Film Growth Mechanisms in Pulsed Laser Deposition

9727369阿齐兹这个研究项目探索了脉冲激光沉积金属薄膜的生长。PLD使用准分子激光来烧蚀靶材以产生沉积通量。主要目的是对亚单层岛形核和生长的动力学以及溶质分离、捕获和合金化的动力学有一个基本的了解。用PLD法生长薄膜，并对薄膜进行了实时和沉积后的结构和成分分析。选择体系为模型体系提供大范围的单体扩散系数和沉积速率，例如面心立方金属，其中存在基本活化能参数值的知识。用RHEED和UHV AFM/STM对生长形貌进行了原位观察和非原位观察。将PLD薄膜生长与分子束外延生长的薄膜、动力学蒙特卡罗模拟和分析理论进行了比较。%预计，该项目产生的加深理解将有助于生产新的、有趣的和潜在有用的材料膜组件。***

9727369 Aziz This research project explores the growth of metal films produced by pulsed laser deposition (PLD). PLD uses an excimer laser to ablate a target to produce the depositing flux. The principal objectives are to develop a fundamental understanding of the kinetics of submonolayer island nucleation and growth and of the kinetics of solute segregation, trapping, and alloying. Films are grown by PLD with real time and post deposition structure and composition analysis. Systems are selected to provide a wide range of monomer diffusivity and deposition rate for model systems, such as face-centered cubic metals, where there is knowledge of the values of the basic activation energy parameters. Growth morphologies are followed in situ with RHEED and ex situ by UHV AFM/STM. PLD film growth is compared to films grown by molecular beam epitaxy and to kinetic Monte Carlo simulations and analytical theories. %%% It is anticipated that the enhanced understanding generated by this project will aid in the production of new, interesting, and potentially useful assemblies of material films. ***