究 以电子为重点的等离子体处理 远程等离子体中的传输和选择性化学 装置. 一种叫做组合的新算法 动力学的介绍，同时获得 电子能量分布和激发态 在多个维度上的密度。

Remote Plasma Assisted Materials Processing (RPAMP) is a method whereby etchings and depositions may be performed with the substrate located out of the plasma zone. This enables processing to be performed without significant damage by ion bombardment and with highly selective chemical reaction pathways. Selectivity in RPAMP results from the ability to initiate a selected subset of reactions compared to conventional plasma processing. In this project we propose to continue studies of the electron kinetics and chemistry of processing plasmas with emphasis on electron transport and selective chemistries in remote plasma devices. A new algorithm called Combination Kinetics is introduced for simultaneously obtaining electron energy distributions and excited state densities in multiple dimensions.