GOALI: Realizing the Promise of III-N-Epitaxy Enabled by III-N Substrates

这项与杜克大学和Kyma Technologies，Inc.合作的合作项目的目标是促进对III-N器件结构在本地III-N衬底和模板上的成核和随后的外延生长的基本了解以及相关工艺和制造实践。重点是评估目前III-N设备在材料质量、制造产量和成本方面的限制的根本原因，这反过来将有助于开发和实施合理的工程战略，以实现更稳健、更高产量的工艺。从长远来看，III-N器件市场预计将达到1000亿美元或更多，这主要是由节能的固态照明和电力电子推动的。这项研究的智力价值来自于确定III-N基片的哪些物理、化学和形态特征主导成核过程，从而建立薄膜微结构决定器件的关键电子和光学特性。除了用于制造器件质量的基片-外延层界面和缓冲层的外延生长工艺和薄膜结构之外，该项目还将阐述基片性能的指标。该项目的更广泛的影响是实现安全和节能的光发射器和电子器件的强大的社会和环境影响，以及通过工程学学生、工业科学家/工程师和教师的协作参与来提高半导体器件和材料的劳动力。将创建一个新的论坛，POISE(小型企业中的博士机会)，目的是准备、过渡和留住工业界的博士生。

The objective of this collaborative program, partnering Duke University and Kyma Technologies, Inc., is to further the fundamental understanding and related process and manufacturing practice of the nucleation and subsequent epitaxial growth of III-N device structures on native III-N substrates and templates. The focus is on assessing the root causes of current limitations in materials quality and manufacturing yield and cost of III-N devices which will, in turn, serve to help develop and implement sound engineering strategies for more robust, high yield processes. The III-N device market is expected to reach $100B or more over the long term driven primarily by energy-efficient solid-state lighting and power electronics.The intellectual merit of the research derives from determining which physical, chemical, and morphological characteristics of III-N substrates dominate nucleation processes thereby establishing thin-film microstructure determining device-critical electronic and optical properties. The metrics for substrate properties, in addition to the epitaxial growth processes and film structures for creating device-quality substrate-epitaxial layer interfaces and buffer layers, will be articulated.The broader impacts of this project are both the strong social and environmental impacts of the realization of safe and energy-efficient light emitters and electronic devices, as well as enhancing the semiconductor device and materials workforce through the collaborative engagement of engineering students, industry scientists/engineers, and faculty. A new forum, POISE (PhD Opportunities in Small-Business Enterprises) will be created with the aim of preparing, transitioning, and retaining PhD students in industry.