POWRE: Resonantly Enhanced Multiphoton Ionization for Measurement of Radical-Surface Reactivities
POWRE: Resonantly Enhanced Multiphoton Ionization for Measurement of Radical-Surface Reactivities
批准号:
9805815
负责人:
Ellen Fisher
金额:
$7.5万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1998
资助国家:
美国
项目状态:
已结题
起止时间:
1998-08-01 至 1999-07-31
中文摘要
该奖项是由MPS多学科活动办公室(OMA)资助的妇女从事研究和教育的专业机会(POWRE)项目,支持科罗拉多州立大学Ellen Fisher教授的研究和教育活动。该研究旨在扩展PI实验室通过共振多光子电离探测(REMPI)检测等离子体自由基的能力,并为博士后学生提供支持。将高频Nd:YAG激光器整合到PI现有的设备中,将推动她的研究项目进入一个全新的探索方向,即研究等离子体化学的基础方面。通过POWRE项目提供的机会将增强Fisher教授的研究潜力,以及她对本科生、研究生和博士后科学家的教育指导。这项研究的结果将为那些模拟等离子体系统的人提供准确的数据。这项工作还可能对微电子工业和薄膜技术产生巨大的经济影响,因为它提供了等离子体加工方法的改进,从而降低了制造成本。
英文摘要
This award of the Professional Opportunities for Women in Research and Education (POWRE) program funded through the MPS Office of Multidisciplinary Activities (OMA) supports the research and educational activities of Professor Ellen Fisher of Colorado State University. The research aims to extend the capabilities of the PI's laboratory for examining plasma radical species by resonant multiphoton ionization detection (REMPI), and to provide postdoctoral student support. The incorporation of a high-frequency Nd:YAG laser into the PI's existing equipment would propel her research program into an entirely new and exploratory direction in studying fundamental aspects of plasma chemistry.The opportunity afforded through the POWRE program will enhance Professor Fisher's research potential as well as her educational mentoring of undergraduate, graduate, and postdoctoral scientists. The results of this research will provide accurate data for those who model plasma systems. This work could also have a large economic impact on the microelectronics industry and thin-film technology by providing improvements in plasma processing methods which reduce manufacturing costs.
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依托单位:
Toward Fundamental Understanding: Correlating the Gas-Phase, Surface, and Gas-Surface Interface in Halogenated Plasma Systems
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批准号:0613653
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项目类别:Continuing Grant
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资助金额:$45.0万
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财政年份:2006
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依托单位:
Mechanistic Studies of Plasma Deposition and Etching for Integrated Circuit Materials
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批准号:0137664
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资助金额:$40.0万
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财政年份:2002
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负责人:Ellen Fisher
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依托单位:
Acquisition of an Integrated Scanning Electron Microscope System
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批准号:0114093
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资助金额:$30.0万
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财政年份:2001
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依托单位:
Acquisition of XPS Instrumentation for a Departmental Materials Characterization Facility
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依托单位:
Investigation of Plasma Deposition and Etching Mechanisms for Silicon-based Materials
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财政年份:1998
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负责人:Ellen Fisher
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依托单位:
Investigation of Plasma Deposition Mechanisms for Silicon Dioxide and Silicon Nitride Films
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批准号:9501157
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项目类别:Continuing Grant
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资助金额:$24.8万
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财政年份:1995
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负责人:Ellen Fisher
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依托单位:
Surface Reactivity of Radicals During Plasma Deposition of Thin Films
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项目类别:Standard Grant
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财政年份:1994
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负责人:Ellen Fisher
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依托单位:
海外基金